360 patents
Page 18 of 18
Utility
Air Scattering Standard for Light Scattering Based Optical Instruments and Tools
19 Aug 20
An inspection system utilizing an air scatter standard includes one or more illumination sources to generate a beam of illumination, illumination optics configured to focus the beam of illumination into a volume of air contained within a chamber of an inspection chamber, one or more collection optics configured to collect a portion of illumination scattered from the volume of air, a detector configured to receive the collected portion of illumination from the one or more collection optics, a controller including one or more processors, communicatively coupled to the detector, configured to execute a set of program instructions to receive one or more signals from the detector and determine a state of the beam of illumination at one or more times based on a comparison between at least one of the intensity or polarization of the illumination scattered from the volume of air and a predetermine air scatter standard.
Frank Li, Qing Li, Zhiwei Xu
Filed: 18 Feb 19
Utility
Sensitive Particle Detection with Spatially-Varying Polarization Rotator and Polarizer
19 Aug 20
A dark-field inspection system may include an illumination source to generate an illumination beam, illumination optics configured to direct the illumination beam to a sample at an off-axis angle along an illumination direction, collection optics to collect scattered light from the sample in response to the illumination beam in a dark-field mode, a polarization rotator located at a pupil plane of the one or more collection optics, where the polarization rotator provides a spatially-varying polarization rotation angle selected to rotate light scattered from a surface of the sample to a selected polarization angle, a polarizer aligned to reject light polarized along the selected polarization angle to reject the light scattered from a surface of the sample, and a detector to generate a dark-field image of the sample based on scattered light from the sample passed by the polarizer.
Xuefeng Liu, Jenn-Kuen Leong, Daniel Kavaldjiev, John Fielden
Filed: 19 Sep 19
Utility
Design File Selection for Test Image to Design Alignment
19 Aug 20
Methods and systems for selecting one or more design files for use in test image to design alignment are provided.
Bjorn Brauer
Filed: 6 Nov 19
Utility
Plasmonic Photocathode Emitters at Ultraviolet and Visible Wavelengths
19 Aug 20
A photocathode emitter can include a transparent substrate, a photocathode layer, and a plasmonic structure array disposed between the transparent substrate and the photocathode layer.
Katerina Ioakeimidi, Gildardo R. Delgado, Frances Hill, Gary V. Lopez Lopez, Miguel A. Gonzalez, Alan D. Brodie
Filed: 12 Feb 20
Utility
Misregistration Measurements Using Combined Optical and Electron Beam Technology
19 Aug 20
A misregistration metrology system useful in manufacturing semiconductor device wafers including an optical misregistration metrology tool configured to measure misregistration at at least one target between two layers of a semiconductor device which is selected from a batch of semiconductor device wafers which are intended to be identical, an electron beam misregistration metrology tool configured to measure misregistration at the at least one target between two layers of a semiconductor device which is selected from the batch and a combiner operative to combine outputs of the optical misregistration metrology tool and the electron beam misregistration metrology tool to provide a combined misregistration metric.
Roie Volkovich, Liran Yerushalmi, Nadav Gutman
Filed: 3 Jun 19
Utility
Delivery of Light into a Vacuum Chamber Using an Optical Fiber
19 Aug 20
A system for laser enhanced voltage contrast using an optical fiber is provided.
Emanuel Saerchen, Donald W. Pettibone, Oscar Florendo, Li-Min Chen, Martin Brutsch
Filed: 21 Nov 19
Utility
Photocathode including field emitter array on a silicon substrate with boron layer
17 Aug 20
A photocathode utilizes an field emitter array (FEA) integrally formed on a silicon substrate to enhance photoelectron emissions, and a thin boron layer disposed directly on the output surface of the FEA to prevent oxidation.
Yung-Ho Alex Chuang, John Fielden, Yinying Xiao-Li, Xuefeng Liu
Filed: 19 May 16
Utility
Liquid metal rotating anode X-ray source for semiconductor metrology
17 Aug 20
Methods and systems for realizing a high brightness, liquid based x-ray source suitable for high throughput x-ray metrology are presented herein.
Sergey Zalubovsky
Filed: 15 Oct 18
Utility
Electron beam generation and measurement
17 Aug 20
A flat top laser beam is used to generate an electron beam with a photocathode that can include an alkali halide.
Katerina Ioakeimidi, Gildardo R. Delgado, Frances Hill, Michael E. Romero, Rudy F. Garcia
Filed: 1 Oct 18
Utility
Deflection array apparatus for multi-electron beam system
17 Aug 20
An optical characterization system utilizing a micro-lens array (MLA) is provided.
Xinrong Jiang, Christopher Sears
Filed: 20 Dec 18
Utility
System, Method and Non-transitory Computer Readable Medium for Tuning Sensitivies Of, and Determining a Process Window For, a Modulated Wafer
12 Aug 20
A system, method, and non-transitory computer readable medium are provided for tuning sensitivities of, and determining a process window for, a modulated wafer.
David Craig Oram, Abhinav Mathur, Kenong Wu, Eugene Shifrin
Filed: 28 Apr 20
Utility
Simultaneous multi-directional laser wafer inspection
10 Aug 20
Disclosed is apparatus for inspecting a sample.
Guoheng Zhao, Sheng Liu, Ben-ming Benjamin Tsai
Filed: 5 Sep 17
Utility
Minimizing filed size to reduce unwanted stray light
10 Aug 20
Stray and air scattered light can be reduced by configuring a size of the collection area of a sensor, which reduces a source of sensitivity-limiting noise in the system.
Donald Pettibone, Daniel Ivanov Kavaldjiev, Chuanyong Huang, Qing Li, Frank Li, Zhiwei Xu
Filed: 30 Nov 17
Utility
Lens design for spectroscopic ellipsometer or reflectometer
10 Aug 20
A lens system includes a curved primary mirror and an aspheric secondary mirror.
Barry Blasenheim
Filed: 1 Oct 18
Utility
Process control method for lithographically processed semiconductor devices
10 Aug 20
Photoresist layers are exposed to an exposure beam by using an exposure tool assembly, wherein the photoresist layers coat semiconductor substrates and wherein for each exposure a current exposure parameter set is used that includes at least a defocus value and an exposure dose.
Stefan Buhl, Boris Habets, Wan-Soo Kim
Filed: 13 Feb 18
Utility
Method and apparatus for fabricating wafer by calculating process correction parameters
10 Aug 20
A method of calculating an overlay correction model in a unit for the fabrication of a wafer is disclosed.
Boris Habets
Filed: 15 Apr 19
Utility
Computer assisted weak pattern detection and quantification system
10 Aug 20
Methods and systems for providing weak pattern (or hotspot) detection and quantification are disclosed.
Naoshin Haque, Allen Park, Ajay Gupta
Filed: 25 Sep 16
Utility
Photocathode emitter system that generates multiple electron beams
10 Aug 20
The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets.
Gildardo R. Delgado, Katerina Ioakeimidi, Rudy Garcia, Zefram Marks, Gary V. Lopez Lopez, Frances A. Hill, Michael E. Romero
Filed: 20 Aug 18
Utility
Inspection-beam shaping on a sample surface at an oblique angle of incidence
3 Aug 20
A beam shaper for an optical inspection tool includes a focal lens to focus an optical beam onto a target at an oblique angle of incidence and a phase modulator to substantially flatten a top of the optical beam in the plane of the target when the optical beam is focused onto the target at the oblique angle of incidence.
Zhiwei Xu, Chunsheng Huang, Qing Li
Filed: 25 Jan 19
Utility
Spread-spectrum clock-signal adjustment for image sensors
3 Aug 20
An image sensor is provided that includes a pixel array divided into a plurality of pixel groups.
Tzi-Cheng Lai, Jehn-Huar Chern, Stephen Biellak
Filed: 7 Mar 19