360 patents
Page 8 of 18
Utility
Hermetic sealing of a nonlinear crystal for use in a laser system
14 Sep 21
Disclosed are methods and apparatus for hermetically sealing a nonlinear optical (NLO) crystal for use in a laser system.
Rajeev Patil, David Ramirez, Yevgeniy Churin, William Replogle
Filed: 17 Sep 18
Utility
Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s)
14 Sep 21
Scatterometry overlay (SCOL) measurement methods, systems and targets are provided to enable efficient SCOL metrology with in-die targets.
Amnon Manassen, Yuri Paskover, Eran Amit
Filed: 5 Aug 19
Utility
Hybrid overlay target design for imaging-based overlay and scatterometry-based overlay
7 Sep 21
Designs for a hybrid overlay target design that includes a target area with both an imaging-based target and a scatterometry-based target are disclosed.
David Gready
Filed: 1 Jun 18
Utility
Inspection system with non-circular pupil
7 Sep 21
An inspection system includes an illumination source configured to generate extreme ultraviolet (EUV) light, illumination optics to direct the EUV light to a sample within a range of off-axis incidence angles corresponding to an illumination pupil distribution, collection optics to collect light from the sample in response to the incident EUV light within a range of collection angles corresponding to an imaging pupil distribution, and a detector configured to receive at least a portion of the light collected by the collection optics.
Damon F. Kvamme, Rui-fang Shi, Daniel C. Wack, Sseunhyeun Jo, Xin Ye
Filed: 25 Jan 19
Utility
Mitigation of inaccuracies related to grating asymmetries in scatterometry measurements
7 Sep 21
Scatterometry overlay targets as well as target design and measurement methods are provided, which mitigate the effects of grating asymmetries in diffraction based overlay measurements.
Ido Adam, Vladimir Levinski, Amnon Manassen, Yuval Lubashevsky
Filed: 15 Dec 17
Utility
Back-illuminated sensor and a method of manufacturing a sensor
7 Sep 21
An image sensor for electrons or short-wavelength light includes a semiconductor membrane, circuit elements formed on one surface of the semiconductor membrane, and a pure boron layer on the other surface of the semiconductor membrane.
Yung-Ho Alex Chuang, Jingjing Zhang, John Fielden, David L. Brown, Masaharu Muramatsu, Yasuhito Yoneta, Shinya Otsuka
Filed: 23 May 19
Utility
Optical instrumentation including a spatially variable filter
24 Aug 21
A system comprising a light source, and a retention device configured to receive and retain a sample for measurement.
Scott A. Chalmers, Randall S. Geels, Matthew F. Ross
Filed: 3 Mar 17
Utility
Topographic Phase Control For Overlay Measurement
19 Aug 21
Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy.
Vladimir Levinski, Yuri Paskover, Amnon Manassen, Yoni Shalibo
Filed: 26 Apr 21
Utility
Wafer exposure method using wafer models and wafer fabrication assembly
17 Aug 21
Critical dimension values can be obtained from wafer structures at predefined measurement sites.
Stefan Buhl, Philip Groeger, Patrick Lomtscher
Filed: 19 Feb 20
Utility
Deep learning based adaptive regions of interest for critical dimension measurements of semiconductor substrates
17 Aug 21
A metrology system is disclosed.
Arpit Yati
Filed: 23 May 19
Utility
DC Magnetron Sputtering
12 Aug 21
A method of depositing a film on a substrate is provided.
SCOTT HAYMORE, AMIT RASTOGI, RHONDA HYNDMAN, STEVE BURGESS, IAN MONCRIEFF
Filed: 27 Apr 21
Utility
Pe-cvd Apparatus and Method
12 Aug 21
A capacitively coupled Plasma Enhanced Chemical Vapour Deposition (PE-CVD) apparatus has a chamber, a first electrode with a substrate support positioned in the chamber, a second electrode with a gas inlet structure positioned in the chamber, and an RF power source connected to the gas inlet structure for supplying RF power thereto.
Stephen BURGESS, Katherine CROOK, Daniel ARCHARD, William ROYLE, Euan Alasdair MORRISON
Filed: 8 Jan 21
Utility
Charge control device for a system with multiple electron beams
10 Aug 21
Systems and methods to focus and align multiple electron beams are disclosed.
Christopher Sears, Luca Grella
Filed: 27 Aug 18
Utility
Enhancing metrology target information content
10 Aug 21
Metrology targets designs, design methods and measurement methods are provided, which reduce noise and enhance measurement accuracy.
Eran Amit, Amnon Manassen, Nadav Gutman
Filed: 14 Sep 18
Utility
Optimizing computational efficiency by multiple truncation of spatial harmonics
10 Aug 21
Methods and systems for solving measurement models of complex device structures with reduced computational effort and memory requirements are presented.
Andrei Veldman
Filed: 26 Dec 18
Utility
Hybrid overlay target design for imaging-based overlay and scatterometry-based overlay
3 Aug 21
Designs for a hybrid overlay target design that includes a target area with both an imaging-based target and a scatterometry-based target are disclosed.
David Gready
Filed: 1 Jun 18
Utility
Photocathode including silicon substrate with boron layer
3 Aug 21
A photocathode is formed on a monocrystalline silicon substrate having opposing illuminated (top) and output (bottom) surfaces.
Yung-Ho Alex Chuang, John Fielden
Filed: 31 Oct 18
Utility
Misregistration measurements using combined optical and electron beam technology
27 Jul 21
A misregistration metrology system useful in manufacturing semiconductor device wafers including an optical misregistration metrology tool configured to measure misregistration at at least one target between two layers of a semiconductor device which is selected from a batch of semiconductor device wafers which are intended to be identical, an electron beam misregistration metrology tool configured to measure misregistration at the at least one target between two layers of a semiconductor device which is selected from the batch and a combiner operative to combine outputs of the optical misregistration metrology tool and the electron beam misregistration metrology tool to provide a combined misregistration metric.
Roie Volkovich, Liran Yerushalmi, Nadav Gutman
Filed: 4 Jun 19
Utility
Methods and systems for characterization of an x-ray beam with high spatial resolution
27 Jul 21
Methods and systems for positioning a specimen and characterizing an x-ray beam incident onto the specimen in a Transmission, Small-Angle X-ray Scatterometry (T-SAXS) metrology system are described herein.
Alexander Bykanov, Nikolay Artemiev, Joseph A. Di Regolo, Antonio Gellineau, Alexander Kuznetsov, Andrei Veldman, John Hench
Filed: 9 May 18
Utility
Apparatus for electrochemically processing semiconductor substrates
20 Jul 21
An apparatus for processing a front face of a semiconductor wafer is provided.
John Macneil, Martin Ayres, Trevor Thomas
Filed: 22 Jan 18