360 patents
Page 10 of 18
Utility
Semiconductor Wafer Dicing Process
10 Jun 21
A semiconductor wafer dicing process is disclosed for dicing a wafer into individual dies, each die comprising one integrated circuit.
Martin Hanicinec, Janet Hopkins, Oliver Ansell
Filed: 9 Nov 20
Utility
Accuracy Improvements In Optical Metrology
10 Jun 21
Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements.
Barak Bringoltz, Evgeni Gurevich, Ido Adam, Yoel Feler, Dror Alumot, Yuval Lamhot, Noga Sella, Yaron De Leeuw, Tal Yaziv, Eltsafon Ashwal-Island, Lilach Saltoun, Tom Leviant
Filed: 18 Feb 21
Utility
Method, Substrate and Apparatus
10 Jun 21
Huma Ashraf, Alex Croot, Kevin Riddell
Filed: 15 Nov 20
Utility
Pick-and-place head and method for picking work-pieces
1 Jun 21
Carl Truyens
Filed: 29 Aug 19
Utility
Measurement of Overlay Error Using Device Inspection System
27 May 21
A method and system for measuring overlay in a semiconductor manufacturing process comprise capturing an image of a feature in an article at a predetermined manufacturing stage, deriving a quantity of an image parameter from the image and converting the quantity into an overlay measurement.
Choon Hoong Hoo, Fangren Ji, Amnon Manassen, Liran Yerushalmi, Antonio Mani, Allen Park, Stilian Pandev, Andrei Shchegrov, Jon Madsen
Filed: 1 Feb 21
Utility
Air scattering standard for light scattering based optical instruments and tools
25 May 21
An inspection system utilizing an air scatter standard includes one or more illumination sources to generate a beam of illumination, illumination optics configured to focus the beam of illumination into a volume of air contained within a chamber of an inspection chamber, one or more collection optics configured to collect a portion of illumination scattered from the volume of air, a detector configured to receive the collected portion of illumination from the one or more collection optics, a controller including one or more processors, communicatively coupled to the detector, configured to execute a set of program instructions to receive one or more signals from the detector and determine a state of the beam of illumination at one or more times based on a comparison between at least one of the intensity or polarization of the illumination scattered from the volume of air and a predetermine air scatter standard.
Frank Li, Qing Li, Zhiwei Xu
Filed: 19 Feb 19
Utility
Reduction or Elimination of Pattern Placement Error In Metrology Measurements
20 May 21
Metrology methods and targets are provided for reducing or eliminating a difference between a device pattern position and a target pattern position while maintaining target printability, process compatibility and optical contrast—in both imaging and scatterometry metrology.
Yoel Feler, Vladimir Levinski, Roel Gronheid, Sharon Aharon, Evgeni Gurevich, Anna Golotsvan, Mark Ghinovker
Filed: 28 Jan 21
Utility
Method of Measuring Misregistration of Semiconductor Devices
20 May 21
A method of measuring misregistration in the manufacture of semiconductor devices including providing a multilayered semiconductor device, using a scatterometry metrology tool to perform misregistration measurements at multiple sites on the multilayered semiconductor device, receiving raw misregistration data for each of the misregistration measurements, thereafter providing filtered misregistration data by removing outlying raw misregistration data points from the raw misregistration data for each of the misregistration measurements, using the filtered misregistration data to model misregistration for the multilayered semiconductor device, calculating correctables from the modeled misregistration for the multilayered semiconductor device, providing the correctables to the scatterometry metrology tool, thereafter recalibrating the scatterometry metrology tool based on the correctables and measuring misregistration using the scatterometry metrology tool following the recalibration.
Roie VOLKOVICH, Ido DOLEV
Filed: 28 Jan 21
Utility
DC magnetron sputtering
18 May 21
A DC magnetron sputtering apparatus is for depositing a film on a substrate.
Scott Haymore, Amit Rastogi, Rhonda Hyndman, Steve Burgess, Ian Moncrieff, Chris Kendal
Filed: 4 Apr 17
Utility
Optical-mode selection for multi-mode semiconductor inspection
18 May 21
One or more semiconductor wafers or portions thereof are scanned using a primary optical mode, to identify defects.
Bjorn Brauer, Richard Wallingford, Kedar Grama, Hucheng Lee, Sangbong Park
Filed: 8 May 19
Utility
Systems and methods for automatic correction of drift between inspection and design for massive pattern searching
18 May 21
Systems and methods for automatic correction of drift between inspection and design for massive pattern searching are disclosed herein.
Chi-Yuan Tseng, Ming-Hsiang Hsueh
Filed: 12 May 17
Utility
Apparatus and Method
6 May 21
A white light illumination source can illuminate a region of a substrate to be plasma etched with an incident light beam.
Oliver Ansell, Harry Gordon-Moys
Filed: 21 Aug 20
Utility
Apparatus and method for two dimensional nanoindentation
4 May 21
A two-dimensional nanoindentation measurement apparatus includes a first actuator that imparts a first force in a first direction, and a second actuator that imparts a second force in a second direction orthogonal to the first direction.
Warren C. Oliver, Kermit H. Parks, Kurt Johanns, P. Sudharshan Phani, John B. Pethica
Filed: 14 Jan 19
Utility
Adaptive care areas for die-die inspection
4 May 21
The present disclosure describes methods, systems, and articles of manufacture for performing a defect inspection of a die image using adaptive care areas (ACAs).
Himanshu Vajaria, Jan Lauber, Yong Zhang
Filed: 12 Oct 18
Utility
Method and Apparatus for Depositing a Material
29 Apr 21
A method is for depositing a dielectric material on to a substrate in a chamber by pulsed DC magnetron sputtering with a pulsed DC magnetron device which produces one or more primary magnetic fields.
Stephen R Burgess, Rhonda Hyndman, Amit Rastogi, Eduardo Paulo Lima, Clive L Widdicks, Paul Rich, Scott Haymore, Daniel Cook
Filed: 31 Dec 20
Utility
Reflective pupil relay system
13 Apr 21
Methods and systems for relaying an optical image using a cascade arrangement of tilted, concave mirrors are presented.
Andrew Hill, Gregory Brady
Filed: 1 Oct 14
Utility
Plasma cell for providing VUV filtering in a laser-sustained plasma light source
13 Apr 21
A plasma cell for use in a laser-sustained plasma light source includes a plasma bulb configured to contain a gas suitable for generating a plasma.
Ilya Bezel, Anatoly Shchemelinin, Eugene Shifrin, Matthew Panzer, Matthew Derstine, Jincheng Wang, Anant Chimmalgi, Rajeev Patil, Rudolf Brunner
Filed: 13 Feb 18
Utility
Pre-cleaning a semiconductor structure
13 Apr 21
The invention relates to a method of pre-cleaning a semiconductor structure and to associated modular semiconductor process tools.
Alex Theodosiou, Steve Burgess
Filed: 11 Sep 14
Utility
Nano-structured non-polarizing beamsplitter
13 Apr 21
A beamsplitter includes a substrate formed from a material transparent to wavelengths of light at least above a selected cutoff wavelength and reflective structures distributed across a surface of the substrate.
Dmitry Gorelik, Andrew V. Hill, Ohad Bachar, Amnon Manassen, Daria Negri
Filed: 21 Sep 18
Utility
Defect discovery using electron beam inspection and deep learning with real-time intelligence to reduce nuisance
6 Apr 21
A deep learning algorithm is used for defect discovery, such as for semiconductor wafers.
Arpit Yati
Filed: 13 Jul 18