47 patents
Utility
Pecvd Apparatus for In-situ Deposition of Film Stacks
16 Nov 23
An apparatus for depositing film stacks in-situ (i.e., without a vacuum break or air exposure) are described.
Jason Dirk Haverkamp, Pramod Subramonium, Joseph L. Womack, Dong Niu, Keith Fox, John B. Alexy, Patrick G. Breiling, Jennifer L. Petraglia, Mandyam A. Sriram, George Andrew Antonelli, Bart J. van Schravendijk
Filed: 13 Jul 23
Utility
PECVD apparatus for in-situ deposition of film stacks
5 Sep 23
An apparatus for depositing film stacks in-situ (i.e., without a vacuum break or air exposure) are described.
Pramod Subramonium, Joseph L. Womack, Dong Niu, Keith Fox
Filed: 28 Dec 18
Utility
Films of desired composition and film properties
22 Aug 23
Provided are methods and systems for providing silicon-containing films.
Bhadri N. Varadarajan
Filed: 25 Mar 22
Utility
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
15 Aug 23
A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion.
Chunguang Xia, Ramesh Chandrasekharan, Douglas Keil, Edward J. Augustyniak, Karl Frederick Leeser
Filed: 20 Aug 21
Utility
Films of desired composition and film properties
25 Jul 23
Provided are methods and systems for providing silicon-containing films.
Bhadri N. Varadarajan
Filed: 25 Mar 22
Utility
Lipseals and Contact Elements for Semiconductor Electroplating Apparatuses
9 Mar 23
Disclosed are cup assemblies for holding, sealing, and providing electrical power to a semiconductor substrate during electroplating which may include a cup bottom element having a main body portion and a moment arm, an elastomeric sealing element disposed on the moment arm, and an electrical contact element disposed on the elastomeric sealing element.
Jingbin FENG, Robert Marshall STOWELL, Shantinath GHONGADI, Ashwin RAMESH
Filed: 26 Oct 22
Utility
Tungsten Feature Fill with Nucleation Inhibition
9 Feb 23
Described herein are methods of filling features with tungsten, and related systems and apparatus, involving inhibition of tungsten nucleation.
Anand CHANDRASHEKAR, Esther JENG, Raashina Humayun, Michal DANEK, Juwen GAO, Deqi WANG
Filed: 28 Jun 22
Utility
Electroplating apparatus for tailored uniformity profile
10 Jan 23
An electroplating apparatus for electroplating metal on a substrate includes a plating chamber configured to contain an electrolyte, a substrate holder configured to hold and rotate the substrate during electroplating, an anode, and an azimuthally asymmetric auxiliary electrode configured to be biased both anodically and cathodically during electroplating.
Steven T. Mayer, David W. Porter, Bryan L. Buckalew, Robert Rash
Filed: 4 Jan 21
Utility
Cleaning electroplating substrate holders using reverse current deplating
3 Jan 23
Provided are cleaning methods and systems to remove unintended metallic deposits from electroplating apparatuses using reverse current deplating techniques.
Lee Peng Chua, Steven T. Mayer, Thomas A. Ponnuswamy, Santosh Kumar
Filed: 16 Dec 19
Utility
Lipseals and contact elements for semiconductor electroplating apparatuses
29 Nov 22
Disclosed are cup assemblies for holding, sealing, and providing electrical power to a semiconductor substrate during electroplating which may include a cup bottom element having a main body portion and a moment arm, an elastomeric sealing element disposed on the moment arm, and an electrical contact element disposed on the elastomeric sealing element.
Jingbin Feng, Robert Marshall Stowell, Shantinath Ghongadi, Ashwin Ramesh
Filed: 18 May 18
Utility
Tungsten Feature Fill with Nucleation Inhibition
10 Nov 22
Described herein are methods of filling features with tungsten, and related systems and apparatus, involving inhibition of tungsten nucleation.
Tsung-Han YANG, Anand CHANDRASHEKAR, Jasmine LIN
Filed: 22 Jul 22
Utility
Tungsten feature fill with nucleation inhibition
6 Sep 22
Described herein are methods of filling features with tungsten, and related systems and apparatus, involving inhibition of tungsten nucleation.
Tsung-Han Yang, Anand Chandrashekar, Jasmine Lin
Filed: 28 Jun 19
Utility
Tungsten feature fill with nucleation inhibition
9 Aug 22
Described herein are methods of filling features with tungsten, and related systems and apparatus, involving inhibition of tungsten nucleation.
Anand Chandrashekar, Esther Jeng, Raashina Humayun, Michal Danek, Juwen Gao, Deqi Wang
Filed: 6 Mar 19
Utility
Films of Desired Composition and Film Properties
14 Jul 22
Provided are methods and systems for providing silicon-containing films.
Bhadri N. VARADARAJAN
Filed: 25 Mar 22
Utility
Films of Desired Composition and Film Properties
14 Jul 22
Provided are methods and systems for providing silicon-containing films.
Bhadri N. VARADARAJAN
Filed: 25 Mar 22
Utility
Films of Desired Composition and Film Properties
14 Jul 22
Provided are methods and systems for providing silicon-containing films.
Bhadri N. VARADARAJAN
Filed: 25 Mar 22
Utility
Films of Desired Composition and Film Properties
14 Jul 22
Provided are methods and systems for providing silicon-containing films.
Bhadri N. VARADARAJAN
Filed: 25 Mar 22
Utility
Conformal Deposition of Silicon Carbide Films
12 May 22
Disclosed are methods and systems for providing silicon carbide films.
Bhadri N. VARADARAJAN, Bo GONG, Zhe GUI
Filed: 27 Jan 22
Utility
Films of Desired Composition and Film Properties
31 Mar 22
Provided are methods and systems for providing silicon-containing films.
Bhadri N. Varadarajan
Filed: 13 Dec 21
Utility
Conformal deposition of silicon carbide films
1 Mar 22
Disclosed are methods and systems for providing silicon carbide films.
Bhadri N. Varadarajan, Bo Gong, Zhe Gui
Filed: 1 May 19