Zygo (ZIGO) Inactive USPTO patentsUtility application

An optical module comprising: at least three lens elements, wherein the lens elements collectively set a numerical aperture NA, a field height FH, and a system effective focal length EFLsys for directing the light rays between first and second planes, wherein NA, FH, and EFLsys satisfy 0<NA<0.25 and 0<FH<(0.4)·(EFLsys); wherein first and second adjacent lens elements having effective focal lengths EFL1 and EFL2, respectively, satisfies (1.5)·(EFLsys)<EFL1<3·(EFLsys) and (1.5)·(EFLsys)<EFL2<3·(EFLsys); wherein an air-distance between the first and second lens elements A12 satisfies 0<A12<EFLsys; wherein a third lens element adjacent the second lens elements opposite the first lens element and having an effective focal length EFL3 satisfies (−20)·EFLsys<EFL3<(−1)·EFLsys; and wherein an air-distance between the second and third lens elements A23 satisfies 0<A23<EFLsys.

Disclosed is a method and apparatus for determining information about an alignment of one or more optical components of a multi-component assembly involving: detecting an optical interference pattern produced from a combination of at least three optical wave fronts including at least two optical wave fronts caused by reflections from at least two surfaces of the one or more optical components; and computationally processing information derived from the detected optical interference pattern with at least one simulated optical wave front derived from a model of at least one selected optical surface of the at least two surfaces to computationally isolate information corresponding to an alignment of the selected optical surface.

Disclosed is a variable-zoom imaging apparatus that includes: i) imaging optics configured to form an image in an imaging area of an object positioned in an object area; ii) an adjustable aperture stop to adjustably set a numerical aperture NA for the image formed by the imaging optics; iii) an electronic detector comprising an array of detector elements positioned in the imaging area to detect the image; and iv) image processing circuitry coupled to the electronic detector to produce a digital representation of the image based on signals from at least some of the detector elements.

A method of making a mirror for use with extreme ultraviolet or x-ray radiation includes: i) providing a base substrate having a curved surface, wherein the curved surface deviates from a curvature of a target mirror surface at high spatial frequencies corresponding to spatial periods less than 2 mm; and ii) securing a first side of a thin plate to the curved surface of the base substrate to cover the curved surface, wherein the plate has a thickness thin enough to conform to the curvature of the target mirror surface and thick enough to attenuate deviations at the high spatial frequencies on a second side of the thin plate opposite the first side that are caused by the deviations on the curved surface of the base substrate.

A method of making a mirror for use with extreme ultraviolet (EUV) or X-ray radiation is disclosed.

A method for figuring an optical surface of an optical element to achieve a target profile for the optical surface includes: applying a removal process to an extended region of the optical surface extending along a first direction to remove material from the extended region of the optical surface; adjusting a position of the optical surface relative to the removal process along a second direction perpendicular to the first direction to remove material from additional extended regions of the optical surface extending along the first direction at each of different positions of the optical surface along the second direction; and repeating the applying of the removal process and the adjusting of the optical surface relative to the removal process for each of multiple rotational orientations of the optical surface about a third direction perpendicular to the first and second directions to achieve the target profile of the optical surface.

Method and apparatus for determining the wavelength of a light beam are provided.

A method for measuring a property of a test object with an interferometer includes: a) providing calibration information relating a focus setting for the interferometer to a position of the test object relative to a reference surface of the interferometer; b) determining the position of the test object relative to the reference surface; and c) using the interferometer to collect interferometric images of the test object for use in measuring the property of the test object.