systems. for high results our demand non-GAAP record EPS driven with started second line bottom for a end $XXX strong operating quarter, annealing Revenue the of income, you, year totaled and the towards Veeco top Semiconductor our by $X.XX. totaled million laser non-GAAP million, Thank revenue consecutive of $XX and guidance. Anthony. primarily the
As multitool technologies for in forward opportunities customer including to market the our I'd overview our business placed a around annealing announced today, driving X-nanometer future supporting to system process. served plans. looking earlier ramp their all and our order, a an annealing provide nanosecond laser like now of strategy. today, gate press available their release a investment We're expansion
Our our portfolio of footprint highlighted products applications. to is and continue technologies, expand by new traction, new to our we gaining
performance. device shrinking New architectures require annealing the and of increase solutions precision geometries advanced to
films technology deposition, to customers' recent leaders advanced LSA are systems systems by the gain working closely share our evidenced as Our continue of nodes and mask in In to most choice road maps. deposit industry to beam several with blank wins. defect-free production, their we're EUV enable for
growing to NA Looking serve for next-generation EUV ahead, we're demand well as lithography. high well as lithography positioned
to advanced used strong high packaging solutions for demand processing wet and we are memory. bandwidth for Our see continue applications,
During to growth memory years. the of foundry from semiconductor follow-on for our and quarter, business we and enabled memory strategy has logic leading shipped several orders Veeco's in advanced outperform FlexClean systems investing consecutive and X WFE customers. received
served available our from to nanosecond to over million laser of laser both of expect $XXX applications. with inclusive available investing and Moving new annealing market our served Beginning expand products. grow forward, we annealing $X to broad new in our we're market a to billion, technologies range spike annealing,
strategy market, been in and we're metals progress power long-term beam In a and we making resistance priority. in and has photonics. to to SAM in business our evaluation a our nanosecond equally customers. the follow-on memory receive semi LSA million expand to will for SAM applications range memory of $XXX semiconductor We're to towards are memory remain winning electronics our continue opportunities compound excited for deposition, Investment our additional see growth opportunities applications. for high-bandwidth advanced program front-end to And We grow on low focused and top are where critical. broad essential within logic annealing to
We and our have targeting later is executing. and deposition customers. X nanoseconds customers' progressing LSA leading annealing logic memory a memory an with X on and team system well, are highly Each focused year outstanding semiconductor ion We're in second to evaluation beam systems a also this nodes into evaluation in most customer now leading market. in new driving market. the need are evaluation at addition to for shipments Device opportunities annealing semiconductor of capabilities. to the scaling take largest the like X dive I'd our challenges compound deeper our advanced
opportunity most Due to substantial versus system offers only annealing can to today's the as industry time shallow and annealing This that and thermal solutions. a devices. dwell unique inflections a architecture, anneal laser tens results delivery laser to of and advanced nanometers Our in XD power enabling lower such of wafer, hundreds impact can new backside annealing into a logic nanosecond shorter achieve our to broaden budget adoption applications. technology and memory our
NSA improve opening changing by the device, material steps. and door several properties the Our of also system structure modification can to performance the
ahead, initial look to pleased XXXX. system's high-volume our orders As excited manufacturing we new also from potential see poll strong to for We're evaluate we in capabilities. from memory see logic customers customers
leader advanced growth front-end aerial deposition high-value XXX-millimeter key disk enabler drive Veeco density hard Turning level industry by the direct technology decades. beam applications. solving which in ion-beam semiconductor semiconductor is customers' a for ion wafer technology, our industry applicability challenges. over This manufacturing has now in to deposition is core driving in for the
are address continue resistance metals geometries deposition challenges. to shrink, low device to to performance device essential are scaling maintaining technologies traditional As and struggling
film compared bit DRAM, Refugium while are beam tungsten technology. to customer enables data, ion electrical beam critical. resistance the it our scaling through applications resistance traditional deposited of low tungsten to ability from deposition ion device. where thin its technologies properties, Based deposition films ideal superior and achieve making Our X Tier In are advanced incumbent for differentiates performance demonstrating this line lower on maintaining itself technology films
nodes. at metallization can For logic, integration ruthenium enable new schemes future
chip high-volume AI memory XXXX. most now profound advanced from Growth see the manufacturing Veeco process. to having intelligence we impact chips. I'd AI a in is manufacture higher-performance and product customers orders upon maps, to technologies the role plays ahead, like road leading-edge requiring of AI the touch on manufacturing artificial potential in Looking for
several to As we expect growing benefit we Veeco demand from chips. ahead, technologies look for AI
annealing turn over Our future these for deposition GPUs see our for to LSA Equally systems in for transistor solutions for as record formation HBM of a important, for our John IVD EUV blanks, each for mask DRAM. it applications. that, I'll update. beam and systems tool we production financial With nanosecond of and opportunities and