360 patents
Page 14 of 18
Utility
Inspection system with grounded capacitive sample proximity sensor
16 Nov 20
A capacitive proximity measurement system may include a sensor electrode configured to be positioned proximate to a conductive measurement area on a test surface of a sample, a plate connector configured to provide an electrical connection between a system ground and a conductive plate parallel to the test surface, and a controller.
Yang Xie, Feilong Lin, Rushford A. Ogden
Filed: 1 May 19
Utility
Single cell scatterometry overlay targets
16 Nov 20
Scatterometry overlay (SCOL) single cell targets are provided, along with target design methods and measurement methods which employ the single cell SCOL targets for in-die metrology measurements, utilizing the small size of the target along with maintained optical performance due to the design of the target.
Eitan Hajaj
Filed: 23 Sep 18
Utility
Strontium Tetraborate As Optical Coating Material
11 Nov 20
Strontium tetraborate is used as an optical coating material for optical components utilized in semiconductor inspection and metrology systems to take advantage of its high refractive indices, high optical damage threshold and high microhardness in comparison to conventional optical materials.
Yung-Ho Alex Chuang, Yinying Xiao-Li, Elena Loginova, John Fielden
Filed: 15 Mar 20
Utility
Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology
9 Nov 20
Methods are provided for deriving a partially continuous dependency of metrology metric(s) on recipe parameter(s), analyzing the derived dependency, determining a metrology recipe according to the analysis, and conducting metrology measurement(s) according to the determined recipe.
Tal Marciano, Barak Bringoltz, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld, Zeng Zhao, Yoel Feler, Daniel Kandel, Nadav Carmel, Amnon Manassen, Nuriel Amir, Oded Kaminsky, Tal Yaziv, Ofer Zaharan, Moshe Cooper, Roee Sulimarski, Tom Leviant, Noga Sella, Boris Efraty, Lilach Saltoun, Amir Handelman, Eltsafon Ashwal, Ohad Bachar
Filed: 29 Jun 16
Utility
And noise based care areas
9 Nov 20
Methods and systems for setting up inspection of a specimen with design and noise based care areas are provided.
Brian Duffy, Martin Plihal, Santosh Bhattacharyya, Gordon Rouse, Chris Maher, Erfan Soltanmohammadi
Filed: 24 Mar 19
Utility
Verification Metrology Targets and Their Design
4 Nov 20
Metrology target design methods and verification targets are provided.
Michael E. Adel, Inna Tarshish-Shapir, Shiming Wei, Mark Ghinovker
Filed: 5 Jul 20
Utility
Estimation of asymmetric aberrations
2 Nov 20
Metrology targets, target design methods and menology measurement methods are provided, which estimate the effects of asymmetric aberrations, independently or in conjunction with metrology overlay estimations.
Yoel Feler, Vladimir Levinski
Filed: 29 Oct 18
Utility
Plasma source with lamp house correction
2 Nov 20
A plasma light source with lamp house correction is disclosed.
Shiyu Zhang, Ilya Bezel
Filed: 18 Oct 18
Utility
Diffraction based overlay scatterometry
2 Nov 20
A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack.
Yuval Lubashevsky, Yuri Paskover, Vladimir Levinski, Amnon Manassen
Filed: 4 Sep 18
Utility
Image-based overlay metrology and monitoring using through-focus imaging
26 Oct 20
A metrology system includes a controller coupled to a detector to image a sample based on the light captured by an objective lens, where an object plane of the detector with respect to the sample is adjustable.
David Gready, Nimrod Shuall, Claire Staniunas
Filed: 11 Jul 18
Utility
Using stochastic failure metrics in semiconductor manufacturing
26 Oct 20
A stochastic calculation engine receives inputs from a semiconductor inspection tool or semiconductor review tool.
Wing-Shan Ribi Leung, Kaushik Sah, Allen Park, Andrew Cross
Filed: 6 Jan 19
Utility
Multilayer targets for calibration and alignment of X-ray based measurement systems
26 Oct 20
Multilayer targets enabling fast and accurate, absolute calibration and alignment of X-ray based measurement systems are described herein.
Nikolay Artemiev, Antonio Gellineau, Alexander Bykanov, Alexander Kuznetsov
Filed: 24 Mar 19
Utility
Simultaneous Multi-directional Laser Wafer Inspection
21 Oct 20
Disclosed is apparatus for inspecting a sample.
Guoheng Zhao, Sheng Liu, Ben-Ming Benjamin Tsai
Filed: 1 Jul 20
Utility
High-Brightness Illumination Source for Optical Metrology
21 Oct 20
An illumination source may include two or more input light sources, a collector, and any combination of a beam uniformizer, a speckle reducer, or any number of output fibers to provide a selected illumination etendue.
Amnon Manassen, Andrew V. Hill, Ohad Bachar, Avi Abramov
Filed: 3 Jun 19
Utility
System and Method for Generation of Wafer Inspection Critical Areas
21 Oct 20
A method includes receiving one or more sets of wafer data, identifying one or more primitives from one or more shapes in one or more layers in the one or more sets of wafer data, classifying each of the one or more primitives as a particular primitive type, identifying one or more primitive characteristics for each of the one or more primitives, generating a primitive database of the one or more primitives, generating one or more rules based on the primitive database, receiving one or more sets of design data, applying the one or more rules to the one or more sets of design data to identify one or more critical areas, and generating one or more wafer inspection recipes including the one or more critical areas for an inspection sub-system.
Prasanti Uppaluri, Rajesh Manepalli, Ashok V. Kulkarni, Saibal Banerjee, John Kirkland
Filed: 5 Jul 20
Utility
Methods And Systems For Combining X-Ray Metrology Data Sets To Improve Parameter Estimation
21 Oct 20
Methods and systems for measuring a complex semiconductor structure based on measurement data before and after a critical process step are presented.
Christopher Liman, Antonio Arion Gellineau, Andrei V. Shchegrov, Sungchul Yoo
Filed: 12 Apr 20
Utility
Apparatus and method for measuring topography and gradient of the surfaces, shape, and thickness of patterned and unpatterned wafers
19 Oct 20
An interferometer system may include a stage assembly configured to receive and secure a sample, an illumination source configured to generate an illumination beam, a half-wave plate, one or more shearing prisms to shear the illumination beam into two beamlets along a shearing direction, a reference flat disposed proximate to the sample, a detector assembly, and a controller.
Chunsheng Huang
Filed: 18 Jul 19
Utility
Multi-mirror laser sustained plasma light source
19 Oct 20
A multi-mirror laser sustained plasma broadband light source is disclosed.
Qibiao Chen, Mark Shi Wang
Filed: 18 Jul 19
Utility
SAW device and method of manufacture
19 Oct 20
A method of reducing non-uniformity in the resonance frequencies of a surface acoustic wave (SAW) device, the SAW device comprising a silicon oxide layer comprising an oxide of silicon deposited over interdigital transducers on a piezoelectric substrate by reactive sputtering.
Rhonda Hyndman, Steve Burgess
Filed: 11 Sep 18
Utility
Apparatus and Method for Processing a Substrate
14 Oct 20
An apparatus for electrochemically processing a semiconductor substrate includes a processing chamber of the type that is sealable to a peripheral portion of a semiconductor substrate so as to define a covered processing volume.
Martin Ayres, John MacNeil, Trevor Thomas
Filed: 9 Apr 20