17 patents
Utility
Polymer compositions for self-assembly applications
6 Dec 22
Hengpeng Wu, Jian Yin, Guanyang Lin
Filed: 16 Aug 17
Utility
Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer
23 Aug 22
M. Dalil Rahman, Huirong Yao, JoonYeon Cho, Munirathna Padmanaban, Elizabeth Wolfer
Filed: 19 Dec 17
Utility
Enviromentally stable, thick film, chemically amplified resist
12 Jul 22
Environmentally stable, chemically amplified (CA) positive resist compositions are described.
Medhat A. Toukhy, Weihong Liu, PingHung Lu
Filed: 7 Aug 17
Utility
Lithography composition, a method for forming resist patterns and a method for making semiconductor devices
26 Oct 21
The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.
Kazuma Yamamoto, Maki Ishii, Tomoyasu Yashima, Tatsuro Nagahara
Filed: 21 Nov 17
Utility
Compositions and processes for self-assembly of block copolymers
20 Jul 21
Hengpeng Wu, JiHoon Kim, Jianhui Shan, Durairaj Baskaran, Md S. Rahman
Filed: 19 Dec 17
Utility
Black matrix composition, black matrix, and black matrix production method
8 Jun 21
Hirohiko Nishiki, Tohru Okabe, Izumi Ishida, Shogo Murashige, Atsuko Noya, Toshiaki Nonaka, Naofumi Yoshida
Filed: 7 Dec 17
Utility
Chemically amplified positive photoresist composition and pattern forming method using same
8 Jun 21
The present invention relates to a photosensitive resin composition suitable for forming a thick film, which comprises (A) an alkali-soluble resin, (B) at least one plasticizer selected from a group consisting of an alkali-soluble vinyl resin and an acid-dissociable group containing vinyl resin, (C) an acid generator, and (D) an organic solvent.
Tetsumasa Takaichi, Shunji Kawato, Masato Suzuki, Kazumichi Akashi, Tomohide Katayama
Filed: 10 Oct 17
Utility
Siloxazane compound and composition comprising the same, and method for producing silceous film using the same
9 Feb 21
To provide a siloxazane compound capable of shortening the time of a siliceous film producing process and a composition comprising the same.
Toshiya Okamura, Naotaka Nakadan, Bertram Barnickel, Rikio Kozaki, Naoko Nakamoto
Filed: 21 Nov 17
Utility
Black Matrix Composition, BLCK Matrix, and Black Matrix Production Method
2 Sep 20
Hirohiko NISHIKI, TOHRU OKABE, IZUMI ISHIDA, SHOGO MURASHIGE, Atsuko NOYA, Toshiaki NONAKA, Naofumi YOSHIDA
Filed: 6 Dec 17
Utility
Enviromentally Stable, Thick Film, Chemically Amplified Resist
10 Jun 20
Environmentally stable, chemically amplified (CA) positive resist compositions are described.
Medhat A. Toukhy, Weihong Liu, PingHung Lu
Filed: 6 Aug 17
Utility
Composition of Spin-on Materials Containing Metal Oxide Nanoparticles and an Organic Polymer
18 Mar 20
M. Dalil RAHMAN, Huirong YAO, JoonYeon CHO, Munirathna PADMANABAN, Elizabeth WOLFER
Filed: 18 Dec 17
Utility
Novel Compositions and Processes for Self-assembly of Block Copolymers
15 Jan 20
Hengpeng Wu, JiHoon Kim, Jianhui Shan, Durairaj Baskaran, Md S. Rahman
Filed: 18 Dec 17
Utility
a Lithography Composition, a Method for Forming Resist Patterns and a Method for Making Semiconductor Devices
11 Dec 19
The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.
Kazuma YAMAMOTO, Maki ISHII, Tomoyasu YASHIMA, Tatsuro NAGAHARA
Filed: 20 Nov 17
Utility
Inorganic polysilazane resin
2 Dec 19
An inorganic polysilazane resin of the present invention has a Si/N ratio (i.e. a ratio of contained silicon atoms to contained nitrogen atoms) of 1.30 or more.
Takashi Fujiwara, Ralf Grottenmueller, Takashi Kanda, Tatsuro Nagahara
Filed: 9 May 17
Utility
Template for self assembly and method of making a self assembled pattern
28 Oct 19
Disclosed and claimed herein is a template for directing a pattern in a block copolymer film and the process of making the pattern.
Jihoon Kim, Jinxiu Wan, Shinji Miyazaki, Guanyang Lin, Hengpeng Wu
Filed: 12 May 13
Utility
Composite of silicon oxide nanoparticles and silsesquioxane polymer, method for producing same, and composite material produced using composite thereof
7 Oct 19
An object of the present invention is to provide a composite of silicon oxide nanoparticles and a silsesquioxane polymer, from which a cured film having a low refractive index can be formed inexpensively.
Naofumi Yoshida, Yuji Tashiro, Daishi Yokoyama, Toshiaki Nonaka
Filed: 18 Dec 13
Utility
Siloxazane Compound and Composition Comprising the Same, and Method for Producing Silceous Film Using the Same
2 Oct 19
To provide a siloxazane compound capable of shortening the time of a siliceous film producing process and a composition comprising the same.
Toshiya OKAMURA, Naotaka NAKADAN, Bertram BARNICKEL, Rikio KOZAKI, Naoko NAKAMOTO
Filed: 20 Nov 17
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