Exhibit 99.2

                    Ibis Technology Receives Implanter Order;

                SUMCO Orders Second Ibis i2000 Oxygen Implanter

    DANVERS, Mass.--(BUSINESS WIRE)--Oct. 26, 2005--Ibis Technology
Corporation (Nasdaq NM: IBIS), a leading provider of SIMOX-SOI
implantation equipment to the worldwide semiconductor industry, today
announced the receipt of an order for an Ibis i2000 oxygen implanter
from SUMCO, a leading manufacturer of silicon wafers. In addition, the
Company has completed a purchase agreement with SUMCO that will govern
the general contractual terms of all future SUMCO orders.
    This is the second i2000 implanter purchased by SUMCO, and the
equipment sale is valued at approximately $7.0 million.
    Martin J. Reid, president and chief executive officer of Ibis
Technology Corporation, said, "We are very pleased to have received
this order from SUMCO for a second implanter. SUMCO's first i2000
implanter order was announced last January. Since that time, our
engineers have worked very closely with the SUMCO engineers not only
to complete the rigorous factory acceptance testing process, but to
improve the quality and lower the cost of 300 mm SIMOX-SOI wafers
processed through the implanter."
    Yoshiaki Shida, Managing Executive Officer for SUMCO, said, "We
are pleased to report that demand for SIMOX-SOI wafers has grown
substantially in recent months, exceeding our present capacity. Based
on information from our customers, we expect to see this market growth
continue with a significant ramp up in the demand for SIMOX-SOI wafers
over the next several years.
    "In response to our customers' needs, we see the need for more
i2000 implanters from Ibis Technology, and we are expecting delivery
of this second implanter as soon as possible. With continued market
acceptance and growth of SIMOX-SOI, additional orders for Ibis
implanters in 2006 are possible.
    "We believe that the strategic collaboration between SUMCO and
Ibis will lead to further improved quality and lower cost for
SIMOX-SOI wafers, making SIMOX-SOI the high volume SOI solution for
our customers."
    Reid noted that this is the third order Ibis has received from a
wafer manufacturer for an i2000 implanter, the first having been
placed last year by another customer. The Company's receipt of this
follow-on i2000 implanter order from SUMCO reinforces its belief that
wafer manufacturers will lead the adoption of the SIMOX-based SOI
manufacturing process.
    Although no assurances can be given, and while the customer has
the right to modify or cancel (in whole or in part) based on the
current terms of the order, the Company expects to ship the system at
the end of the first quarter of 2006 depending on customer acceptance
of the tool at Ibis' facility. Revenue recognition will be based on
final customer acceptance at the customer's facility, which is
expected to occur at the end of the second, or early in the third
quarter of next year. The timing of final acceptance and revenue
recognition may vary depending on a number of factors, which include
among other things tool performance at the customer site, and no
guarantees can be given with respect to the future as to whether or
when the Company will recognize revenue on this transaction.
    SUMCO's first i2000 implanter is currently going through final
customer acceptance testing, which is expected to be completed by the
end of this year or early next year. Revenue of approximately $6
million will be recognized upon completion of customer acceptance
testing.
    The Ibis i2000 oxygen implanter was introduced in March 2002 as a
third-generation implanter designed to be a high-throughput,
high-volume production tool for manufacturing 300-millimeter SIMOX-SOI
wafers. The i2000 implanter's flexibility, automation and
operator-friendly controls allow this tool to produce a wide range of
SIMOX-SOI wafer products.

    About SIMOX-SOI

    Silicon-on-Insulator (SOI) is a manufacturing technology where an
insulating layer is created within a silicon wafer, isolating the top
layer of silicon where the active transistors will be manufactured
from the rest of the bulk silicon wafer. The buried oxide layer acts
as a barrier that reduces electrical leakage from the transistors,
resulting in semiconductor devices that are faster and more power
efficient. These benefits make SOI a valuable technology for
chipmakers producing IC's for high performance applications such as
servers and workstations, portable and desktop computers, wireless
communication devices, integrated optical components and automotive
electronics.
    Separation-by-IMplantation-of-OXygen (SIMOX) refers to a technique
used by Ibis for manufacturing SOI wafers where an oxygen implanter
creates a very thin insulating layer within the wafer, just below a
thin layer of silicon on the top of the wafer. The Company believes
that, compared to competing technologies, the SIMOX process offers
high quality SOI wafers at competitive costs in production quantities.

    About Ibis Technology

    Ibis Technology Corporation is a leading provider of oxygen
implanters for the production of SIMOX-SOI
(Separation-by-Implantation-of-Oxygen Silicon-On-Insulator) wafers for
the worldwide semiconductor industry. Headquartered in Danvers,
Massachusetts, the Company maintains an additional office in Aptos,
California. Ibis Technology is traded on the Nasdaq National Market
under the symbol IBIS. Information about Ibis Technology Corporation
and SIMOX-SOI is available on Ibis' web site at www.ibis.com.

    "Safe Harbor" Statement under the Private Securities Litigation
Reform Act of 1995

    This release contains express or implied forward-looking
statements regarding, among other things, (i) (from the Company and
customer above) customer interest in and demand for, and market
acceptance of, the Company's SIMOX-SOI technology, (ii) the Company's
belief that wafer manufacturers will become the primary suppliers of
SIMOX-SOI wafers to the chipmaking industry, (iii) the Company's
ability to conduct its operations in a manner consistent with its
current plan and existing capital resources or otherwise to obtain
additional implanter orders or to secure financing to continue as a
going concern (iv) the continuing qualification and acceptance of
SIMOX technology by our customers and the device manufacturers, (v)
the throughput and production capacity of the i2000 implanter for
manufacturing 200- and 300-mm SIMOX-SOI wafers, (vi) the expected
on-site acceptance of the i2000 implanter, (vii) the timing and
likelihood of revenue recognition on orders for the Company's
implanters, (viii) the Company's plan to focus on supplying implanters
to wafer manufacturers, (ix) the Company's expectations regarding
future orders for i2000 implanters, and (x) and the adoption rate of
SOI technology. Such statements are neither promises nor guarantees
but rather are subject to risks and uncertainties, which could cause
actual results to differ materially from those described in the
forward-looking statements. Such risks and uncertainties include, but
are not limited to, future continued migration to SOI technology and
market acceptance of SIMOX, the level of demand for the company's
products, the company's ability to pursue and maintain further
strategic relationships, partnerships and alliances with third
parties, the Company's ability to protect its proprietary technology,
the potential trends in the semiconductor industry generally, the ease
with which an i2000 can be installed and qualified in fabrication
facilities, the likelihood that implanters, if ordered, will be
qualified and accepted by customers without substantial delay,
modification or cancellation, in whole or in part, the likelihood and
timing of revenue recognition on such transactions, the impact of
competitive products, technologies and pricing, the impact of rapidly
changing technology, equipment capacity and supply constraints or
difficulties, general economic conditions, and other risks and
uncertainties described in the Company's Securities and Exchange
Commission filings from time to time, including but not limited to,
the company's Annual Report on Form 10-K for the year ended December
31, 2004. All information set forth in this press release is as of
October 26, 2005, and Ibis undertakes no duty to update this
information unless required by law.


    CONTACT: Company Contact:
             Ibis Technology Corporation
             William J. Schmidt, 978-777-4247
             CFO & Treasurer
             or
             IR Agency Contact:
             Bill Monigle Associates
             Bill Monigle, 603-424-1184
             President