28 patents
Page 2 of 2
Utility
Methods for Forming Doped Silicon Oxide Thin Films
10 Jun 20
The present disclosure relates to the deposition of dopant films, such as doped silicon oxide films, by atomic layer deposition processes.
Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano, Kunitoshi Namba
Filed: 3 Dec 19
Utility
Atomic layer deposition apparatus and method for processing substrates using an apparatus
11 May 20
An atomic layer deposition apparatus, having a first series of high pressure gas injection openings and a first series of exhaust openings that are positioned such that they together create a first high pressure/suction zone within each purge gas zone, wherein each first high pressure/suction zone extends over substantially the entire width of the process tunnel and wherein the distribution of the gas injection openings that are connected to the second purge gas source and the distribution of the gas exhaust openings within the first high pressure/suction zone, as well as the pressure of the second purge gas source and the pressure at the gas exhaust openings are such that the average pressure within the first high pressure/suction zone deviates less than 30% from a reference pressure which is defined by the average pressure within process tunnel when no substrate is present.
Ernst Hendrik August Granneman, Leilei Hu
Filed: 2 Nov 15
Utility
Methods for depositing nickel films and for making nickel silicide and nickel germanide
3 Feb 20
In one aspect, methods of silicidation and germanidation are provided.
Viljami J. Pore, Suvi P. Haukka, Tom E. Blomberg, Eva E. Tois
Filed: 19 Jun 16
Utility
Process for passivating dielectric films
23 Dec 19
Methods are disclosed herein for depositing a passivation layer comprising fluorine over a dielectric material that is sensitive to chlorine, bromine, and iodine.
Tom E. Blomberg, Eva E. Tois, Robert Huggare, Jan Willem Maes, Vladimir Machkaoutsan, Dieter Pierreux
Filed: 13 Oct 10
Utility
Precursors and Methods for Atomic Layer Deposition of Transition Metal Oxides
18 Dec 19
Methods are provided herein for forming transition metal oxide thin films, preferably Group IVB metal oxide thin films, by atomic layer deposition.
Timo Hatanpaa, Jaakko Niinisto, Mikko Ritala, Markku Leskela, Suvi Haukka
Filed: 1 Jul 19
Utility
Methods for forming doped silicon oxide thin films
16 Dec 19
The present disclosure relates to the deposition of dopant films, such as doped silicon oxide films, by atomic layer deposition processes.
Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano, Kunitoshi Namba
Filed: 14 Nov 18
Utility
Dummy Wafer Storage Cassette
4 Dec 19
A dummy wafer storage cassette for storing dummy wafers.
Chris G. M. de Ridder, Theodorus G. M. Oosterlaken, Adriaan Garssen
Filed: 4 Jun 18
Utility
Wafer Boat Cooldown Device
2 Oct 19
A wafer boat cooldown device comprising a bottom plate and a rotatable table that is rotatable between a number of index positions.
Chris G.M. de Ridder, Lucian C. Jdira, Bartholomeus Hans Louis Lindeboom
Filed: 26 Mar 19