855 patents
Page 31 of 43
Utility
Gel-form composition and water absorption inhibitor
19 Oct 20
This gel-form composition contains (A) an organoalkoxysilane of the following formula and/or a partially hydrolyzed condensate of the organoalkoxysilane, R1aSi(OR2)4-a (R1 and R2 are monovalent hydrocarbon groups, and a is 1, 2, or 3), (B) an aluminum dicarboxylate of the following formula (R3COO)2Al(OH) (R3 is a monovalent hydrocarbon group), (C) a C6-24 fatty acid, (D) a C6-30 dicarboxylic acid, and (E) an aluminum oligomer and/or aluminum alkoxide selected from aluminum oxide organoxides and aluminum oxide acylates.
Yuta Hamajima, Shunji Aoki
Filed: 24 Apr 17
Utility
Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt
19 Oct 20
An adhesive composition including a resin and electro-conductive material, wherein the electro-conductive material is an ammonium salt of fluorosulfonic acid having 5 or more carbon atoms shown by the general formula (1): (R1—X—Z—SO3−)n Mn+ (1), wherein, R1 represents a monovalent hydrocarbon group having 1 to 40 carbon atoms and optionally substituted by a heteroatom or optionally interposed by heteroatom; X represents any of a single bond, ether group, ester group, and amide group; Z represents an alkylene group having 2 to 4 carbon atoms, containing 1 to 6 fluorine atoms, and optionally containing a carbonyl group; Mn+ represents a cation having one or two ammonium cation structures.
Jun Hatakeyama, Motoaki Iwabuchi, Masaki Ohashi, Yasuyoshi Kuroda
Filed: 11 Sep 17
Utility
Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus
19 Oct 20
A halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film thereon is prepared through the step of depositing the halftone phase shift film on the substrate by using a sputtering gas containing rare gas and nitrogen gas, and plural targets including at least two silicon targets, applying powers of different values to the silicon targets, effecting reactive sputtering, and rotating the substrate on its axis in a horizontal direction.
Yukio Inazuki
Filed: 25 Sep 19
Utility
Resist composition and patterning process
19 Oct 20
A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
Jun Hatakeyama, Masaki Ohashi
Filed: 17 Jan 19
Utility
Method of cleaning and drying semiconductor substrate
19 Oct 20
A cleaning and drying method of a semiconductor substrate capable of suppressing collapse or breakdown of a pattern which occur at the time of drying a cleaning solution after cleaning the substrate and decomposition of a resin at a bottom of the pattern, and capable of removing the cleaning solution with good efficiency without using a specific device.
Tsutomu Ogihara, Osamu Watanabe, Takeshi Nagata, Naoki Kobayashi, Daisuke Kori
Filed: 27 Mar 18
Utility
Negative electrode active material, negative electrode, lithium ion secondary battery, method for producing negative electrode material for non-aqueous electrolyte secondary battery and method for producing lithium ion secondary battery
19 Oct 20
A negative electrode active material contains particles of negative electrode active material, wherein the particles of negative electrode active material contain a silicon compound represented by SiOx (0.5≤x≤1.6), and when the particles of negative electrode active material are measured by an atom probe method, and an Si 75% equivalent concentration surface obtained by the atom probe method is defined to be a boundary surface of a silicon grain, an average diameter of the silicon grains at a center portion of the particle in the particles of negative electrode active material is in the range of 0.25 nm to 5 nm.
Takakazu Hirose, Hiromichi Kamo, Hiroki Yoshikawa
Filed: 26 Oct 16
Utility
Polycrystalline silicon rod, processing method for polycrystalline silicon rod, method for evaluating polycrystalline silicon rod, and method for producing FZ single crystal silicon
12 Oct 20
For evaluating a polycrystalline silicon rod to be used as a raw material for production of FZ Si single crystals, novel evaluation values (values of characteristics×amount of crystals) including the amount of crystals grown in the growth direction (radial direction) are defined and the homogeneity in crystal characteristics in the growth direction (radial direction) is evaluated.
Shuichi Miyao, Shigeyoshi Netsu, Junichi Okada
Filed: 8 Dec 15
Utility
Stretchable film composition, stretchable film, and method for forming the same
12 Oct 20
Jun Hatakeyama, Motoaki Iwabuchi, Shiori Nonaka, Koji Hasegawa
Filed: 28 Jan 19
Utility
Curable organopolysiloxane composition
12 Oct 20
Tomoyuki Mizunashi
Filed: 16 Dec 18
Utility
Resist composition and patterning process
12 Oct 20
A resist composition comprising a polymer-bound acid generator, i.e., a polymer comprising recurring units derived from a sulfonium or iodonium salt having a brominated linker between a polymerizable unsaturated bond and a fluorosulfonic acid offers a high sensitivity and reduced LWR or improved CDU independent of whether it is of positive or negative tone.
Jun Hatakeyama, Masaki Ohashi
Filed: 11 Jun 18
Utility
Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode
5 Oct 20
Jun Hatakeyama, Takayuki Fujiwara, Motoaki Iwabuchi, Yasuyoshi Kuroda
Filed: 28 Jan 18
Utility
Radically curable organosiloxane graft polyvinyl alcohol polymer and process for producing same
5 Oct 20
Mamoru Hagiwara
Filed: 3 Feb 19
Utility
Heat-curable resin composition for semiconductor encapsulation and semiconductor device
5 Oct 20
Yoshihiro Tsutsumi, Naoyuki Kushihara, Norifumi Kawamura, Yuki Kudo
Filed: 2 Jul 19
Utility
Temporary adhesive film roll for substrate processing, method for manufacturing thin wafer
5 Oct 20
A temporary adhesive film roll for substrate processing, includes: a roll axis and a composite film-shaped temporary-adhesive material for temporarily bonding a substrate to a support, the composite film-shaped temporary-adhesive material being rolled up around the roll axis; wherein the composite film-shaped temporary-adhesive material includes a first temporary adhesive layer composed of a thermoplastic resin, a second temporary adhesive layer composed of a thermosetting resin, and a third temporary adhesive layer composed of a thermosetting resin which is different from that of the second temporary adhesive layer.
Masahito Tanabe, Michihiro Sugo, Kazunori Kondo, Hiroyuki Yasuda
Filed: 28 May 18
Utility
Silicone compound and cosmetic containing the same
28 Sep 20
Emi Akabane, Tomoyuki Goto
Filed: 16 Apr 17
Utility
Photomask blank and method for producing photomask
28 Sep 20
A photomask blank comprising a transparent substrate and a Cr-containing film is provided.
Yukio Inazuki, Kouhei Sasamoto, Naoki Matsuhashi
Filed: 31 Oct 18
Utility
Water absorbing resin having siloxane skeleton and cosmetic containing the same
28 Sep 20
Hiroomi Iyoku
Filed: 12 Dec 16
Utility
Method for producing rare-earth magnets, and rare-earth-compound application device
28 Sep 20
A fixed beam 2 along which magnet-body holding sections 22 are consecutively provided is disposed so as to pass through a slurry 1.
Yukihiro Kuribayashi, Shogo Kamiya, Harukazu Maegawa, Shintaro Tanaka
Filed: 17 Apr 16
Utility
Composite substrate, method for forming nanocarbon film, and nanocarbon film
21 Sep 20
Provided is a composite substrate which is provided with: a single crystal silicon carbide thin film 11 having a thickness of 1μm or less; a handle substrate 12 which supports the single crystal silicon carbide thin film 11 and is formed from a heat-resistant material (excluding single crystal silicon carbide) having a heat resistance of not less than 1,100° C.; and an intervening layer 13 which has a thickness of 1μm or less and is arranged between the single crystal silicon carbide thin film 11 and the handle substrate 12, and which is formed from at least one material selected from among silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, zirconium oxide, silicon and silicon carbide, or from at least one metal material selected from among Ti, Au, Ag, Cu, Ni, Co, Fe, Cr, Zr, Mo, Ta and W.
Shoji Akiyama, Yoshihiro Kubota, Makoto Kawai, Shigeru Konishi, Hiroshi Mogi
Filed: 15 Dec 15
Utility
Heat treatment apparatus
21 Sep 20
A heat treatment apparatus includes: a furnace core tube made of silica glass; a heater provided adjacent to the furnace core tube, the heater heating a heating region; and a moving mechanism supporting a porous glass base material and relatively moving the porous glass base material with respect to the heater in the furnace core tube in a state where the heating region is heated by the heater to make the porous glass base material pass through the heating region.
Kazuya Uchida, Takashi Koshigai
Filed: 26 Feb 17