837 patents
Utility
Polishing Apparatus and Polishing Method
18 Jan 24
Akihiro YAZAWA, Yasuyuki MIYASAWA
Filed: 19 Aug 21
Utility
Machine Learning Apparatus, Sliding-surface Diagnosis Apparatus, Inference Apparatus, Machine Learning Method, Machine Learning Program, Sliding-surface Diagnosis Method, Sliding-surface Diagnosis Program, Inference Method, and Inference Program
11 Jan 24
A machine learning apparatus (4) generates a learning model (6) to be used in a sliding-surface diagnosis apparatus (1A) for diagnosing a condition of sliding surfaces of a fixed-side sliding member and a rotation-side sliding member.
Chikako TAKATOH, Yumiko NAKAMURA, Kazuhiko SUGIYAMA, Tomomi HONDA
Filed: 24 Sep 21
Utility
6b01ms2k916nd6r0u jpljeaau5998d9ayqwab2poclok48f
11 Jan 24
The present invention relates to a technique of preventing idling rotation of a submersible pump used for delivering liquefied gas, such as liquefied ammonia, liquid hydrogen, liquid nitrogen, liquefied natural gas, liquefied ethylene gas, or liquefied petroleum gas.
Shuichiro HONDA, Tetsuji KASATANI, Hayato IKEDA, Mitsutaka IWAMI
Filed: 27 Aug 21
Utility
lzkthkupgei0t2a5232rubssn
9 Jan 24
A polishing apparatus which can efficiently polish an entirety of a back surface of a substrate, with the back surface facing downward, is disclosed.
Kenichi Kobayashi, Masayuki Nakanishi, Makoto Kashiwagi, Manao Hoshina
Filed: 17 Oct 18
Utility
8mrl9pf1nkr5bwlr9923 0efttrg4q4d3kkks
9 Jan 24
In a plating apparatus, a short circuit of a wiring between a rectifier and a plating device is detected without using a substrate in vain.
Hideki Wakabayashi, Tensei Sato, Kazuma Ideguchi
Filed: 10 Dec 21
Utility
mq3j3zlvw4r15df27w3hrbam1p2q7p1qu426fhd22nd7
9 Jan 24
A substrate processing apparatus includes a first processing unit and a second processing unit placed in upper and lower two stages.
Koji Maeda, Mitsuhiko Inaba, Haiyang Xu, Tetsuya Yashima
Filed: 9 Aug 18
Utility
eg8vyd9kuds2r0yk13y56dtrzpvhbtei 2al8j0xrft31h8hbg2u
4 Jan 24
Asagi MATSUGU, Akihiro YAZAWA, Manato FURUSAWA, Hideharu AOYAMA, Ayumu SAITO, Yusuke SASAYA, Kenichi KOBAYASHI, Yasuyuki MIYASAWA, Tsuyoshi SOMA, Keiichi NOJO
Filed: 25 Oct 21
Utility
0btoa4kqlfz8niqmm9ftthemf2r8bqiy5ys1pw6 05u
4 Jan 24
The present invention constructs, in an AM system, such an environment that fine particles are prevented from scattering from an area where the fine particles such as a powder material can be present to another area.
Hiroyuki SHINOZAKI, Junki ASAI, Yoshitaka MUKAIYAMA
Filed: 14 Sep 21
Utility
yhacds54dq4q0rfbnu7yo9fu
4 Jan 24
A retainer is disposed around a holding region 39 of a polygonal substrate WF in a top ring for holding the polygonal substrate WF with a surface to be polished facing downward.
Yu ISHII
Filed: 22 Oct 21
Utility
pdqyy2gtscxyxsi3vk2npz3rqbeo2nvr7hi4tqwfnzkoav0a3j0ljwbcpj
4 Jan 24
There is provided a substrate holder configured to hold a substrate such that the substrate is exposed to and is brought into contact with a plating solution to be plated.
Naoto TAKAHASHI
Filed: 24 May 23
Utility
bfg6m1km3mprq6j5q2pfgxlqm4aq4ufzc50c3ezmljdf7cx6ol50wmpq
4 Jan 24
Makoto KASHIWAGI
Filed: 20 Jul 21
Utility
gpx ch204cudlvlatkkp0hggfq6rtelmxq81nhophudwmah16pkgrwh70
2 Jan 24
A resin molded rotor includes a rotor, a main shaft, and a resin mold.
Takanori Inada, Kozo Matake
Filed: 9 Jun 21
Utility
4f8x1mw5swwghg8hp0wvy21vc22djn cgyaad5867
28 Dec 23
A method is provided and includes making a polishing table and a dummy disk rotate; bringing the dummy disk into contact with a table surface of the polishing table while a liquid is supplied to the table surface; measuring heights of the table surface at a plurality of measurement points while the dummy disk is moved on the table surface; and creating a table profile showing tilt of the table surface from measurement values of the heights of the table surface.
HIROYUKI SHINOZAKI, YASUYUKI MOTOSHIMA
Filed: 13 Sep 23
Utility
uyn1spr1cp108dvr9kcmio jg
21 Dec 23
An embodiment of the present invention provides a buff process module.
Kuniaki YAMAGUCHI, Itsuki KOBATA, Toshio MIZUNO, Mitsuru MIYAZAKI, Naoki TOYOMURA, Takuya INOUE
Filed: 5 Jul 23
Utility
0bfk4nxzpals08bu7f9 divfvyygnfer6ncwitmyitusrr6
19 Dec 23
Provided is a technique that allows suppressing a liquid splash of a plating solution.
Masaya Seki, Shao Hua Chang
Filed: 8 Feb 22
Utility
oqx s32w8d8mbq0p28vq8exhv5ujf098289w7q7fa15z0oz0o3
19 Dec 23
A sensor target cover capable of preventing an optical liquid level detection sensor from erroneously detecting a rise in a liquid level is provided.
Naoki Toyomura, Mitsuru Miyazaki
Filed: 6 Aug 19
Utility
vynce7jba7k3t6onlta702x1irncpq2rlath27g66 x1xu4bk82hcup0zy
19 Dec 23
As an aspect of the present invention, a cleaning apparatus for cleaning member has a holding part holding a cleaning member assembly having a cleaning member; an inner cleaning liquid supply part; an outer cleaning liquid supply part; and a control part controlling the substrate cleaning apparatus to perform a first process in which the cleaning member is pressed against a dummy substrate at a first pressure and the outer cleaning liquid supply part supplies the cleaning liquid to the dummy substrate, and to perform a second process in which the cleaning member is separated from the dummy substrate or is pressed against the dummy substrate at a second pressure which is equal to or less than the first pressure and the inner cleaning liquid supply part supplies the cleaning liquid.
Takayuki Kajikawa, Takeshi Iizumi, Masayoshi Imai
Filed: 25 Mar 21
Utility
lz2ykiwy0k9roof jcokj1p89bt7i
14 Dec 23
The present invention provides a powder supply apparatus.
Hiroyuki SHINOZAKI, Junki ASAI
Filed: 14 Sep 21
Utility
cfgyp51q69v9m7okdmlzfsx8q37eq
14 Dec 23
Provided are a plating apparatus and a plating method for preventing or mitigating electric field diversion irrespective of the physical or mechanical structure.
Naoto TAKAHASHI
Filed: 1 Jun 21
Utility
xyuk261zi6s7mfhteidv7uuj2rny50rjdzpngrbilu m4h
12 Dec 23
A pad-temperature regulating apparatus is disclosed, which includes a heat exchanger capable of being cleaned in a limited space.
Keisuke Kamiki, Toru Maruyama, Yasuyuki Motoshima
Filed: 10 Mar 22