22 patents
Utility
Scatter Melt Detection Systems and Methods of Using the Same
9 Nov 23
High bandwidth time-and-space resolved scatter phase transition microscopy systems configured to detect melt onset in a wafer being processed by laser annealing systems with ultra-short dwell times and spot size.
Matthew Earl Wallace Reed, Xiaohua Shen
Filed: 10 Apr 23
Utility
Wafer Carrier Assembly with Pedestal and Cover Restraint Arrangements That Control Thermal Gaps
2 Mar 23
A wafer carrier assembly as described herein improves thermal control across a top surface thereof to maintain highly controlled deposition locations and thicknesses.
Sandeep Krishnan, Bojan Mitrovic, Eric A. Armour, Yuliy Rashkovsky, Robert S. Maxwell, IV, Matthew J. Van Doren
Filed: 31 Aug 21
Utility
Rotating Disk Reactor with Split Substrate Carrier
4 Aug 22
A self-centering split substrate carrier that supports a semiconductor substrate in a CVD system includes a first section configured to be centrally located in the split substrate carrier having a top surface with a recessed area for receiving a substrate for CVD processing and comprising a plurality of apertures positioned in an outer surface.
Sandeep Krishnan, Alexander I. Gurary, Yuliy Rashkovsky, Robert Scott Maxwell IV, Aniruddha Bagchi
Filed: 11 Apr 22
Utility
Automated Batch Production Thin Film Deposition Systems and Methods of Using the Same
10 Mar 22
Fully automated batch production thin film deposition systems configured to deliver uniformity combined with high throughput at a low cost-per-wafer.
Michael W. Pacier, Michael J. Sershen, Adam F. Bertuch, Laurent Lecordier, Thousif Ahamad Khan Hosakote Buden, Ramesh Prasad Manchaladore Narahari Rao
Filed: 19 Feb 20
Utility
Reactor with Centering Pin for Epitaxial Deposition
3 Mar 22
A substrate reactor with centering pin for epitaxial deposition includes a vacuum chamber and a tube configured to rotate in the vacuum chamber around a tube geometrical center axis.
Alexander Gurary, Sandeep Krishnan, Aniruddha Bagchi, Yuliy Rashkovsky, Siddharth Patel
Filed: 27 Aug 21
Utility
Ion Beam Deposition of a Low Resistivity Metal
30 Dec 21
Methods for forming thin, low resistivity metal layers, such as tungsten (W) and ruthenium (Ru) layers.
Narasimhan SRINIVASAN, Tania HENRY, Frank CERIO, Paul TURNER, Vincent IP, Rutvik MEHTA
Filed: 14 Sep 21
Utility
Ion Beam Deposition of a Low Resistivity Metal
23 Sep 21
Methods for forming thin, low resistivity metal layers, such as tungsten (W) and ruthenium (Ru) layers.
Narasimhan SRINIVASAN, Tania HENRY, Frank CERIO, Paul TURNER, Vincent IP, Rutvik MEHTA
Filed: 10 Mar 21
Utility
Apparatus and Method for Die Stack Flux Removal
1 Jul 21
A system for removing flux from openings formed in a substrate that has openings (e.g., sized 20 microns or less) formed therein includes a spay nozzle device that has a spray nozzle arm that is formed at an angle of about 45 degrees or less for discharging fluid towards the openings in the substrate for flux removal.
John Taddei, Kenji Nulman, Jonathan Fijal, Phillip Tyler, Ian Rafter
Filed: 10 Dec 20
Utility
Enhanced Cathodic Arc Source for Arc Plasma Deposition
10 Jun 21
An improved cathodic arc source and method of DLC film deposition with a carbon containing directional-jet plasma flow produced inside of cylindrical graphite cavity with depth s of the cavity approximately equal to the cathode diameter.
Boris L. Druz, Viktor Kanarov, Yuriy N. Yevtukhov, Sandeep Kohli, Xingjie Fang
Filed: 19 Aug 20
Utility
Molecular Beam Epitaxy Systems with Variable Substrate-to-source Arrangements
22 Apr 21
Systems and methods for providing controllable substrate-to-source arrangements in a Molecular Beam Epitaxy (MBE) system to selectively adjust a distance, orientation, or other geometric configuration as between the source(s) and substrate(s) used in epitaxial growth systems are described herein.
Richard Charles Bresnahan, Scott Wayne Priddy, William Colbert Campbell, III, Mark Lee O'Steen, Stephen Gary Farrell
Filed: 19 Oct 20
Utility
CVD Reactor Single Substrate Carrier and Rotating Tube for Stable Rotation
1 Apr 21
A self-centering substrate carrier system for a chemical vapor deposition reactor includes a substrate carrier chosen to at least partially support a wafer for CVD processing and that comprises a beveled surface.
Sandeep Krishnan, Bojan Mitrovic, Mandar Deshpande, Alexander Gurary, Aniruddha Bagchi
Filed: 6 May 20
Utility
Melt Detection Systems and Methods of Using the Same
14 Jan 21
High bandwidth time-and-space resolved phase transition microscopy systems configured to detect melt onset in a wafer being processed by laser annealing systems with ultra-short dwell times and spot size.
Matthew Earl Wallace Reed
Filed: 30 Jun 20
Utility
Deposition System with Integrated Carrier Cleaning Modules
11 Nov 20
A chemical vapor deposition system for semiconductor wafer production is disclosed.
Alexander I. Gurary, Mandar Deshpande, Ajit Paranjpe
Filed: 7 May 20
Utility
Rotating Disk Reactor with Self-Locking Carrier-to-Support Interface for Chemical Vapor Deposition
5 Aug 20
A substrate carrier that supports a semiconductor substrate in a chemical vapor deposition system that includes a support having a beveled inner top surface including a top surface and a bottom surface.
Alexander I. Gurary, Sandeep Krishnan, Yuliy Rashkovsky, Todd Luse, Gaurab Samanta
Filed: 25 Jan 20
Utility
Semiconductor Wafer Processing Chamber
20 May 20
A wafer processing system according to one embodiment includes a chamber housing having an exhaust and a rotatable wafer support member for supporting a wafer.
David Goldberg, Simon Bird, William Gilbert Breingan, John Taddei, Robert Altonji, Lev Rapoport, Christopher Orlando, Ian Rafter
Filed: 16 Oct 19
Utility
System and Method for Metrology Using Multiple Measurement Techniques
11 Mar 20
Systems and methods for detecting complementary sets of data during a chemical vapor deposition process are disclosed herein.
Daewon Kwon
Filed: 5 Sep 18
Utility
Chemical Vapor Deposition Wafer Carriers
26 Feb 20
A wafer carrier has a plurality of built-up pockets connected by raised interstitial spaces on a base.
Bojan Mitrovic, Yuliy Rashkovsky, Eric Armour
Filed: 20 Aug 18
Utility
Chemical vapor deposition wafer carriers
19 Feb 20
A wafer carrier has a plurality of built-up pockets connected by raised interstitial spaces on a base.
Bojan Mitrovic, Yuliy Rashkovsky, Eric Armour
Filed: 19 Aug 18
Utility
Micro-LED Transfer Methods Using Light-Based Debonding
25 Dec 19
Transfer methods disclosed herein include transferring micro-LEDs from a first carrier to a second carrier.
Ajit P. Paranjpe, Christopher J. Morath
Filed: 23 Jul 19
Utility
Self-Centering Wafer Carrier System for Chemical Vapor Deposition
27 Nov 19
A self-centering wafer carrier system for a chemical vapor deposition (CVD) reactor includes a wafer carrier comprising an edge.
Sandeep Krishnan, Alexander I. Gurary, Chenghung Paul Chang, Earl Marcelo
Filed: 16 Jul 19