3198 patents
Page 8 of 160
Utility
Temperature calibration with band gap absorption method
14 Nov 23
A method and apparatus for calibration non-contact temperature sensors within a process chamber are described herein.
Zhepeng Cong, Schubert S. Chu, Nyi O. Myo
Filed: 13 May 22
Utility
Detection of surface particles on chamber components with carbon dioxide
14 Nov 23
A stream including at least one of solid CO2 particles or CO2 droplets is directed toward an article including surface particles.
Changgong Wang, Zhili Zuo, Chang Ke, Song-Moon Suh
Filed: 11 Aug 22
Utility
tz3786r933z4okvm6y4lwnxf49bqg9ojm46h1nyj62a
14 Nov 23
Extreme ultraviolet (EUV) mask blanks, production systems therefor, and methods of increasing multilayer film reflectance are disclosed.
Wen Xiao, Binni Varghese, Vibhu Jindal
Filed: 30 Aug 21
Utility
b4sapuj85jr9ve4j6pa4sw756mhn4cvv25 8lsik
14 Nov 23
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed.
Shuwei Liu, Shiyu Liu, Azeddine Zerrade, Vibhu Jindal
Filed: 23 Mar 21
Utility
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14 Nov 23
A method and apparatus for applying an electric field and/or a magnetic field to a photoresist layer without air gap intervention during photolithography processes is provided herein.
Douglas A Buchberger, Jr., Dmitry Lubomirsky, John O. Dukovic, Srinivas D. Nemani
Filed: 15 Feb 21
Utility
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14 Nov 23
Methods for patterning a substrate are described.
Joseph R. Johnson, Christopher Dennis Bencher
Filed: 10 May 22
Utility
5puzvystq55hh5z0om3iv3xzvygn3 jxwewnfnhgtqcvn4j2i
14 Nov 23
A method for aligning a substrate for fabrication of an optical device is disclosed that includes receiving a substrate having a first side and a second side opposite the first side, the first side of the substrate being oriented towards a scanner, the substrate having an alignment mark formed on the first side of the substrate, scanning the alignment mark with the scanner, and fabricating a first pattern for a first optical device on the first side of the substrate.
Yongan Xu, Ludovic Godet
Filed: 19 Sep 22
Utility
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14 Nov 23
Embodiments of the present disclosure relate to apparatus, systems and methods for managing organic compounds in thermal processing chambers.
Matthew Spuller, Dongming Iu
Filed: 6 Mar 20
Utility
o6yya2nywm1jo5y40drfddc0b 9fcca
14 Nov 23
A method, apparatus and system for processing a wafer in a plasma chamber system, which includes at least a plasma generating element and a biasing electrode, include generating a plasma in the plasma chamber system by applying a source RF source power to the plasma generating element for a first period of time of a pulse period of the RF source power, after the expiration of the first period of time, removing the source RF source power, after a delay after the removal of the RF source power, applying an RF bias signal to the biasing electrode for a second period of time to bias the generated plasma towards the wafer, and after the expiration of the second period of time, removing the RF bias signal from the biasing electrode before a next pulse period of the RF source power.
Akhil Mehrotra, Vinay Shankar Vidyarthi, Daksh Agarwal, Samaneh Sadighi, Jason Kenney, Rajinder Dhindsa
Filed: 29 Oct 18
Utility
n93tml8 9f22safqixm66c1f7yu02xpn3bgdafctuowu97t3uxg
14 Nov 23
Exemplary deposition methods may include forming a plasma of a silicon-containing precursor and at least one additional precursor within a processing region of a semiconductor processing chamber.
Madhu Santosh Kumar Mutyala, Sanjay Kamath, Deenesh Padhi
Filed: 5 Feb 20
Utility
86ksiyhjnzkgmsfxjhel1qorccqb
14 Nov 23
Implementations described herein generally relate to a method for forming a metal layer and to a method for forming an oxide layer on the metal layer.
Susmit Singha Roy, Kelvin Chan, Hien Minh Le, Sanjay Kamath, Abhijit Basu Mallick, Srinivas Gandikota, Karthik Janakiraman
Filed: 29 Aug 19
Utility
8g0jbwnftvm3pauy133a8m35hmth8usnwxx7y
14 Nov 23
A shutter disc for use in a cluster tool assembly having a processing chamber and a transfer arm includes an inner disc and an outer disc configured to be disposed on the inner disc.
Srinivasa Rao Yedla, Kirankumar Neelasandra Savandaiah, Thomas Brezoczky, Bhaskar Prasad, Nitin Bharadwaj Satyavolu
Filed: 27 Jul 20
Utility
ljb63p2r73h08ia7lmcc4vb1la5tk0nzwpcl41fik75ihtwh3
14 Nov 23
Embodiments of the disclosure are directed to load lock chambers and methods of using load lock chambers.
William T. Weaver, Andrew J. Constant, Shay Assaf, Jacob Newman
Filed: 22 Sep 20
Utility
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14 Nov 23
In one implementation, an integrated processing tool for the deposition and processing of lithium metal in energy storage devices.
Subramanya P. Herle, Dieter Haas
Filed: 24 Feb 21
Utility
ohio27a89i9supl8dsu17s21yur5r71tozg55u
14 Nov 23
An enclosure system includes multiple walls forming an interior volume.
Phillip Alfred Criminale, Zhiqiang Guo, Andrew S. C. Ho, Rachel Sara Stolzman, Michael Carl Hankes
Filed: 2 Mar 22
Utility
6q7k 12vyrmuwzpoo0mqjphjvob1pm2ah90512ogibxus02
14 Nov 23
A heater assembly having a backside purge gap formed between a top plate and a heater of the heater assembly, the top plate having a top plate wall.
Dhritiman Subha Kashyap, Amit Rajendra Sherekar, Kartik Shah, Ashutosh Agarwal, Eric J. Hoffmann, Sanjeev Baluja, Vijay D. Parkhe
Filed: 26 Mar 21
Utility
6livgn9608iit3dux5gg7i59idm2 vgt6ix
14 Nov 23
An apparatus may include a drift tube assembly, the drift tube assembly defining a triple gap configuration, and arranged to accelerate and transmit an ion beam along abeam path.
Frank Sinclair, Wai-Ming Tam, Costel Biloiu, William Davis Lee
Filed: 29 Jan 21
Utility
suf3f49q5rkasumz6z8jhlyce8j5osnfe3w0d
14 Nov 23
Examples herein relate to three-dimensional (3D) dynamic random access memory (DRAM) and corresponding methods.
Chang Seok Kang, Tomohiko Kitajima, Sung-Kwan Kang, Fredrick Fishburn, Gill Yong Lee, Nitin K. Ingle
Filed: 27 Sep 21
Utility
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14 Nov 23
Embodiments of the disclosure provide methods and apparatus for fabricating magnetic tunnel junction (MTJ) structures on a substrate in for hybrid (or called integrated) spin-orbit-torque magnetic spin-transfer-torque magnetic random access memory (SOT-STT MRAM) applications.
Hsin-wei Tseng, Chando Park, Jaesoo Ahn, Lin Xue, Mahendra Pakala
Filed: 19 Jul 21
Utility
88hmma9awj7i5jw5faux7f658h2c43d64 8kmwone5ge
7 Nov 23
Embodiments herein generally relate to polishing pads and method of forming polishing pads.
Puneet Narendra Jawali, Nandan Baradanahalli Kenchappa, Jason G. Fung, Shiyan Akalanka Jayanath Wewala Gonnagahadeniyage, Rajeev Bajaj, Adam Wade Manzonie, Andrew Scott Lawing
Filed: 19 Jun 20