3198 patents
Page 6 of 160
Utility
Image acquisition by an electron beam examination tool for metrology measurement
28 Nov 23
There is provided a system and a method comprising obtaining a sequence of a plurality of frames of an area of a specimen, wherein at least one frame of the sequence is transformed with respect to another frame, obtaining a reference frame based at least on a first frame of the sequence, determining, based on the reference frame, a reference pattern, wherein the reference pattern is informative of a structural feature of the specimen in the area, for a given frame of the sequence, determining, based on the given frame, a pattern informative of said structural feature in the area, determining data Dshrinkage informative of an amplitude of a spatial transformation between the reference pattern and the pattern, generating a corrected frame based on said pattern and Dshrinkage and generating an image of the area.
Bobin Mathew Skaria, Anirban Ghosh, Nitin Singh Malik, Shay Attal
Filed: 30 Sep 20
Utility
Large area self imaging lithography based on broadband light source
28 Nov 23
Embodiments described herein provide a method of large area lithography to decrease widths of portions written into photoresists.
Arvinder Chadha, Kevin Laughton Cunningham
Filed: 3 May 21
Utility
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28 Nov 23
Disclosed herein is technology for performing predictive modeling to identify inputs for a manufacturing process.
Sidharth Bhatia, Dermot Cantwell, Serghei Malkov, Jie Feng
Filed: 21 May 20
Utility
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28 Nov 23
Embodiments of the present disclosure generally relate to a pedestal for increasing temperature uniformity in a substrate supported thereon.
Venkata Sharat Chandra Parimi, Zubin Huang, Jian Li, Satish Radhakrishnan, Rui Cheng, Diwakar N. Kedlaya, Juan Carlos Rocha-Alvarez, Umesh M. Kelkar, Karthik Janakiraman, Sarah Michelle Bobek, Prashant Kumar Kulshreshtha, Vinay K. Prabhakar, Byung Seok Kwon
Filed: 4 Dec 19
Utility
034wjp2p2enzks1w2d aavpafwhf9qfarp
28 Nov 23
Apparatus and methods for forming and using internally divisible physical vapor deposition (PVD) process chambers using shutter disks are provided herein.
John Joseph Mazzocco, Anantha K. Subramani, Yang Guo
Filed: 24 Jun 22
Utility
1v2ft1lfje3oq86ytmsbbxlh2ltn606nnqcz
28 Nov 23
Embodiments of the present disclosure generally relate to methods of cleaning a structure and methods of depositing a capping layer in a structure.
Naomi Yoshida, He Ren, Hao Jiang, Chenfei Shen, Chi-Chou Lin, Hao Chen, Xuesong Lu, Mehul B. Naik
Filed: 20 Jan 21
Utility
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28 Nov 23
A method for dielectric filling of a feature on a substrate yields a seamless dielectric fill with high-k for narrow features.
Chengyu Liu, Ruitong Xiong, Bo Xie, Xianmin Tang, Yijun Liu, Li-Qun Xia
Filed: 13 Oct 21
Utility
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28 Nov 23
Exemplary methods of semiconductor processing may include providing a boron-and-carbon-and-nitrogen-containing precursor to a processing region of a semiconductor processing chamber.
Zeqing Shen, Bo Qi, Abhijit Basu Mallick, Nitin K. Ingle
Filed: 8 Jan 21
Utility
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28 Nov 23
Exemplary methods of semiconductor processing may include providing a silicon-containing precursor to a processing region of a semiconductor processing chamber.
Huiyuan Wang, Susmit Singha Roy, Abhijit Basu Mallick
Filed: 19 May 21
Utility
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28 Nov 23
Provided herein are approaches for forming an image sensor with increased well depth due to cryogenic ion channeling of ultra-high energy (UHE) ions.
Hans-Joachim L. Gossmann, Stanislav S. Todorov, Hiroyuki Ito
Filed: 7 Oct 20
Utility
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28 Nov 23
Disclosed herein are embodiments of a servo-control system comprising at least one pneumatic actuator comprising a movable member, at least one proportional pneumatic valve configured to control fluid flow between the at least one pneumatic actuator and a pressurized fluid supply or a vent, a plurality of pressure sensors each configured to independently measure pressure in a respective supply line to the at least one pneumatic actuator, at least one position sensor configured to measure a position of the moveable member, and a controller.
Paul Wirth, Behzad Taheri
Filed: 27 Sep 22
Utility
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28 Nov 23
An article, apparatus, and method for detecting an etch material selectivity is provided.
Keith Berding, Blake Erickson, Soumendra Barman, Zhaozhao Zhu
Filed: 10 Aug 21
Utility
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28 Nov 23
Exemplary methods of processing a semiconductor substrate may include forming a layer of dielectric material on the semiconductor substrate.
Amirhasan Nourbakhsh, Lan Yu, Joseph F. Salfelder, Ki Cheol Ahn, Tyler Sherwood, Siddarth Krishnan, Michael Jason Fronckowiak, Xing Chen
Filed: 26 Mar 21
Utility
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21 Nov 23
Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber.
Yue Guo, Yang Yang, Kartik Ramaswamy
Filed: 11 Jun 21
Utility
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21 Nov 23
A method of depositing titanium nitride is disclosed.
Hanhong Chen, Arkaprava Dan, Joseph AuBuchon, Kyoung Ha Kim, Philip A. Kraus
Filed: 11 Aug 20
Utility
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21 Nov 23
Plasma source assemblies, gas distribution assemblies including the plasma source assembly and methods of generating plasma are described.
Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno, Avinash Shervegar, Kallol Bera, Xiaopu Li, Anantha K. Subramani, John C. Forster
Filed: 1 Mar 19
Utility
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21 Nov 23
Methods of forming SiCON films comprising sequential exposure to a silicon precursor and a mixture of alkanolamine and amine reactants and an optional plasma are described.
Mark Saly, David Thompson, Thomas Knisley, Bhaskar Jyoti Bhuyan
Filed: 12 Oct 20
Utility
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21 Nov 23
The present disclosure provides systems and methods for processing channel structures of substrates that include positioning the substrate in a first processing chamber having a first processing volume.
Xinming Zhang, Abhilash J. Mayur, Shashank Sharma, Norman L. Tam, Matthew Spuller
Filed: 12 Feb 21
Utility
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21 Nov 23
The present disclosure relates to load cups that include an annular substrate station configured to receive a substrate.
Wei Lu, Jimin Zhang, Jianshe Tang, Brian J. Brown
Filed: 6 Nov 20
Utility
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21 Nov 23
A side storage pod includes an outer enclosure having a sealing surface configured to couple to an EFEM and a side storage pod chamber having a body coupled to vertically-spaced storage members.
Patrick Pannese
Filed: 8 Nov 21