1145 patents
Utility
Slurry Dispersion, Cosmetic and Method for Producing Same
18 Jan 24
A slurry dispersion containing (A) one or more selected from trimethylsiloxysilicic acid and derivatives thereof, (B) a hydrophobized coloring pigment, and (C) an oil that is liquid at 25° C., wherein blending with a cosmetic provides a good feel on use (light feel), good applicability (spread), and an excellent feeling of adhesion and suppresses color unevenness by improving pigment dispersibility.
Masayuki KONISHI, Masaru MIYAUCHI
Filed: 8 Nov 21
Utility
Composite Substrate
18 Jan 24
A composite substrate that is obtained by bonding a silicon (Si) wafer having an interstitial oxygen concentration of 2 to 10 ppma to a piezoelectric material substrate as a support substrate, and thinning the piezoelectric material substrate after the bonding.
Shoji AKIYAMA, Shozo SHIRAI, Masayuki TANNO
Filed: 20 Sep 23
Utility
Composition For Forming Metal Oxide Film, Patterning Process, And Method For Forming Metal Oxide Film
18 Jan 24
Naoki KOBAYASHI, Nobuhiro NAGAMACHI, Daisuke KORI
Filed: 6 Jul 23
Utility
Organosilicon Compound, Hydrolysis Condensation Product of Same, and Coating Composition
11 Jan 24
Kazunori TAKAGI, Munenao HIROKAMI, Fumihiro ASO
Filed: 21 Oct 21
Utility
Quantum Dot Surface Treatment Method and Surface Treatment Apparatus
11 Jan 24
A quantum dot surface treatment method including continuously supplying a solution containing a silicone compound and a quantum dot having a surface to which a ligand having a coordinating substituent and a reactive substituent is coordinated by virtue of the coordinating substituent, to a reaction flow path made of a material that transmits light, and emitting light to the reaction flow path, so that the silicone compound and the reactive substituent undergo a photopolymerization reaction, thereby coating the surface of the quantum dot with the silicone compound.
Yoshihiro NOJIMA, Shinji AOKI, Kazuya TOBISHIMA
Filed: 30 Nov 21
Utility
Pellicle Frame, Pellicle, and Method for Peeling Pellicle
11 Jan 24
The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
Yu YANASE
Filed: 19 Sep 23
Utility
Lift Method of Optical Devices, Lift Apparatus for Optical Devices, Manufacturing Method for Receptor Substrate Having Transferred Optical Devices, and Manufacturing Method for Display
11 Jan 24
The present invention provides a method of relocating optical devices onto a carrier substrate in a case where a pixel pitch of a display is not an integer multiple of a pitch of the optical devices arrayed on a sapphire substrate.
Hiroshi Yamaoka, Nobutaka Uemori, Satoki Nakada, Takeshi Saito, Shusaku Ozawa, Shinichi Sato, Masami Kurata, Masahiko Sato, Tsukasa Abe, Tsuyoshi Noguchi, Taketo Usami
Filed: 29 Sep 21
Utility
Room Temperature Curable Organopolysiloxane Composition, Article, Hydrolyzable Organosilane Compound and Method for Producing Same
4 Jan 24
Akira UTA
Filed: 16 Aug 21
Utility
Anti-fouling Silicone Composite Sheet and Method for Performing Prevention of Graffiti Using Same
4 Jan 24
An anti-fouling silicone composite sheet including: a substrate layer containing a fluororesin; and a silicone adhesive layer stacked on one surface of the substrate layer, having a hardness of 5 or less as measured with an Asker C hardness tester, and having an adhesive force with respect to a mortar test piece of 5 N/25 mm or more, wherein the substrate layer has a surface on which the silicone adhesive layer is stacked and the other surface is an anti-fouling surface.
Keiji IMAIZUMI, Akihiro ENDO, Masaki MOTEKI
Filed: 22 Nov 21
Utility
Pellicle Frame, Pellicle, and Method for Peeling Pellicle
4 Jan 24
The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
Yu YANASE
Filed: 18 Sep 23
Utility
Pellicle Frame, Pellicle, and Method for Peeling Pellicle
4 Jan 24
The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
Yu YANASE
Filed: 18 Sep 23
Utility
Pellicle Frame, Pellicle, and Method for Peeling Pellicle
4 Jan 24
The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
Yu YANASE
Filed: 19 Sep 23
Utility
Composite Substrate, Surface Acoustic Wave Device, and Method for Manufacturing Composite Substrate
28 Dec 23
A method for manufacturing a composite substrate includes: forming a first intermediate layer including thermally synthesized silica on a surface of a support substrate; forming a second intermediate layer including an inorganic material on a surface of a piezoelectric single crystal substrate; flattening a surface of the second intermediate layer; and bonding a surface of the first intermediate layer to the flattened surface of the second intermediate layer.
Shoji AKIYAMA, Masayuki TANNO
Filed: 8 Sep 23
Utility
Curable Resin Composition, Semiconductor Encapsulation Material, Adhesive, Adhesive Film, Prepreg, Interlayer Insulating Material, and Printed-wiring Board
28 Dec 23
Yoshihiro TSUTSUMI, Yuki KUDO, Tadaharu IKEDA, Hiroyuki IGUCHI, Atsushi TSUURA
Filed: 14 Jun 23
Utility
Fluoroplastic Substrate for High-speed Communications and Copper-clad Fluoroplastic Substrate for High-speed Communications
28 Dec 23
A fluoroplastic substrate for high-speed communications has a dielectric loss tangent at 40 GHz of from 0.0001 to 0.0008 and a permittivity at 40 GHz of from 2.0 to 3.2.
Toshio Shiobara, Ryunosuke Nomura, Hajim Itokawa
Filed: 23 Jun 23
Utility
Coating Agent Composition, Surface Treatment Agent Comprising Said Composition, and Article Surface-treated with Said Surface Treatment Agent
28 Dec 23
Seiya MORI
Filed: 1 Nov 21
Utility
Solar Cell with High Photoelectric Conversion Efficiency and Method for Manufacturing Solar Cell with High Photoelectric Conversion Efficiency
28 Dec 23
A method for manufacturing a solar cell, including the steps of: forming unevenness on both of main surfaces of a semiconductor substrate of a first conductivity type; forming an emitter layer on a first main surface of the semiconductor substrate; forming a diffusion mask on the emitter layer; removing the diffusion mask in a pattern; forming a base layer on the portion where the diffusion mask have been removed; removing the remaining diffusion mask; forming a dielectric film on the first main surface; forming a base electrode on the base layer; and forming an emitter electrode on the emitter layer.
Takenori WATABE, Hiroshi HASHIGAMI, Hiroyuki OHTSUKA
Filed: 7 Jul 23
Utility
Substrate for Mask Blanks and Method for Manufacturing the Same
28 Dec 23
A substrate for mask blanks having first and second main surfaces of 152 mm×152 mm square and a thickness of 6.35 mm, wherein: when a range of 132 mm×132 mm square centered on an intersection of diagonal lines is defined as a calculation region in each of the first and second main surfaces, on a substrate surface of the calculation region of at least one of the first and second main surfaces, flatness of the substrate surface of the calculation region based on a least square plane is 100 nm or less, and a difference (PV) between a highest value and a lowest value of a height of a calculation surface represented by a difference between shapes of the substrate surfaces before and after smoothing processing with a Gaussian filter (10 mm×10 mm) based on the least square plane is 20 nm or less.
Tomoaki SUGIYAMA, Daijitsu HARADA, Harunobu MATSUI, Naoki YARITA, Masaki TAKEUCHI
Filed: 1 Jun 23
Utility
Chemically Amplified Resist Composition and Patterning Process
28 Dec 23
A chemically amplified resist composition comprising a quencher and an acid generator is provided.
Jun Hatakeyama, Masahiro Fukushima
Filed: 22 Jun 23
Utility
Novel Sulfonium Salt, Resist Composition, And Patterning Process
28 Dec 23
Masahiro FUKUSHIMA, Satoshi WATANABE, Jun HATAKEYAMA, Keiichi MASUNAGA, Masaaki KOTAKE, Yuta MATSUZAWA
Filed: 12 May 23