2001 patents
Page 4 of 101
Utility
Composite Wafer and Manufacturing Method Therefor
7 Dec 23
Provided are a manufacturing method for a composite wafer and a composite wafer obtained by using the manufacturing method, the manufacturing method including: preparing a first substrate in which a first layer of any one of oxides, oxynitrides, and nitrides is disposed on one surface; preparing a second substrate in which a second layer of any one of oxides, oxynitrides, and nitrides is disposed on one surface; forming a silicon layer on a surface of one of the first layer or the second layer; activating, with plasma, a surface of at least one of the silicon layer or another of the first layer or the second layer; and bonding the first substrate and the second substrate.
Shoji AKIYAMA
Filed: 16 Aug 23
Utility
Resist Composition and Pattern Forming Process
7 Dec 23
A resist composition comprising a sulfonium salt of carboxylic acid having a chromone structure as the quencher is provided.
Jun Hatakeyama, Tomomi Watanabe
Filed: 2 Jun 23
Utility
(4Z,6E)-4,6-UNDECADIENYL Trimethylacetate and Process for Preparing (5Z,7E)-5,7-DODECADIENE Compound Therefrom
7 Dec 23
Yuki Miyake, Takeru Watanabe, Yusuke Nagae
Filed: 1 Jun 23
Utility
Chemically Amplified Positive Resist Composition and Resist Pattern Forming Process
7 Dec 23
A chemically amplified positive resist composition is provided comprising (A) an acid generator containing a specific sulfonium salt and/or a specific iodonium salt and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer.
Keiichi Masunaga, Masahiro Fukushima, Masaaki Kotake, Satoshi Watanabe
Filed: 19 May 23
Utility
Chemically Amplified Negative Resist Composition and Resist Pattern Forming Process
7 Dec 23
A chemically amplified negative resist composition comprising (A) an acid generator in the form of a sulfonium salt having formula (A1) or iodonium salt having formula (A2) and (B) a base polymer containing a polymer comprising repeat units having formula (B1) is provided.
Keiichi Masunaga, Masahiro Fukushima, Masaaki Kotake, Satoshi Watanabe
Filed: 23 May 23
Utility
Chemically Amplified Negative Resist Composition and Resist Pattern Forming Process
7 Dec 23
A chemically amplified negative resist composition is provided comprising (A) a quencher in the form of a sulfonium salt of carboxylic acid having a nitrogen-bearing heterocycle and (B) a base polymer containing a specific polymer.
Keiichi Masunaga, Masahiro Fukushima, Masaaki Kotake, Satoshi Watanabe
Filed: 23 May 23
Utility
Aqueous enteric coating composition
5 Dec 23
An aqueous enteric coating composition including hydroxypropylmethylcellulose, acetate succinate, and a basic amino acid.
Anisul Quadir, Sakae Obara
Filed: 24 Aug 20
Utility
Organopolysiloxane composition, and organic silicon compound and production method therefor
5 Dec 23
This organopolysiloxane composition, when cured at room temperature by moisture in the atmosphere, provides a silicone rubber cured product having good self-adhesiveness to a magnesium alloy.
Akira Uta, Takafumi Sakamoto
Filed: 30 Mar 22
Utility
Functional-agent-containing fiber and method for manufacturing same
5 Dec 23
Functional agent-containing fibers according to an embodiment of the present invention, wherein a functional agent is supported by silicone fixed to the fibers.
Shinji Irifune, Tomoya Kanai, Masaki Tanaka, Minoru Sugiyama, Hidenobu Morishima, Kazuhiro Sato
Filed: 26 Mar 18
Utility
Quantum dot, quantum dot composition, wavelength conversion material, wavelength conversion film, backlight unit and image display device
5 Dec 23
A quantum dot including fluorescent crystalline nanoparticle, wherein surface of the quantum dot is modified with a ligand containing fluorine.
Yoshihiro Nojima, Shinji Aoki, Kazuya Tobishima
Filed: 17 Apr 20
Utility
Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank
5 Dec 23
A substrate with a multilayer reflection film for an EUV mask blank including a substrate, and a multilayer reflection film formed on the substrate is provided.
Yukio Inazuki, Tsuneo Terasawa, Takuro Kosaka, Hideo Kaneko, Kazuhiro Nishikawa
Filed: 1 Sep 21
Utility
Mask blank glass substrate
5 Dec 23
A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 μm−1 or more and 20 μm−1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 μm×10 μm with an atomic force microscope.
Naoki Yarita, Daijitsu Harada, Masaki Takeuchi
Filed: 28 May 21
Utility
Resist composition and patterning process
5 Dec 23
A resist composition is provided comprising a base polymer and a quencher comprising a salt compound obtained from a nitrogen-containing compound having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbon group and a compound having a 1,1,1,3,3,3-hexafluoro-2-propanol group.
Jun Hatakeyama, Takeshi Nagata, Chuanwen Lin
Filed: 9 Jun 21
Utility
Resist composition and patterning process
5 Dec 23
A resist composition comprising an ammonium salt and fluorine-containing polymer comprising repeat units AU having an ammonium salt structure of an iodized or brominated phenol compound and repeat units FU-1 having a trifluoromethylalcohol group and/or repeat units FU-2 having a fluorinated hydrocarbyl group offers a high sensitivity and is unsusceptible to nano-bridging, pattern collapse or residue formation, independent of whether it is of positive or negative tone.
Jun Hatakeyama
Filed: 7 Jul 21
Utility
Bile Acid Adsorbing Agent Composed of Imidazole Silane-treated Silica
30 Nov 23
Shigeki YASUDA, Tsuneo KIMURA, Munenao HIROKAMI, Masaki TANAKA, Naoki TANAKA
Filed: 27 Sep 21
Utility
Onium Salt Compound, Polymer, Resist Composition, and Patterning Process
30 Nov 23
An onium salt compound consisting of a sulfonate anion having the structure that a polymerizable unsaturated bond is linked to an iodized aromatic group via a carbon chain of two or more carbon atoms and a sulfonium or iodonium cation is provided.
Tomomi Watanabe, Takayuki Fujiwara, Tomonari Noguchi
Filed: 15 May 23
Utility
Method for Producing a Light Emitting Diode Supply Substrate, Method for Producing a Light Emitting Diode Display, Method for Producing a Division Unit for a Light Emitting Diode Display, and Method for Producing a Device Supply Substrate
30 Nov 23
A method for producing a light emitting diode supply substrate for transferring a plurality of light emitting diodes to a supply destination, including: a first mounting step of mounting a plurality of light emitting diodes on a supply substrate; a selective removal step of selectively removing defective light emitting diodes on the supply substrate, and a second mounting step of transferring a normal light emitting diode to a position where the defective light emitting diode has been arranged on the supply substrate.
Hideo NAKAGAWA, Yoshinori OGAWA, Nobuaki MATSUMOTO, Kazunori KONDO
Filed: 27 Sep 21
Utility
Carbon Black Dispersion Composition for Battery, Mixture Paste for Positive Electrode, Positive Electrode for Lithium-ion Secondary Battery, and Lithium-ion Secondary Battery
30 Nov 23
A carbon black dispersion composition for batteries contains carbon black, a dispersant, N-methyl-2-pyrrolidone, and from 0.0001 to 5 parts by weight of a hindered phenolic compound per 100 parts by weight of carbon black.
Keiichi KOMATSUKI, Shingo NIINOBE
Filed: 23 May 23
Utility
Ultraviolet curable silicone composition and cured product of same
28 Nov 23
Nobuaki Matsumoto, Taichi Kitagawa, Atsushi Yaginuma, Masaaki Shirota
Filed: 30 Dec 21
Utility
Resist composition and patterning process
28 Nov 23
A resist composition comprising a quencher containing a nitroxyl radical having an iodized aromatic ring is provided.
Jun Hatakeyama, Masahiro Fukushima
Filed: 2 Aug 21