855 patents
Page 16 of 43
Utility
Patterning process
10 May 22
A pattern having a good balance of sensitivity, resolution and LWR is formed by providing a resist film comprising a base resin comprising recurring units having a C4-C6 tertiary alkoxy or alkoxycarbonyl group as an acid labile group and recurring units capable of generating a backbone-bound acid upon exposure, exposing the resist film to radiation, optionally post-exposure baking the resist film at a low temperature of 30-70° C., and developing the film.
Jun Hatakeyama, Takeshi Sasami, Tomohiro Kobayashi
Filed: 19 Nov 18
Utility
Photomask blank and method for preparing photomask
10 May 22
A photomask blank comprising a transparent substrate and a light-shielding film disposed thereon is provided.
Takuro Kosaka, Yukio Inazuki, Hideo Kaneko
Filed: 4 May 20
Utility
Polycrystalline silicon manufacturing apparatus
10 May 22
An integrated sleeve structure is provided between an electrode configured to feed power to a silicon core wire and a bottom plate part.
Naruhiro Hoshino, Tetsuro Okada, Masahiko Ishida
Filed: 19 Feb 20
Utility
Method for producing hypromellose phthalate
3 May 22
There is provided a method for producing hypromellose phthalate (HPMCP), the method not requiring any special device, and facilitating removal of impurities.
Akiko Tsuchida, Taishi Kitaguchi, Akira Kitamura, Mitsuo Narita
Filed: 24 Jul 19
Utility
Organopolysiloxane composition, and organic silicon compound and production method therefor
3 May 22
This organopolysiloxane composition, when cured at room temperature by moisture in the atmosphere, provides a silicone rubber cured product having good self-adhesiveness to a magnesium alloy.
Akira Uta, Takafumi Sakamoto
Filed: 9 Oct 18
Utility
Photocatalyst transfer film and production method thereof
3 May 22
Provided are a photocatalyst transfer film allowing a photocatalyst layer that is uniform, highly transparent, and exhibits an antimicrobial property in dark places to be transferred to the surfaces of various transfer base materials; and a production method thereof.
Masahiro Yuyama, Manabu Furudate, Tomohiro Inoue
Filed: 26 Mar 19
Utility
Method for producing hypromellose acetate succinate
3 May 22
There is provided a method for producing hypromellose acetate succinate (HPMCAS), the method not requiring any special device and facilitating removal of impurities.
Taishi Kitaguchi, Akiko Tsuchida, Akira Kitamura, Mitsuo Narita
Filed: 24 Jul 19
Utility
Process for preparing (9Z,11E)-9,11-hexadecadienal
3 May 22
Yuki Miyake, Takeshi Kinsho, Ryo Komatsu
Filed: 21 Jun 21
Utility
Nitrogen-containing cyclic organoxysilane compound and method for producing the same
26 Apr 22
Yoichi Tonomura
Filed: 14 Nov 19
Utility
R-Fe-B sintered magnet and making method
26 Apr 22
An R—Fe—B base sintered magnet is provided consisting essentially of R (which is at least two rare earth elements and essentially contains Nd and Pr), M1 which is at least two of Si, Al, Mn, Ni, Cu, Zn, Ga, Ge, Pd, Ag, Cd, In, Sn, Sb, Pt, Au, Hg, Pb, and Bi, M2 which is at least one of Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, and W, boron, and the balance of Fe, and containing an intermetallic compound R2(Fe,(Co))14B as a main phase.
Koichi Hirota, Tetsuya Kume, Masayuki Kamata
Filed: 8 Jun 17
Utility
Negative electrode active material, mixed negative electrode active material, negative electrode for nonaqueous electrolyte secondary battery, lithium ion secondary battery, and method for producing negative electrode active material
26 Apr 22
A negative electrode active material includes: particles of negative electrode active material, the particles of negative electrode active material contain particles of silicon compound containing a silicon compound (SiOx:0.5≤x≤1.6); the particles of silicon compound contain at least one kind or more of Li2SiO3 and Li4SiO4; the particles of negative electrode active material contain Li2CO3 and LiOH on a surface thereof; and a content of the Li2CO3 is 0.01% by mass or more and 5.00% by mass or less relative to a mass of the particles of negative electrode active material and a content of the LiOH is 0.01% by mass or more and 5.00% by mass or less relative to the mass of the particles of negative electrode active material.
Hidekazu Awano, Takumi Matsuno, Hiromichi Kamo, Takakazu Hirose, Masahiro Furuya
Filed: 27 Jan 17
Utility
Negative electrode active material for non-aqueous electrolyte secondary battery, non-aqueous electrolyte secondary battery, and method for producing negative electrode material for non-aqueous electrolyte secondary battery
26 Apr 22
A negative electrode active material for a non-aqueous electrolyte secondary battery, containing a negative electrode active material particle, wherein the negative electrode active material particle includes a silicon compound particle containing a silicon compound (SiOx: 0.5≤x≤1.6), the silicon compound particle contains a Li compound, at least a part of the silicon compound particle is coated with a carbon material, and an O-component fragment and a CH-component fragment are detected from the negative electrode active material particle in a measurement by TOF-SIMS, and a ratio of a peak intensity A of the O-component fragment to a peak intensity B of the CH-component fragment is 0.5≤A/B≤100.
Kohta Takahashi, Takakazu Hirose, Takumi Matsuno
Filed: 9 Jul 18
Utility
Ultraviolet curable silicone adhesive composition and silicone adhesive film
19 Apr 22
Tsuyoshi Matsuda, Ken Nakayama
Filed: 12 Jun 18
Utility
Phase shift mask blank and phase shift mask
19 Apr 22
Provided is a phase shift mask blank including a substrate, and a phase shift film thereon, the phase shift film composed of a material containing silicon and nitrogen and free of a transition metal, the phase shift film including at least one compositionally graded layer having a composition continuously varying in a thickness direction, and a refractive index n and an extinction coefficient k, with respect to exposure light, varying in the thickness direction, the exposure light being KrF excimer laser, the compositionally graded layer having a difference between a maximum refractive index n(H) and a minimum refractive index n(L) of up to 0.40, and a difference between a maximum extinction coefficient k(H) and a minimum extinction coefficient k(L) of up to 1.5.
Takuro Kosaka
Filed: 27 Mar 20
Utility
Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
19 Apr 22
Seiichiro Tachibana, Takeru Watanabe, Keisuke Niida, Hiroko Nagai, Takashi Sawamura, Tsutomu Ogihara
Filed: 5 Mar 19
Utility
Method for preparing rare earth compound particles, rare earth oxide particles, and rare earth oxide particles-containing slurry
5 Apr 22
Rare earth compound particles are prepared by a step of heating an aqueous solution containing rare earth metal ions and urea to form a rare earth compound by a reaction of a hydrolysis product of urea, and the rare earth metal ions.
Kazuhiro Wataya
Filed: 27 Aug 19
Utility
Polyoxyalkylene group-containing organosilicon compound and method for producing same
5 Apr 22
Tetsuro Yamada, Munenao Hirokami
Filed: 16 May 17
Utility
Photosensitive resin composition and pattern forming process
5 Apr 22
A white photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) a photoacid generator, and (C) a white pigment has a sufficient reflectivity, good reliability with respect to adhesion and crack resistance, resolution, flexibility, and light resistance.
Hitoshi Maruyama, Tamotsu Oowada
Filed: 2 Jul 19
Utility
Photosensitive resin composition, photosensitive resin laminate, and pattern forming process
5 Apr 22
A photosensitive resin composition is provided comprising 100 pbw of a polyimide silicone containing a primary alcoholic hydroxyl group, a crosslinker, a photoacid generator, a polyfunctional epoxy compound, 1-70 pbw of a filler having an average particle size of 0.01-20.0 μm, and 0.01-30 pbw of a colorant.
Yoichiro Ichioka
Filed: 12 Mar 19
Utility
Epoxy-containing, isocyanurate-modified silicone resin, photosensitive resin composition, photosensitive dry film, laminate, and pattern forming process
5 Apr 22
A photosensitive resin composition comprising an isocyanurate-modified silicone resin containing an epoxy group in the molecule is easy to form a resin coating which has high transparency, light resistance and heat resistance, is amenable to micro-processing, and is useful in applications for protecting and encapsulating optical devices.
Kumiko Hayashi, Hitoshi Maruyama, Kazunori Kondo, Hideto Kato
Filed: 28 Aug 18