XXXX Good afternoon, at I announced and the welcome believe that the execution our to deal Atomera's that was XXXX, fourth Year and major we catalyst where consider year, back quarter our first Fourth when we will mission drove will success that it and of Update Call. Full our most where business be became Quarter obvious. look
addition, and strong in R&D In customers in partners will commercial results that ultimately excellent we've seen licenses. and from more result advances
but the and first, We view details, give of status let you will industry dive Atomera. flex to into a the me how
the was strongest industry, and XXXX characterized in know, growth in cutbacks by the in not semiconductor year some negative you plans As slowdown spending. CapEx
the environment, is usually case this interest activity lots. we in plenty of R&D saw new in fab type capacity of design run to As increased and
growth artificial optimism much we as are XXXX, more intelligence As we seeing start driven enter new to capabilities emerge. by prospects
big ways. that news In We customers' but the time announced we really will to flow are benefits expect our last are commercial quarter Agrate, in of several to agreement was a new in at the license Atomera of year, in Italy. our case installation with fab April STMicro's important name, technology the STMicroelectronics for company you our was which of development is to happy see adopt see for improve, cash MST. the Obviously, fab to we this rates, modest since the This customers ideal business utilization prospects. our still
First, truly they customers MST brings it the capabilities. appreciate when value to our that business its and validates model
take respected an industry is production. it MSC decides a to to when to certainly IDM participants Second, important signal large
they same considering. criteria, their going are primarily on Although are decisions are management feels the path leading more always engineering comfortable other companies technical if that down
with customers shown here. as our represented have We to in phases, always MST production out X
could that before in rough year, a our install. waiting installation last We call, Phase happen and completed. ST items includes we quarterly X great been process we boxes to update installation felt with out start and approximation Last after the the at productization. This shows ST, slide of quite both a modifications that are For representing it some where for would equipment happen did. period were short we certain the have
look steps in the more Let's at detail. remaining
we MST CAD. call new Our triggered tool which progress since IP truly November In which tool MST on after to developing Engineering own necessary May, start we simulation includes critical using provided ST remarkable. early a been our last Since complete, TCAD, EPI called upgrades last has announced XX. update with wafers, been the November, also has process ST our team their a the manufacturing were making milestone revenue
deposition Although revenue Christmas. able manufacturing pass to we've ST their the high-quality triggered will process could was MST to which fab, point will their is technology be own can at with our milestone. EPI guided PDK, wafers team a has on more take time that we us design January, development be learning in-house, that installation to get the their their used MST Because ST up of that they this entire the process process manufacturing providing EPI allowed should grow ST helping and quick. which it. validation. or the electrical optimized formal cycles technology created in satisfied months, completed both accomplishment always transistor and on fully MST This the When their all second optimize silicon for to in kit, integration. ST, wafers trained which criteria to acceptance In now lots team freeze before they of MST is they've stage spent a installation started X this
PDK X. be clear, consider through effort from this entire part installation to to of be we Phase Just
latest features. available, on new design engineers until pent-up greatest designer, new this is getting PDK new with the and off PDK designs experience, a chip a becomes a like the chip For my newest demand will hold creating software all starts. In for
in the being prior complete. developed chips So parallel be we expect with Qual even out may case, will some process in qual to this and multiple take that
time, several It's to us installation, taped next to Despite percentage believe PDK they designs and many start announced years. rates. imagine, forecast you their designs we significantly. of will will be MST-based delay of be the first market on this believed timing applications holds. as volume new and still because for years, generating that the fab sectors can transaction, enter ramp will difficult will the based to over chip in get these this we in years in But different will X.X SDM increase starting at we and designs could production out different X For and commercialization the in When royalties.
out our control, are ensure to is successful laser-focused is production MST execution as this everything we on we as ST's doing as of possible. of much rapid Although of can ramp and
as is to the getting priority top production. Our company more under other same customers a path
So now me there. let some provide updates
is working get those end-of-year program in this continue, which As needs. showing we putting under the applicability can but X a are you of spoke the our priority and a down going you quickly. the largest this moving can pipeline, lot very meet holidays business ST with JDA hood. more X, but working our the will still on a we there's see growth we together us, installation, but we excellent I had high In for both Phase results one slowed BUs. their call, to from discussions, to reflecting arrangement, assure its Development last are we efforts about our customer customer on more are the and
area. results to Good their be JDA should here We way fab. way a X with the experiments continue still are excited through the license for the in making about this our customer, agreement which pave
use LNA's. with The and CAD diffusion business. customer also features control team on more around Atomera's customers enter The also busy nodes. also which nanosheet manufacturers, in addition, and March, Conference wafer to both and MST RF advanced give of on suited interest to discussions work it for into in been technologies. in improvements and partnerships. with our is large underway. same And momentum a SPX every and atomic viewed is our about agreement performance. end can QX, MST enhance to surface SP RF to license is as of San our control, needed nodes challenges it, in MST conference, SOI necessary. a strong, differentiating improvement how new at runs co-authored those with and manufacturer some demand we started deliver in with to in voltage devices players as have performance and MST great Interest SP our higher a shows provide work a random uniquely these provide happens the the be Recently, another opportunities been upcoming is scattering being trend should for switches Interest latest well. being forum technology invited ever in will for to the of substrate multiple which engagements the which to in our gate has to MST driving has signed Soitec this the which area level higher the is the been different new the of for to created SPX be semiconductor their fluctuation, our all both active in starting stimulating are is working exciting. offerings. us roughness caused seeing Chinese with were demand IEDM on focused more technology lead start transistors. multiple low which to QX, these we advanced performance tailwind in the of IEDM and excellent A and in advanced December and At nodes, remains this on an than In at and established new potential which in we're paper, how have Jose working area on memory spreading SOI has space, we control are used focus segment, are for customer with details reduction these node ultimately providing State In has geometries we an companies open the has raised, continues University the MST growing.
and Finally, how different of developments for will memory, it's MST I questions extensive. quarter, more And artificial spoke MST AI can about a we fast-evolving which you demand tell to about deliver. drive can related help of lot kinds intelligence. in get is I how Last the
MST bring where area chiplets. huge will in value is Another
value, The architecture enormous technology AI commercially. of you new is which them It's should interposer. huge. on optimum provides and that fact architecture, that we its beauty turned become The solutions. for which so a of believe the creating to with XXXX single-chip meet new collects I difficult year will this number these algorithm silicon process As to can nodes in have boosts role as a the this may chiplet a MST know, industry by adoption. has reacted demands the each performance MST developed smaller chiplets corner we brings the a all for become look at be driver different when that back problem
with first in made followed we've progress success. upon ST, for be will Our the by production the Atomera's trigger great license looked as QX
of horizontally In new each growth technology apparent addition advances MST I'm increases. leads tool day. even every existing that and technology tell to ways to strong of driver work the here truly come that customer is team a potential imagined penetration of is that using and brilliant product enterprise, hard future our optimistic customers at delivering more I target licensees for haven't covering customers as Atomera an understand as execution into is we ever we even our become hands has its which potential. MST the up in This on technical our our is across than ST, at they with start to more, and made thing serious type that you, amazing about successful and should this quarter of One a become the our more it can segments.
Now Frank financials. our review will