103 patents
Utility
Accurate Raman Spectroscopy
18 Jan 24
A method, a system, and a non-transitory computer readable medium for Raman spectroscopy.
Eyal Hollander, Gilad BARAK, Elad Schleifer, Yonatan OREN, Amir Shayari
Filed: 14 Sep 21
Utility
System and method for controlling measurements of sample's parameters
16 Jan 24
A system and method are presented for controlling measurements of various sample's parameters.
Barak Bringoltz, Ofer Shlagman, Ran Yacoby, Noam Tal
Filed: 6 Jul 21
Utility
Optical metrology system and method
9 Jan 24
A measurement system is provided for use in optical metrology measurements.
Gilad Barak, Amir Shayari
Filed: 24 Feb 21
Utility
Accurate raman spectroscopy
2 Jan 24
A method, a system, and a non-transitory computer readable medium for Raman spectroscopy.
Eyal Hollander, Gilad Barak, Elad Schleifer, Yonatan Oren, Amir Shayari
Filed: 1 Aug 22
Utility
Method and System for Optimizing Optical Inspection of Patterned Structures
14 Dec 23
A system for use in metrology of a patterned structure, the system including a data input utility configured to receive a first type of data related to the patterned structure, the first type of data was obtained by a first type of metrology system and comprises first type measurements and first geometrical information regarding the patterned structure.
Boaz BRILL
Filed: 16 May 23
Utility
Machine and deep learning methods for spectra-based metrology and process control
14 Nov 23
A system and methods for Advance Process Control (APC) in semiconductor manufacturing include: for each of a plurality of waiter sites, receiving a pre-process set of scatterometric training data, measured before implementation of a processing step, receiving a corresponding post-process set of scatterometric training data measured after implementation of the process step, and receiving a set of process control knob training data indicative of process control knob settings applied during implementation of the process step; and generating a machine learning model correlating variations in the pre-process sets of scatterometric training data and the corresponding process control knob training data with the corresponding post-process sets of scatterometric training data, to train the machine learning model to recommend changes to process control knob settings to compensate for variations in the pre-process scatterometric data.
Barak Bringoltz, Ran Yacoby, Noam Tal, Shay Yogev, Boaz Sturlesi, Oded Cohen
Filed: 6 Apr 21
Utility
Method and system for broadband photoreflectance spectroscopy
31 Oct 23
Photoreflectance (PR) spectroscopy system and method for accumulating separately a “pump on” light beam and a “pump off light beam reflecting off a sample.
Yonatan Oren, Gilad Barak
Filed: 8 Dec 20
Utility
Optical Technique for Material Characterization
21 Sep 23
A polarized Raman Spectrometric system for defining parameters of a polycrystalline material, said system comprising: a polarized Raman Spectrometric apparatus, a computer-controlled sample stage for positioning a sample at different locations, and a computer comprising a processor and an associated memory.
Gilad BARAK, Yonatan OREN
Filed: 28 Dec 22
Utility
Systems and Methods for Optical Metrology
21 Sep 23
Abstract: Systems and methods for metrology of workpieces such as wafers, using spectrometry of multi- spot- arrays formed over a test area of the tester workpiece, for optically measuring characteristics of the tested workpiece, where the optical metrology system is configured such that the distribution of energy density or flux of the multi-spot-array over the test area of the tested workpiece is such that prevents affecting the workpiece during its testing.
Yonatan OREN, Eyal Hollander, Elad Schleifer, Gilad BARAK
Filed: 5 Jul 21
Utility
Metrology and process control for semiconductor manufacturing
19 Sep 23
A semiconductor metrology system including a spectrum acquisition tool for collecting, using a first measurement protocol, baseline scatterometric spectra on first semiconductor wafer targets, and for various sources of spectral variability, variability sets of scatterometric spectra on second semiconductor wafer targets, the variability sets embodying the spectral variability, a reference metrology tool for collecting, using a second measurement protocol, parameter values of the first semiconductor wafer targets, and a training unit for training, using the collected spectra and values, a prediction model using machine learning and minimizing an associated loss function incorporating spectral variability terms, the prediction model for predicting values for production semiconductor wafer targets based on their spectra.
Eitan Rothstein, Ilya Rubinovich, Noam Tal, Barak Bringoltz, Yongha Kim, Ariel Broitman, Oded Cohen, Eylon Rabinovich, Tal Zaharoni, Shay Yogev, Daniel Kandel
Filed: 12 Aug 21
Utility
Imaging metrology
7 Sep 23
A method for optical metrology of a sample, the method may include illuminating areas of the sample by sets of pulses of different wavelengths, during a movement of a variable speed of the sample; collecting light reflected from the sample, as a result of the illuminating, to provide sets of frames, each set of frames comprises partially overlapping frames associated with the different wavelengths; and processing the frames to provide optical metrology results indicative of one or more evaluated parameters of elements of the areas of the sample; wherein the processing is based on a mapping between the sets of frames and reference measurements obtained by an other optical metrology process that exhibits a higher spectral resolution than a spectral resolution obtained by the illuminating and the collecting.
Igor TUROVETS, Shimon YALOV, Alex Shichtman, Misha Matusovsky, Shachar PAZ
Filed: 27 Aug 21
Utility
Self-supervised representation learning for interpretation of OCD data
5 Sep 23
A system and methods for OCD metrology are provided including receiving multiple first sets of scatterometric data, dividing each set into k sub-vectors, and training, in a self-supervised manner, k2 auto-encoder neural networks that map each of the k sub-vectors to each other.
Ran Yacoby, Boaz Sturlesi
Filed: 6 Jan 21
Utility
TEM-based metrology method and system
25 Jul 23
A metrology method for use in determining one or more parameters of a three-dimensional patterned structure, the method including performing a fitting procedure between measured TEM image data of the patterned structure and simulated TEM image data of the patterned structure, determining a measured Lamellae position of at least one measured TEM image in the TEM image data from a best fit condition between the measured and simulated data, and generating output data indicative of the simulated TEM image data corresponding to the best fit condition to thereby enable determination therefrom of the one or more parameters of the structure.
Vladimir Machavariani, Michael Shifrin, Daniel Kandel, Victor Kucherov, Igor Ziselman, Ronen Urenski, Matthew Sendelbach
Filed: 18 Apr 22
Utility
X-ray based measurements in patterned structure
4 Jul 23
A method and system are presented for use in X-ray based measurements on patterned structures.
Gilad Barak
Filed: 23 Aug 21
Utility
Test structure design for metrology measurements in patterned samples
2 May 23
A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure having a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.
Gilad Barak, Oded Cohen, Igor Turovets
Filed: 11 Oct 21
Utility
Optical Phase Measurement System and Method
27 Apr 23
A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.
Gilad BARAK, Dror SHAFIR, Yanir HAINICK, Shahar Gov
Filed: 27 Sep 22
Utility
Measuring Local CD Uniformity Using Scatterometry and Machine Learning
27 Apr 23
A method, a system, and a non-transitory computer readable medium for measuring a local critical dimension uniformity of an array of two-dimensional structural elements, the method may include obtaining an acquired optical spectrometry spectrum of the array; feeding the acquired optical spectrometry spectrum of the array to a trained machine learning process, wherein the trained machine learning process is trained to map an optical spectrometry spectrum to an average critical dimension (CD) and a local critical dimension uniformity (LCDU); and outputting, by the trained machine learning process, the average CD and the LCDU of the array.
Dexin KONG, DANIEL SCHMIDT, Aron J. CEPLER, Marjorie CHENG, Roy KORET, Igor TUROVETS
Filed: 23 Feb 21
Utility
Optical Metrology System and Method
20 Apr 23
A measurement system is provided for use in optical metrology measurements.
Gilad BARAK, Amir Shayari
Filed: 24 Feb 21
Utility
Machine and Deep Learning Methods for Spectra-based Metrology and Process Control
20 Apr 23
A system and methods for Advance Process Control (APC) in semiconductor manufacturing include: for each of a plurality of waiter sites, receiving a pre-process set of scatterometric training data, measured before implementation of a processing step, receiving a corresponding post-process set of scatterometric training data measured after implementation of the process step, and receiving a set of process control knob training data indicative of process control knob settings applied during implementation of the process step; and generating a machine learning model correlating variations in the pre-process sets of scatterometric training data and the corresponding process control knob training data with the corresponding post-process sets of scatterometric training data, to train the machine learning model to recommend changes to process control knob settings to compensate for variations in the pre-process scatterometric data.
Barak BRINGOLTZ, Ran YACOBY, Noam TAL, Shay YOGEV, Boaz STURLESI, Oded COHEN
Filed: 6 Apr 21
Utility
Metrology Method and System
9 Mar 23
A metrology method for use in determining one or more parameters of a patterned structure, the method including providing raw measured TEM image data, TEMmeas, data indicative of a TEM measurement mode, and predetermined simulated TEM image data including data indicative of one or more simulated TEM images of a structure similar to the patterned structure under measurements and a simulated weight map including weights assigned to different regions in the simulated TEM image corresponding to different features of the patterned structure, performing a fitting procedure between the raw measured TEM image data and the predetermined simulated TEM image data and determining one or more parameters of the structure from the simulated TEM image data corresponding to a best fit condition.
VLADIMIR MACHAVARIANI, MICHAEL SHIFRIN, DANIEL KANDEL, VICTOR KUCHEROV, IGOR ZISELMAN, RONEN URENSKI, MATTHEW SENDELBACH
Filed: 19 Sep 22