855 patents
Page 11 of 43
Utility
Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
15 Nov 22
Daisuke Kori, Keisuke Niida, Takashi Sawamura, Seiichiro Tachibana, Takeru Watanabe, Tsutomu Ogihara
Filed: 16 Apr 20
Utility
Method for preparing ceramic molded body for sintering and method for producing ceramic sintered body
8 Nov 22
A method includes molding a raw material powder containing a ceramic powder and a thermoplastic resin having a glass transition temperature higher than room temperature into a shape by isostatic pressing and in which a raw material powder slurry is prepared by adding the ceramic powder and the thermoplastic resin to a solvent so that the thermoplastic resin is 2% by weight or more and 40% by weight or less with respect to a total weight of the ceramic powder and the thermoplastic resin, a cast-molded body is to formed by wet-casting the raw material powder slurry into a shape, dried, and subjected to first-stage isostatic press molding at a temperature lower than the glass transition temperature of the thermoplastic resin, then this first-stage press-molded body is heated to the glass transition temperature of the thermoplastic resin or above, and warm isostatic press (WIP) molding is performed.
Masanori Ikari, Takuto Matsumoto
Filed: 10 May 19
Utility
Epoxy compound, resist composition, and pattern forming process
8 Nov 22
Masayoshi Sagehashi, Ryosuke Taniguchi, Takeru Watanabe, Yoshinori Matsui
Filed: 25 Feb 20
Utility
Transparent desiccant for organic EL, and method for using same
8 Nov 22
Hiroto Ohwada, Minoru Igarashi, Tsutomu Nakamura
Filed: 19 Feb 19
Utility
Resist composition and patterning process
8 Nov 22
A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group which may contain an ester bond or ether bond and a carboxylate anion having an iodized or brominated hydrocarbyl group offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
Jun Hatakeyama, Takayuki Fujiwara
Filed: 2 Jul 20
Utility
Poly(meth)acrylate, and coating composition and coated article containing same
1 Nov 22
Koichi Higuchi
Filed: 10 Apr 18
Utility
Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process
1 Nov 22
Toshiharu Yano, Ryo Mitsui, Kazunori Maeda, Tsutomu Ogihara, Seiichiro Tachibana
Filed: 2 Jan 20
Utility
Production method for silica-coated spherical silicone elastomer particles and silica-coated spherical silicone elastomer particles
1 Nov 22
A method for producing silica-coated spherical silicone elastomer particles which includes a step in which a tetraalkoxysilane (E) is added to a liquid comprising spherical silicone elastomer particles (A), an alkaline substance (B), one or more ingredients (C) selected from among cationic surfactants and cationic water-soluble polymers, and water (D), and the tetraalkoxysilane is hydrolyzed and condensed to thereby coat the surfaces of the spherical silicone elastomer particles with silica.
Yoshinori Inokuchi
Filed: 5 Oct 18
Utility
Rare earth permanent magnets and their preparation
25 Oct 22
A sintered magnet body (RaT1bMcBd) coated with a powder mixture of an intermetallic compound (R1iM1j, R1xT2yM1z, R1iM1jHk), alloy (M1dM2e) or metal (M1) powder and a rare earth (R2) oxide is diffusion treated.
Hiroaki Nagata, Tadao Nomura, Takehisa Minowa
Filed: 26 Feb 20
Utility
Film-forming composition and film
25 Oct 22
There is provided a film-forming composition, including: a first water-soluble cellulose ether (WSCE) having a viscosity at 20° C. of 2.5 to 45 mPa·s, a second WSCE having a viscosity at 20° C. of 6.0 to 50.0 mPa·s, a third WSCE having a viscosity at 20° C. of 4.5 to 15.0 mPa·s, each viscosity being determined in a 2% by mass aqueous solution, and a solvent, wherein the first WSCE is selected from four members of hydroxypropyl methyl celluloses Ia and Ib in Group I and hydroxypropyl methyl cellulose IIa and methyl cellulose IIb in Group II, the second WSCE is the same member as that of the first WSCE, provided that the substitution degree(s) of the second WSCE may be the same as or different from that of the first WSCE, and the third WSCE is selected from members in a Group different from the Group of the first WSCE.
Shintaro Matsusue, Takuya Yokosawa
Filed: 9 Mar 21
Utility
Method for producing GaN laminate substrate having front surface which is Ga polarity surface
25 Oct 22
The present invention includes: transferring a C-plane sapphire thin film 1t having an off-angle of 0.5-5° onto a handle substrate composed of a ceramic material having a coefficient of thermal expansion at 800 K that is greater than that of silicon and less than that of C-plane sapphire; performing high-temperature nitriding treatment on the GaN epitaxial growth substrate 11 and covering the surface of the C-plane sapphire thin film 1t with a surface treatment layer 11a made of AlN; having GaN grow epitaxially on the surface treatment layer 11a; ion-implanting a GaN film 13; pasting and bonding together the GaN film-side surface of the ion-implanted GaN film carrier and a support substrate 12; performing peeling at an ion implantation region 13ion in the GaN film 13 and transferring a GaN thin film 13a onto the support substrate 12; and obtaining a GaN laminate substrate 10.
Yoshihiro Kubota, Kazutoshi Nagata
Filed: 1 Aug 19
Utility
Pellicle frame, pellicle, and method for pelling pellicle
25 Oct 22
The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
Yu Yanase
Filed: 26 Jan 21
Utility
Resist composition and patterning process
25 Oct 22
A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group and an anion derived from an iodized or brominated phenol offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
Jun Hatakeyama, Takayuki Fujiwara
Filed: 21 Jul 20
Utility
Composition for forming silicon-containing resist underlayer film and patterning process
25 Oct 22
The present invention provides a resist underlayer film capable of improving LWR and CDU in a fine pattern formed by a chemically-amplified resist which uses an acid as a catalyst.
Tsutomu Ogihara, Tsukasa Watanabe, Yusuke Biyajima, Masahiro Kanayama
Filed: 4 Mar 20
Utility
Paramagnetic garnet-type transparent ceramic, magneto-optical material, and magneto-optical device
18 Oct 22
Masanori Ikari
Filed: 4 Apr 18
Utility
Pellicle frame, pellicle, and method of producing pellicle frame
18 Oct 22
The present invention relates to a pellicle frame including a frame base, a black anodized film formed on a surface of the frame base and having a thickness of 2.0 to 7.5 μm, and a transparent polymer electrodeposition coating film formed on the anodized film, and a production method thereof; and to a pellicle including the pellicle frame and a pellicle film provided on one end face of the pellicle frame.
Yuichi Hamada
Filed: 6 Apr 21
Utility
Method for producing synthetic quartz glass substrate
11 Oct 22
The invention provides a method for producing a synthetic quartz glass substrate, the method includes arranging spacers to be in contact with outer peripheral side surfaces of a synthetic quartz glass substrate, arranging plate materials to be in contact with the outer peripheral side surfaces of the spacers in a state that the plates are protruded from the surface of the substrate, and sandblasting the surface of the substrate.
Yoko Ishitsuka, Atsushi Watabe, Masaki Takeuchi
Filed: 4 Jun 19
Utility
Cyclic aminoorganoxysilane compound and process for producing the same
11 Oct 22
Yoichi Tonomura
Filed: 19 Jun 19
Utility
Curable silicone release composition
4 Oct 22
Provided is a silicone composition having components (A) to (E):100 parts by mass of (A) a linear, branched, or network organopolysiloxane having a vinyl value of 0.01 mol/100 g or more and 0.04 mol/100 g or less and a viscosity of 100 mm2/sec or more and 500 mm2/sec or less at 25° C., wherein each of terminals of the organopolysiloxane has one or more alkenyl groups; 0.01 to 3 parts by mass of (B) a linear, branched, or network organopolysiloxane having a vinyl value of 0.2 mol/100 g or more and 1.2 mol/100 g or less and a viscosity of 2 mm2/sec or more and 60 mm2/sec or less at 25° C., wherein each of terminals of the organopolysiloxane has one or more alkenyl groups; (C) an organohydrogenpolysiloxane having an amount of 1 mol/100 g or more and 2 mol/100 g or less of an SiH group, wherein a ratio of the number of the SiH group in component (C) to a total number of the alkenyl groups in components (A) and (B) is 1 to 5; 0.01 to 10 parts by mass of (D) an addition-reaction control agent, relative to total 100 parts by mass of components (A), (B), and (C); and a catalytic amount of (E) a platinum group metal catalyst.
Ataru Kobayashi, Toshiaki Ihara
Filed: 21 Nov 18
Utility
Silicone composition for release paper or release film, and release paper and release film
4 Oct 22
A compound that is devoid of epoxy groups and has a quantity of alkenyl groups corresponding to 5-1000 times the alkenyl content of a base polymer, and/or an organopolysiloxane that is devoid of alkenyl groups, has an average degree of polymerization of 2-50, and contains, per molecule, 30 mol % or more of siloxane units having epoxycyclohexyl groups bonded to silicon atoms via carbon atoms, are/is blended with a silicone composition for a release film as adhesion-enhancing components.
Ken Nakayama
Filed: 5 Jul 16