United The this outstanding posted job QX quarter. did you Thanks results. for Anthony. thank an everyone Good joining team financial the solid We call. afternoon Veeco and
our X. the strong term to continuing record and came our data are storage near our invest high Day in $XXX at of shared guided towards sales with by our Analyst progress million, long revenue revenue. targets are and guidance of we or at for on end driven All we financial QX September We making metrics growth semiconductor
came achieved Our of to we and margin diluted operating non-GAAP of gross million, in income XX% leading non-GAAP EPS $X.XX. $XX at non-GAAP
Our qXuarterly revenue XX% up is year-on-year.
period driven highest at a achieved the we in XX% quarterly $XX same generated increase revenue, by compared revenue sales years. and generated growth, year in XX% amount last which million operations, flow cash Looking the is semiconductor year-to-date all seven we from in
We a disclosures us operations in more values a have building greatly and aligned afternoon, few such commitment continuing in making stakeholders and lasting social been it transformation will all to sustainable transformation report. actions the We environmental to the We Part of core this areas, our our includes global help are so Veeco's these becoming years changes, transforming our of second improvements transparent set over our our while core of fundamental more. footprint, of improve environmental and company. includes culture. these advantage our to with Many serve to practicing values. governance, know report but our last sustainability progress and improve make improved minimizing and much developing to the company published continue This better more our take megatrends. reflected as inclusive we good
better in for served expand our address to customers. with We better this additions. our capacity and billion allows is grow update and XXXX market targeted our drive to expected that over to that well-publicized turn let's is It's fab equipment $XX market semiconductor wafer Now solutions be major us with from in that lines advancement technological there. product performance three has win resulted both where been expected on market. This and to XXXX specific market. opportunities. spending Enabling innovation Beginning reflects spending our strength in our further applications equipment is performance
The XX%, In shared at a our than long market semiconductor of that long we opportunity used production approximately beam our over the and production nodes, mask advanced deposition both faster are fact, advanced CAGR currently which to for packaging. blank WFE systems in expect grow product laser lithography logic trailing growth. Analyst we much is annealing, at lines three at EUV ion Day term, our forecasted for term and
in the times of by products improved Our laser process its are device for enables solutions performance. because laser superior annealing with Customers steps. critical capability. used annealing shortest manufacturers device roll their Veeco's choose This most annealing
We at are currently customers. multiple record production
have few work in new we their We this term, this we the they term, our to market ways. we nodes. out another with annealing quarter to longer current demos memory with continue expect next expect logic customers growth existing the build customer. on logic line and and as near important evaluation product by a logic systems engaged significant We progress existing on systems And customers to nodes. to are driven expansion revenue laser time. strong with will over In penetrate driven, a In in market making had from come customers
market correction. critical product the progression of for serving lithography systems ion for Law. Moore's EUV the semiconductor beam EUV is is deposition Our our next mask blank
lithography. As device in of logic to both continue we shrink, expect memories continued geometries and EUV adoption
roadmaps. their they remarks Intel, confirming have seek product public and We to Hynix TSMC, advance to their seen Micron commitment as from EUV Samsung,
output ASML XX ion demand expect our plans scanner used double to production. grow in their mask from for Consequently, EUV approximately recently to addition, In we beam systems blank in systems for XX XXXX announced EUV XXXX. systems to
year average. to four In fact, our EUV per annually from for recently mask to on we increased three outlook systems five blank systems to two systems
packaging. to advanced Moving
future. GPUs the are of and confidence foreseeable repeat few For three performing systems serving markets strong a lithography We we shipping for the this performance our quarter a increasing high products leading a our continue momentum for OSAT to expected order quarters advanced had equipment are chips. in we well production have computing support expressed packaging and our of semiconductor had All now, from a and opportunity. multisystem to
towards Day, biggest the our years three Analyst is market next our primarily We serve in with progress making we that five goal. lines. expressed of semiconductor the semiconductor product over driver are growth the two As market and compound to
Our and wet MOCVD RF and applications. amplifiers power photonics filters equipment for equipment for processing and power
and solvent-based Our broad wet appeal applications. liftoff processing equipment in material has
to well. the for continued processing RF In our demand wet applications, addition demand amplifier photonics seeing equipment as across are we applications and filter in
power as We the work applications Our as MOCVD power towards systems quarter microLED system growth microLEDs. penetrating during other and and solutions continue enable fast markets. single these management charging and shipped for wafer well to
to data the our on is market In term, order storage based decline. storage. revenue near Our third data we activity, expect
their customers in and increased to the beam continue aerial driving density invest ion both demand. roadmaps they heads our system produce, However more
we the in the demonstrated to our application are about With wins, term traction semiconductor amount prospects visibility, grow at of confident XXXX. backlog by XX% we led confident we grow forecasted storage data annually, the long position are market, our business. and in In data of stored revenue by summary, will
an Now for priorities. our on update XXXX
there continuity delay our facilities resilience, couple company manufacturing and a a safety employees while are to our ensuring values, of return of plan. our have COVID-XX being With updates. one decided This to priority we core our keeps regarding operations. First, of safer our for the
longer our we such like many Regarding lead experiencing and chain, of of supply chain effects increases. the our are times global supply the peers as status cost of disruptions
and each frequent to advance in been proactively components thank our buying more of order quarter our resourcing impact would manage have in on basis for customers. business. like We supply our chain disruptions a I team to to the minimizing
perspective, are more and on profitability Next, track we to targets. are financial we long in term deliver track a focus XX% XXXX. we growth on from than continue on meet our revenue to growth solidly to And
building are investments service top Our By United success of keeping and to these the making systems team up a is difference in XXXX beyond. for material us stronger a in evaluation mind, infrastructure Veeco. committed Veeco and setting and priorities
hand John. it to Now, I will over
