30 patents
Utility
Apparatus and method for multiple source excitation Raman spectroscopy
16 Jan 24
An optical metrology device performs multi-wavelength polarized confocal Raman spectroscopy.
George Andrew Antonelli
Filed: 7 Apr 22
Utility
Target for optical measurement of trenches
7 Nov 23
A metrology target is designed for measuring a feature at the bottom of a trench in a device under test, such as a tungsten recess vertical profile in a wordline in a three-dimensional (3D) NAND.
Nicholas James Keller, George Andrew Antonelli
Filed: 15 Apr 21
Utility
Wafer-level package assembly handling
7 Nov 23
A chuck assembly includes an upper surface configured to support a wafer-level package assembly and a clamping mechanism securing the wafer-level package assembly to the upper surface.
Kevin Barr, Edward Andrew Condon
Filed: 28 Sep 18
Utility
System and method for correcting overlay errors in a lithographic process
27 Jun 23
As feature sizes of semiconductor chips shrink there is a need for tighter overlay between layers in a lithography process.
Zhiyang Li, Tong Yang
Filed: 19 Feb 21
Utility
Wafer inspection system including a laser triangulation sensor
14 Feb 23
One example of an inspection system includes a laser, a magnification changer, and a first camera.
John Schaefer, Christopher Voges, Nicholas Smith, Jeffrey Treptau
Filed: 8 Jun 18
Utility
System and method for optimizing a lithography exposure process
20 Dec 22
A method for correcting misalignments is provided.
Elvino da Silveira, Keith F. Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
Filed: 20 Aug 21
Utility
Beamsplitter based ellipsometer focusing system
12 Jul 22
An ellipsometer includes a focusing system that uses an image of the measurement spot to determine a best focal position for the ellipsometer.
John F. Lesoine
Filed: 1 Oct 19
Utility
Interferometry with pixelated color discriminating elements combined with pixelated polarization masks
7 Jun 22
A pixelated color mask is combined with a pixelated polarization mask in dynamic interferometry.
Neal Brock, James Millerd, Erik Novak, Brad Kimbrough
Filed: 1 Feb 19
Utility
Conformal stage
7 Jun 22
An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels.
J. Casey Donaher, Edward J. Ficarra, Christopher J. McLaughlin
Filed: 21 Dec 18
Utility
Fast generalized multi-wavelength ellipsometer
31 May 22
An ellipsometer uses a broadband light source and a Fresnel cone to produce a simultaneous broadband polarization state generator with no moving parts.
Alexander George Boosalis
Filed: 20 Feb 20
Utility
Focus system for oblique optical metrology device
31 May 22
The light from an optical metrology device is focused into a measurement spot on a sample using a focusing system.
Amit Shachaf, Daniel Thompson, John F. Lesoine
Filed: 2 Dec 20
Utility
Vortex polarimeter
31 May 22
An optical metrology device uses a multi-wavelength beam of light that has azimuthally varying polarization states and/or phase states, referred to as a vortex beam.
Kenneth E. James, John F. Lesoine, Pedro Vagos
Filed: 2 Dec 20
Utility
Wafer singulation process control
26 Apr 22
A method for monitoring and controlling a substrate singulation process is described.
Wayne Fitzgerald
Filed: 23 Dec 16
Utility
Active damper for semiconductor metrology and inspection systems
22 Mar 22
A damper for a semiconductor metrology or inspection system includes a pair of parallel plates with a fluid with a variable viscosity retained between plates.
Paul A. Doyle, Mark James Franceschi, Morgan A. Crouch, Kenneth E. James
Filed: 24 May 19
Utility
On-axis dynamic interferometer and optical imaging systems employing the same
1 Mar 22
An optical device for characterizing a workpiece combines an interferometer with a polarization rotation pellicle, installed in a stand-alone fashion in a spatial gap between the mirrors of the interferometer, and a polarization based phase-shift sensor.
James Millerd, Eric Frey
Filed: 11 Jul 19
Utility
Optical metrology device using numerical aperture reduction
2 Nov 21
A metrology device that can determine at least one characteristics of a sample is disclosed.
George Andrew Antonelli, Troy Daniel Ribaudo, Michael J. Hammond
Filed: 13 May 20
Utility
Sample surface polarization modification in interferometric defect inspection
19 Oct 21
Defects are detected using data acquired from an interference channel and a polarization modification channel in an interferometer.
Nigel P. Smith
Filed: 13 Jul 20
Utility
System and method for optimizing a lithography exposure process
21 Sep 21
A method for correcting misalignments is provided.
Elvino Da Silveira, Keith Frank Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
Filed: 28 Sep 18
Utility
Calibration of azimuth angle for optical metrology stage using grating-coupled surface plasmon resonance
3 Aug 21
Grating-coupled surface plasmon resonance response of a calibration grating is used to calibrate the azimuth angle offset between a sample on the stage and the plane of incidence (POI) of the optical system of an optical metrology device.
Nicholas James Keller
Filed: 11 Sep 20
Utility
Sub-resolution defect detection
2 Mar 21
An optical metrology device, such as an interferometer, detects sub-resolution defects on a sample, i.e., defects that are smaller than a pixel in the detector array of the interferometer.
Nigel P. Smith
Filed: 21 Nov 18