3198 patents
Page 2 of 160
Utility
Methods of forming molybdenum contacts
9 Jan 24
Methods for forming a semiconductor structure are described.
Seshadri Ganguli, Jacqueline S. Wrench, Yixiong Yang, Yong Yang, Srinivas Gandikota
Filed: 7 May 21
Utility
Fully self-aligned subtractive etch
9 Jan 24
Apparatuses and methods to provide fully self-aligned first metallization lines, M1, via, and second metallization lines, M2, are described.
Lili Feng, Yuqiong Dai, Madhur Sachan, Regina Freed, Ho-yung David Hwang
Filed: 1 Jun 21
Utility
r6udfja99gpq5c5v8m6qr6
9 Jan 24
A method for chemical mechanical polishing includes receiving an angular removal profile for a carrier head and an angular thickness profile of a substrate.
Eric Lau, Charles C. Garretson, Huanbo Zhang, Zhize Zhu
Filed: 16 Mar 22
Utility
h1ai6h7mdbbz6c aut5kowtc6xkpc8s
9 Jan 24
Methods and apparatus for processing a substrate.
Rajesh Kumar Putti, Vinodh Ramachandran, Ananthkrishna Jupudi, Lean Wui Koh, Prashant Agarwal
Filed: 2 Sep 20
Utility
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9 Jan 24
A method includes generating, external to a radio frequency (RF) environment and based on a process recipe, a first signal and a second signal.
Phillip Criminale, Steve E. Babayan, Scott Edmonson, Phillip R. Sommer, Dan A. Marohl, Chris Blank
Filed: 26 Oct 20
Utility
s5kycvzupnb9x ccq3wkyy74hyvz230kq976hn9qhwe7v7hmwb1uezdno
9 Jan 24
Methods and apparatus for processing a substrate are provided herein.
Sriskantharajah Thirunavukarasu, Puay Han Tan, Karrthik Parathithasan, Jun-Liang Su, Fang Jie Lim, Chin Wei Tan, Wei Jie Dickson Teo
Filed: 17 Sep 20
Utility
5n08m3i57ojvsbedi1gjo1skd5q90
2 Jan 24
Implementations of the present disclosure generally relate to hardmask films and methods for depositing hardmask films.
Vivek Bharat Shah, Anup Kumar Singh, Bhaskar Kumar, Ganesh Balasubramanian
Filed: 3 Jan 19
Utility
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2 Jan 24
Methods of depositing a metal film are discussed.
Xi Cen, Kai Wu, Seshadri Ganguli, Xinming Zhang, Norman L. Tam, Abhilash Mayur
Filed: 21 May 21
Utility
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2 Jan 24
Methods of forming carbon polymer films are disclosed.
Bhaskar Jyoti Bhuyan, Mark Saly, Ahbijit Basu Mallick, Eugene Yu Jin Kong, Bo Qi
Filed: 12 Mar 20
Utility
ncfa9n15zmakqe26lvgpxescl2h8gk0x7sxx4xppm13nzup
2 Jan 24
Ampoules for a semiconductor manufacturing precursors and methods of use are described.
Carl White, Mohith Verghese, David Marquardt, Jose Alexandro Romero
Filed: 22 Dec 22
Utility
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2 Jan 24
The embodiments described herein generally relate to a stem assembly for coupling a susceptor to a process chamber.
Edric Tong, James Francis Mack, Paul Brillhart
Filed: 24 Sep 20
Utility
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2 Jan 24
Disclosed herein is a method for depth-profiling of samples including a target region including a lateral structural feature.
Ori Golani, Ido Almog
Filed: 20 Oct 22
Utility
o6zt3g7s0aflsb38qan8s10exzuoq645dxi0ieflyc gstzmirx53d26ak9
2 Jan 24
Substrate processing systems or platforms and methods configured to process substrates including of extreme ultraviolet (EUV) mask blanks are disclosed.
Ribhu Gautam, Vibhu Jindal, Sanjay Bhat, Praveen Kumar Choragudi, Vinodh Ramachandran, Arun Rengaraj
Filed: 21 Dec 20
Utility
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2 Jan 24
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed.
Shuwei Liu, Shiyu Liu, Azeddine Zerrade, Vibhu Jindal
Filed: 23 Mar 21
Utility
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2 Jan 24
A method for detecting a rare stochastic defect, the method may include searching for a rare stochastic defect in a dense pattern of a substrate, wherein the rare stochastic defect is (a) of nanometric scale, (b) appears in a functional pattern of the substrate with a defect density that is below 10−9, and (c) appears in the dense pattern with a defect density that is above 10−7; wherein the dense pattern is a dense representation of the functional pattern that differs from the functional pattern by at least one out of (a) a distance between features of the dense pattern, and (b) a width of the features of the dense pattern; and estimating the occurrence of the rare stochastic defect within the functional pattern based on an outcome of the searching.
Guy Cohen
Filed: 13 Aug 21
Utility
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2 Jan 24
A method includes receiving a set of feature models, each feature model of the set of feature models corresponding to a respective feature associated with processing of a component, receiving a set of target properties for processing the component, where the set of target properties includes, for each feature, a respective target, determining, based on the set of feature models, one or more sets of predicted processing parameters in view of the set of target properties, generating one or more candidate process recipes each corresponding to a respective one of the one or more sets of predicted processing parameters, where the one or more candidate process recipes each correspond to a set of predicted properties including, for each feature, a respective predicted property value resulting from component processing, and selecting, from the one or more candidate process recipes, a process recipe for processing the component.
Dermot P. Cantwell, Taehun Kim
Filed: 13 Sep 21
Utility
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2 Jan 24
Systems, apparatus, and methods are disclosed for foreline diagnostics and control.
Ala Moradian, Martin A. Hilkene, Zuoming Zhu, Errol Antonio C. Sanchez, Bindusagar Marath Sankarathodi, Patricia M. Liu, Surendra Singh Srivastava
Filed: 27 Oct 20
Utility
b3t9c5ma51s ofmld6apgipwiv4s3t0icvrzh8wpzeuds
2 Jan 24
A system and method for reducing charge on a workpiece disposed on a platen is disclosed.
David Morrell, Dawei Sun, Qin Chen
Filed: 10 May 22
Utility
ixyi5z4kk2we3rl7ilfj9u4qsnin1fcljp7hb4yoc16t32adv
2 Jan 24
Exemplary processing methods may include forming a plasma of a silicon-containing precursor.
Bhargav S. Citla, Soham Asrani, Joshua Rubnitz, Srinivas D. Nemani, Ellie Y. Yieh
Filed: 8 Sep 21
Utility
bwvdkh1uvj8ms7n46tkkkxukch055n9upkjo1b7iig2e4wa46ufojj9qc3xy
2 Jan 24
A semiconductor processing system includes a remote plasma source (RPS), a faceplate, and an output manifold positioned between the RPS and the faceplate.
Fang Ruan, Diwakar Kedlaya, Amit Bansal, Venkata Sharat Chandra Parimi, Rajaram Narayanan, Badri N. Ramamurthi, Sherry L. Mings, Job George Konnoth Joseph, Rupankar Choudhury
Filed: 15 Oct 20