360 patents
Page 13 of 18
Utility
3D microscope including insertable components to provide multiple imaging and measurement capabilities
4 Jan 21
A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities.
James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
Filed: 6 Aug 18
Utility
Three-dimensional imaging for semiconductor wafer inspection
4 Jan 21
Methods and systems for improved detection and classification of defects of interest (DOI) on semiconductor wafers based on three-dimensional images are described herein.
Pavel Kolchin, Robert M. Danen, Philip Measor
Filed: 21 Aug 17
Utility
High efficiency laser-sustained plasma light source
4 Jan 21
A system for generating laser sustained broadband light includes a pump source configured to generate a pumping beam, a gas containment structure for containing a gas and a multi-pass optical assembly.
Matthew Derstine, Ilya Bezel, Anatoly Shchemelinin, Eugene Shifrin
Filed: 19 Jun 16
Utility
Droplet generation for a laser produced plasma light source
28 Dec 20
The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber.
Brian Ahr, Alexander Bykanov, Rudy F. Garcia, Layton Hale, Oleg Khodykin
Filed: 8 Sep 16
Utility
Methods of plasma etching and plasma dicing
21 Dec 20
A method is for plasma etching one or more dicing lanes in a silicon substrate having a backside metal layer attached thereto.
Oliver J Ansell, Martin Hanicinec, Janet Hopkins
Filed: 31 May 18
Utility
Filter assembly for providing adjustable spectral capabilities in a broadband inspection system
21 Dec 20
A system which may be used to increase the number of available spectrum bands in an inspection system is provided.
Jeremy Nesbitt, Jagadeesh Kumar, David C. Oram
Filed: 12 Jul 17
Utility
Expediting Spectral Measurement in Semiconductor Device Fabrication
16 Dec 20
A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.
Vincent Immer, Tal Marciano, Etay Lavert
Filed: 20 Jul 20
Utility
Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrology
14 Dec 20
Metrology methods are provided for deriving metrology measurement parameter value(s) by identifying the value(s) in which the corresponding metrology measurement signal(s) have minimal amplitude asymmetry.
Tal Marciano, Nadav Gutman, Yuri Paskover, Guy Cohen, Vladimir Levinski
Filed: 4 Jul 18
Utility
Chromatic confocal area sensor
14 Dec 20
3D measurements of features on a workpiece, such as ball height, co-planarity, component thickness, or warpage, are determined.
Christophe Wouters, Kristof Joris, Johan De Greeve
Filed: 15 Jul 19
Utility
Targeted recall of semiconductor devices based on manufacturing data
14 Dec 20
A system for providing a targeted recall includes a metrology sub-system for performing in-line measurements on semiconductor dies after one or more fabrication steps to generate in-line measurement profiles, a failure analysis sub-system for determining a manufacturing fingerprint of a failed die, and a controller.
Robert J. Rathert, David W. Price
Filed: 17 Jul 18
Utility
X-ray zoom lens for small angle x-ray scatterometry
7 Dec 20
Methods and systems for controlling illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements of different sized metrology targets are described herein.
Nikolay Artemiev, Michael Friedmann
Filed: 18 Dec 17
Utility
Method and system for focus adjustment of a multi-beam scanning electron microscopy system
7 Dec 20
A scanning electron microscopy system is disclosed.
Doug K. Masnaghetti, Richard R. Simmons, Scott A. Young, Mark A. McCord, Rainer Knippelmeyer
Filed: 20 Jan 19
Utility
Overlay Measurement Using Multiple Wavelengths
2 Dec 20
A method of determining overlay (“OVL”) in a pattern in a semiconductor wafer manufacturing process comprises capturing images from a cell in a metrology target formed in at least two different layers in the wafer with parts of the target offset in opposing directions with respect to corresponding parts in a different layer.
Yuval Lamhot, Eran Amit, Einat Peled, Noga Sella, Wei-Te Cheng, Ido Adam
Filed: 2 Sep 18
Utility
System and method for characterization of buried defects
30 Nov 20
A system for defect detection and analysis is provided.
Jason Kirkwood, Jan Lauber
Filed: 12 Nov 18
Utility
Per-site Residuals Analysis for Accurate Metrology Measurements
25 Nov 20
Systems, metrology modules and methods are provided, which identify, per wafer site, components of residuals from measurement of metrology metric(s), and optimize measurement parameters for each site, according to the identified residuals' components.
Lilach Saltoun, Tal Marciano, Dana Klein
Filed: 29 Sep 19
Utility
Computer Assisted Weak Pattern Detection and Quantification System
25 Nov 20
Methods and systems for providing weak pattern (or hotspot) detection and quantification are disclosed.
Naoshin Haque, Allen Park, Ajay Gupta
Filed: 9 Aug 20
Utility
Single Cell In-Die Metrology Targets and Measurement Methods
25 Nov 20
Metrology targets and methods are provided, which comprise at least two overlapping structures configured to be measurable in a mutually exclusive manner at least at two different corresponding optical conditions.
Mark Ghinovker
Filed: 29 Sep 19
Utility
Method of Deposition
18 Nov 20
In a method for sputter depositing an additive-containing aluminium nitride film containing an additive element like Sc or Y, a first layer of the additive-containing aluminium nitride film is deposited onto a substrate disposed within a chamber by pulsed DC reactive sputtering.
Adrian Thomas, Steve Burgess, Amit Rastogi, Tony Wilby, Scott Haymore
Filed: 30 Apr 20
Utility
System and method for photocathode illumination inspection
16 Nov 20
A high-brightness electron beam source is disclosed.
Gildardo Delgado, Katerina Ioakeimidi, Frances A. Hill, Rudy F. Garcia, Mike Romero, Zefram Marks, Gary V. Lopez Lopez
Filed: 15 Jan 19
Utility
Multi-column scanning electron microscopy system
16 Nov 20
A multi-column scanning electron microscopy (SEM) system includes a column assembly, where the column assembly includes a first substrate array assembly and at least a second substrate array assembly.
Robert Haynes, Aron Welk, Tomas Plettner, John Gerling, Mehran Nasser Ghodsi
Filed: 1 Jun 17