3198 patents
Page 12 of 160
Utility
Methods of controlling gas pressure in gas-pulsing-based precursor distribution systems
17 Oct 23
Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described.
Mauro Cimino, Arkaprava Dan, Paul Z. Wirth
Filed: 18 Jun 20
Utility
Processing chamber with annealing mini-environment
17 Oct 23
Apparatus and methods to process one or more wafers are described.
Michael Honan, David Blahnik, Robert Brent Vopat, Jeffrey Blahnik, Charles Carlson
Filed: 28 Oct 19
Utility
wu754595f06gjdiktk7lx3tsaeorbvpw8hb8lu
17 Oct 23
Electronic device processing systems including an equipment front end module (EFEM) with at least one side storage pod are described.
Paul B. Reuter, Dean C. Hruzek
Filed: 11 Nov 22
Utility
et3dsatdyp7iff2kbb1vvq54xqzzxd8a6779jgtzcf90c4tsnvktlxy6w
17 Oct 23
Substrate supports, substrate support assemblies and methods of using the substrate supports are described.
Tejas Ulavi, Arkaprava Dan, Mike Murtagh, Sanjeev Baluja
Filed: 7 May 21
Utility
cb2n0mrq1ubuwnods8t fu9tjogz6c3ezll3679tw
17 Oct 23
A method of polishing a substrate includes polishing a conductive layer on the substrate at a polishing station, monitoring the layer with an in-situ eddy current monitoring system to generate a plurality of measured signals values for a plurality of different locations on the layer, generating thickness measurements the locations, and detecting a polishing endpoint or modifying a polishing parameter based on the thickness measurements.
Kun Xu, Kiran Lall Shrestha, Doyle E. Bennett, David Maxwell Gage, Benjamin Cherian, Jun Qian, Harry Q. Lee
Filed: 11 May 21
Utility
c94f23b5qz3j32ze2bprg ywr02
17 Oct 23
A superconducting nanowire single photon detector (SNSPD) device includes a substrate, a distributed Bragg reflector on the substrate, a seed layer of a metal nitride on the distributed Bragg reflector, and a superconductive wire on the seed layer.
Zihao Yang, Mingwei Zhu, Nag B. Patibandla, Nir Yahav, Robert Jan Visser, Adi de la Zerda
Filed: 29 Jan 21
Utility
g4ekn3h6f4zryj gx0uhdz3qean91qe89gt3ji
17 Oct 23
Embodiments described and discussed herein generally relate to flexible or foldable display devices, and more specifically to flexible cover lens assemblies.
Manivannan Thothadri, Harvey You, Helinda Nominanda, Neil Morrison, Daniel Paul Forster, Arvinder Chadha
Filed: 16 Jun 20
Utility
v8wqhwksx3czpgm6vvug05mv6b7t54vzcazo21btr18i
17 Oct 23
Extreme ultraviolet (EUV) mask blanks and methods for their manufacture, and production systems therefor are disclosed.
Wen Xiao, Vibhu Jindal, Weimin Li, Sanjay Bhat, Azeddine Zerrade
Filed: 20 Apr 21
Utility
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17 Oct 23
A method includes receiving one or more fingerprint dimensions to be used to generate a fingerprint.
James Robert Moyne, Jimmy Iskandar
Filed: 26 Oct 21
Utility
kfs3u50lt70jkd4bgydgbnzx8q yc0mxzvrzk9oe
17 Oct 23
A system for classifying a pattern of interest (POI) on a semiconductor specimen is disclosed.
Irad Peleg, Ran Schleyen, Boaz Cohen
Filed: 23 May 22
Utility
lb8f1lkuw4xmgtyxep8ox79ctmy5gbhgs0dlx3v70wy
10 Oct 23
In acquisition of spatial transcriptomic information, a plurality of images representing a common field of view of a sample are obtained and registered.
Yun-Ching Chang, Dan Xie, Chloe Kim
Filed: 16 Dec 20
Utility
8kpa6hfxyooty4dkcbtidw0e85zp41tz9
10 Oct 23
A method includes causing manufacturing equipment to generate a RF signal to energize a processing chamber associated with the manufacturing equipment.
Tao Zhang, Upendra Ummethala
Filed: 24 Dec 20
Utility
1ykwisybzub 1k4m8lm2
10 Oct 23
A chamber includes a target (16) and a magnetron (50) disposed over the target (16).
Lizhong Sun, Xiaodong Yang, Yufei Zhou, Yi Yang
Filed: 14 Nov 18
Utility
rmc0a7fb1fhrq3l0mw56yicnohe83ngfw56gudeyxletbwpeinvmyfggtj5
10 Oct 23
Methods and apparatus for processing a substrate are provided herein.
Mengxue Wu, Siew Kit Hoi, Jay Min Soh, Yue Cui, Chul Nyoung Lee, Palaniappan Chidambaram, Jiao Song
Filed: 28 May 21
Utility
2pme0y3mvk uvnspntkxgv4yw5y0vui04em3z5g
10 Oct 23
Embodiments herein provide methods of depositing an amorphous carbon layer using a plasma enhanced chemical vapor deposition (PECVD) process and hard masks formed therefrom.
Eswaranand Venkatasubramanian, Yang Yang, Pramit Manna, Kartik Ramaswamy, Takehito Koshizawa, Abhijit Basu Mallick
Filed: 6 Oct 22
Utility
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10 Oct 23
Disclosed herein are systems and methods relating to a transfer chamber for an electronic device processing system.
Alex Berger, Jeffrey Hudgens, Eric Englhardt
Filed: 8 Jul 21
Utility
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10 Oct 23
Methods and apparatus for supporting substrates are provided herein.
Shashidhara Patel, Ananthkrishna Jupudi, Ribhu Gautam
Filed: 12 Apr 21
Utility
rn771n9o4k4318g65h87hcap82qf12hf24kr
10 Oct 23
A substrate processing system is disclosed which includes a processing chamber comprising a susceptor having a first surface and a second surface opposite to the first surface, a groove formed in the first surface adjacent to a perimeter thereof, and a substrate support structure including a plurality of carrier lift pins, each of the plurality of carrier lift pins movably disposed in an opening formed from the second surface to the first surface, wherein the opening is recessed from the groove.
Masato Ishii, Richard O. Collins, Richard Giljum, Alexander Berger
Filed: 15 Jul 22
Utility
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10 Oct 23
Implementations described herein provide a substrate support assembly.
Vijay D. Parkhe
Filed: 10 Mar 20
Utility
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10 Oct 23
Electronic devices and methods of forming electronic devices using a ruthenium or doped ruthenium liner and cap layer are described.
Wenjing Xu, Feng Chen, Tae Hong Ha, Xianmin Tang, Lu Chen, Zhiyuan Wu
Filed: 6 Jul 22