2001 patents
Utility
Slurry Dispersion, Cosmetic and Method for Producing Same
18 Jan 24
A slurry dispersion containing (A) one or more selected from trimethylsiloxysilicic acid and derivatives thereof, (B) a hydrophobized coloring pigment, and (C) an oil that is liquid at 25° C., wherein blending with a cosmetic provides a good feel on use (light feel), good applicability (spread), and an excellent feeling of adhesion and suppresses color unevenness by improving pigment dispersibility.
Masayuki KONISHI, Masaru MIYAUCHI
Filed: 8 Nov 21
Utility
Composite Substrate
18 Jan 24
A composite substrate that is obtained by bonding a silicon (Si) wafer having an interstitial oxygen concentration of 2 to 10 ppma to a piezoelectric material substrate as a support substrate, and thinning the piezoelectric material substrate after the bonding.
Shoji AKIYAMA, Shozo SHIRAI, Masayuki TANNO
Filed: 20 Sep 23
Utility
Composition For Forming Metal Oxide Film, Patterning Process, And Method For Forming Metal Oxide Film
18 Jan 24
Naoki KOBAYASHI, Nobuhiro NAGAMACHI, Daisuke KORI
Filed: 6 Jul 23
Utility
Hydroxypropyl methyl cellulose phthalate and method for producing the same
16 Jan 24
There is provided a method for producing hydroxypropyl methyl cellulose phthalate (HPMCP), including an esterification step of reacting hydroxypropyl methyl cellulose with a carboxybenzoylating agent in the presence of an aliphatic carboxylic acid in a kneader reactor equipped with two or more stirring blades rotating around their own axes and orbitally revolving, to obtain a reaction product solution containing HPMCP; a precipitation step of precipitating the HPMCP by mixing the reaction product solution with water to obtain a suspension of the precipitated HPMCP; and a washing and recovery step of washing the HPMCP in the suspension and recovering the washed HPMCP.
Taishi Kitaguchi, Junichi Matsubara, Mitsuhiro Yoshida
Filed: 29 Oct 20
Utility
Method of transferring device layer to transfer substrate and highly thermal conductive substrate
16 Jan 24
A highly thermal conductive substrate formed by bonding a device layer formed on a silicon on insulator (SOI) wafer and a buried oxide film to an insulator substrate having a thermal conductivity of 40 W/m·K or more via a low-stress adhesive, wherein a thickness of the buried oxide film is 50 to 500 nm and a thickness of the adhesive is 0.1 to 10 μm.
Shigeru Konishi, Yoshihiro Kubota
Filed: 16 Jun 21
Utility
Organosilicon Compound, Hydrolysis Condensation Product of Same, and Coating Composition
11 Jan 24
Kazunori TAKAGI, Munenao HIROKAMI, Fumihiro ASO
Filed: 21 Oct 21
Utility
Quantum Dot Surface Treatment Method and Surface Treatment Apparatus
11 Jan 24
A quantum dot surface treatment method including continuously supplying a solution containing a silicone compound and a quantum dot having a surface to which a ligand having a coordinating substituent and a reactive substituent is coordinated by virtue of the coordinating substituent, to a reaction flow path made of a material that transmits light, and emitting light to the reaction flow path, so that the silicone compound and the reactive substituent undergo a photopolymerization reaction, thereby coating the surface of the quantum dot with the silicone compound.
Yoshihiro NOJIMA, Shinji AOKI, Kazuya TOBISHIMA
Filed: 30 Nov 21
Utility
Pellicle Frame, Pellicle, and Method for Peeling Pellicle
11 Jan 24
The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
Yu YANASE
Filed: 19 Sep 23
Utility
Lift Method of Optical Devices, Lift Apparatus for Optical Devices, Manufacturing Method for Receptor Substrate Having Transferred Optical Devices, and Manufacturing Method for Display
11 Jan 24
The present invention provides a method of relocating optical devices onto a carrier substrate in a case where a pixel pitch of a display is not an integer multiple of a pitch of the optical devices arrayed on a sapphire substrate.
Hiroshi Yamaoka, Nobutaka Uemori, Satoki Nakada, Takeshi Saito, Shusaku Ozawa, Shinichi Sato, Masami Kurata, Masahiko Sato, Tsukasa Abe, Tsuyoshi Noguchi, Taketo Usami
Filed: 29 Sep 21
Utility
Curable fluoropolyether-based rubber composition and optical component
9 Jan 24
Hidenori Koshikawa
Filed: 24 Oct 19
Utility
Addition-curable liquid silicone rubber composition and molded silicone-rubber object
9 Jan 24
Nobu Kato
Filed: 8 Apr 19
Utility
Room Temperature Curable Organopolysiloxane Composition, Article, Hydrolyzable Organosilane Compound and Method for Producing Same
4 Jan 24
Akira UTA
Filed: 16 Aug 21
Utility
Anti-fouling Silicone Composite Sheet and Method for Performing Prevention of Graffiti Using Same
4 Jan 24
An anti-fouling silicone composite sheet including: a substrate layer containing a fluororesin; and a silicone adhesive layer stacked on one surface of the substrate layer, having a hardness of 5 or less as measured with an Asker C hardness tester, and having an adhesive force with respect to a mortar test piece of 5 N/25 mm or more, wherein the substrate layer has a surface on which the silicone adhesive layer is stacked and the other surface is an anti-fouling surface.
Keiji IMAIZUMI, Akihiro ENDO, Masaki MOTEKI
Filed: 22 Nov 21
Utility
Pellicle Frame, Pellicle, and Method for Peeling Pellicle
4 Jan 24
The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
Yu YANASE
Filed: 18 Sep 23
Utility
Pellicle Frame, Pellicle, and Method for Peeling Pellicle
4 Jan 24
The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
Yu YANASE
Filed: 18 Sep 23
Utility
Pellicle Frame, Pellicle, and Method for Peeling Pellicle
4 Jan 24
The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
Yu YANASE
Filed: 19 Sep 23
Utility
Silanol-group-terminated polyoxyalkylene compound and production process therefor, room-temperature-curable composition, sealing material, and article
2 Jan 24
Takahiro Yamaguchi, Masayuki Ikeno, Isao Iwasaki, Takafumi Sakamoto
Filed: 28 Feb 17
Utility
Polysiloxane monomer and method for producing same
2 Jan 24
Kaoru Okamura
Filed: 31 May 19
Utility
Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank
2 Jan 24
A substrate with a multilayer reflection film for an EUV mask blank including a substrate, and a multilayer reflection film formed on the substrate is provided.
Yukio Inazuki, Tsuneo Terasawa, Takuro Kosaka, Hideo Kaneko, Kazuhiro Nishikawa
Filed: 1 Sep 21
Utility
Positive resist composition and patterning process
2 Jan 24
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a sulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and improved CDU, and forms a pattern of good profile after exposure and development.
Jun Hatakeyama
Filed: 5 May 21