162 patents
Page 6 of 9
Utility
Optical Material Composition and Optical Material
24 Feb 22
The present invention is an optical material composition containing (A) 100 parts by mass of a polymerizable monomer, and (B) 0.001 to 0.3 parts by mass of a UV absorbent having a maximum absorption wavelength of 360 nm or more and less than 380 nm and having a specific structure, and an optical material formed of the composition.
Ayako OHARA, Taichi HANASAKI, Junji TAKENAKA, Junji MOMODA
Filed: 17 Dec 19
Utility
Curable Composition for Optical Materials, and Optical Material
24 Feb 22
The present invention relates to a curable composition for an optical material, containing (A) 100 parts by mass of a radical polymerizable monomer, (B) 0.1 to 5 parts by mass of an ultraviolet absorber composed of a benzotriazole compound having a specific structure, which has a maximum absorption wavelength of 360 nm or more and less than 380 nm and an absolute value of the difference in solubility parameter (SP value) from the radical polymerizable monomer (A) of 5.5 (cal/cm3)1/2 or less, (C) 1 to 5 parts by mass of an ultraviolet absorber which is at least one selected from a benzotriazole compound, a benzophenone compound and a triazine compound and has a maximum absorption wavelength of less than 360 nm, and (D) 0.05 to 0.5 parts by mass of a radical polymerization initiator.
Taichi HANASAKI, Ayako OHARA, Junji TAKENAKA, Junji MOMODA
Filed: 17 Dec 19
Utility
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17 Feb 22
The present invention relates to a curable composition for an optical material, containing (A) 100 parts by mass of a radical polymerizable monomer, (B) 0.005 to 0.5 parts by mass of a tetraazaporphyrin compound having a maximum absorption wavelength in a range of 560 nm or more and 620 nm or less, and (C) 0.1 to 10 parts by mass of an ultraviolet absorber having a maximum absorption wavelength in a range of 330 nm or more and 350 nm or less.
Ayako OHARA, Taichi HANASAKI, Junji TAKENAKA, Junji MOMODA
Filed: 17 Dec 19
Utility
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10 Feb 22
Manami Oshio, Seiji Tono, Yoshiki Seike
Filed: 9 Dec 19
Utility
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10 Feb 22
It is an object to achieve a resin sheet having high thermal conductance and high dielectric strength.
Yuichi IKEDA, Shota DAIKI, Kyoichi FUJINAMI, Teruhiko NAWATA, Katsuya TESHIMA, Tetsuya YAMADA
Filed: 28 Feb 20
Utility
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3 Feb 22
A treatment liquid composition for semiconductor production including: a quaternary ammonium hydroxide; and a first organic solvent dissolving the quaternary ammonium hydroxide, the first organic solvent being a water-soluble organic solvent having a plurality of hydroxy groups, wherein a water content in the composition is no more than 1.0 mass % on the basis of the total mass of the composition; contents of Na, Mg, Al, K, Ca, Ti, Cr, Mn, Fe, Ni, Cu, and Zn in the composition are each no more than 100 mass ppb on the basis of the total mass of the composition; and a content of Cl in the composition is no more than 100 mass ppb on the basis of the total mass of the composition.
Shoji TACHIBANA, Seiji TONO, Sumito ISHIZU, Yoshiaki YAMASHITA
Filed: 26 Sep 19
Utility
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3 Feb 22
The present invention provides a method for inhibiting a RuO4 gas generated from a ruthenium-containing liquid in the production process of a semiconductor element.
Tomoaki SATO, Fuyuki SATO, Takayuki NEGISHI
Filed: 27 Jul 21
Utility
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20 Jan 22
A method for producing isopropyl alcohol is provided in which propylene is hydrated directly with water to produce isopropyl alcohol, the method including: a distillation step in which crude isopropyl alcohol is distilled; and a filtration step in which the isopropyl alcohol obtained in the distillation step is filtered through a filter having an ion-exchange group.
Akira Sera, Masashi Shinagawa, Masanari Ishizuki
Filed: 3 Oct 19
Utility
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13 Jan 22
Takafumi SHIMODA, Yuki KIKKAWA, Takayuki NEGISHI, Seiji TONO, Tomoaki SATO
Filed: 13 Feb 20
Utility
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6 Jan 22
Provided is a high-purity isopropyl alcohol in which the concentration of a C7-12 acetal compound is 100 ppb or less on a mass basis, the concentration of the acetal compound in an accelerated test involving heating for 4 hours at 80° C. in a nitrogen atmosphere is increased by a factor of 30 or less with respect to the value thereof prior to heating, and the concentration of the acetal compound is maintained at a value of 100 ppb or less on a mass basis.
Shunsuke Hosaka, Masanari Ishizuki
Filed: 30 Sep 19
Utility
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6 Jan 22
Provided is silica powder that, when used as a resin filler such as a semiconductor sealant, allows for obtaining a resin composition having excellent gap permeability and low viscosity.
Keiji SAIKI, Masayuki NUMATA, Teppei UENO, Hiroo AOKI
Filed: 13 Feb 20
Utility
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30 Dec 21
The present invention provides industrially advantageous production method and production apparatus, with respect to production of a halogen oxyacid solution.
Takayuki NEGISHI, Takafumi SHIMODA, Akihiro SAITO, Naoki MATSUDA, Kenichi KAKIZONO, Takeshi KAWANO, Masayuki MORIWAKI
Filed: 24 Jun 21
Utility
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16 Dec 21
Provided is a treatment liquid for a semiconductor with ruthenium, containing a hypobromite ion.
Tomoaki SATO, Yuki KIKKAWA, Takafumi SHIMODA, Takayuki NEGISHI
Filed: 8 Jul 20
Utility
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18 Nov 21
A milking device (10) has a teat cup (1) with liner (3) and milk claw (30).
Hitoshi Kondo, Yoji Inui
Filed: 17 Sep 19
Utility
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4 Nov 21
An antifouling method for polysilicon includes using a tube-shaped resin sheet having an inner surface and an outer surface to prevent the fouling of polysilicon, in which the tube-shaped resin sheet or a resin sheet cut out of the tube-shaped resin sheet is held, with the inner surface being kept in an unexposed state, and the inner surface is exposed just before use and brought into contact with the polysilicon.
Takuya Asano, Satoko Yoshimura
Filed: 29 Oct 19
Utility
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4 Nov 21
Provided are an inhibitor for RuO4 gas generation used in a manufacturing process of a semiconductor element, that inhibits a RuO4 gas generated when a semiconductor wafer containing ruthenium and a treatment liquid are brought into contact, and a method for inhibiting the RuO4 gas.
Tomoaki SATO, Yuki KIKKAWA, Takafumi SHIMODA, Takayuki NEGISHI
Filed: 23 Sep 20
Utility
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7 Oct 21
A method for producing a quaternary alkylammonium hypochlorite solution, includes a preparation step of preparing a quaternary alkylammonium hydroxide solution, and a reaction step of bringing the quaternary alkylammonium hydroxide solution into contact with chlorine, wherein a carbon dioxide concentration in a gas phase portion in the reaction step is 100 ppm by volume or less, and pH of a liquid phase portion in the reaction step is 10.5 or more.
Takafumi Shimoda, Yuki Kikkawa, Takayuki Negishi, Seiji Tono
Filed: 20 May 19
Utility
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30 Sep 21
Provided is a method to recycle valuable materials included in a photovoltaic module having a resin back sheet or the like, for efficiently and easily recovering the valuable materials by removing the resin components from the photovoltaic module.
Masaru Sasai, Yuichiro Minabe
Filed: 19 Jul 19
Utility
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23 Sep 21
The present invention relates to a photochromic compound including a polyvalent residue on which at least one group having a photochromic moiety is substituted, and at least one long-chain group not containing a photochromic moiety and having a molecular weight of 300 or more is further substituted; and a curable composition containing the same.
Takao NOGUCHI, Junji TAKENAKA, Junji MOMODA, Takayoshi KAWASAKI, Yasutomo SHIMIZU, Masayuki MIYAZAKI
Filed: 18 Jul 19
Utility
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16 Sep 21
Provided are silicon fine particles that are effectively prevented from being oxidized and have a crystallite diameter close to that of an amorphous substance.
Naoto MOCHIZUKJ, Haruyuki ISHIDA, Masao ARIYUKI, Koji FUKUHARA
Filed: 15 May 19