42 patents
Page 2 of 3
Utility
Multi-layer Calibration for Empirical Overlay Measurement
13 Oct 22
Overlay is determined for a device using signals measured from the device and a signal response to overlay determined from a plurality of calibration targets.
Nigel P. SMITH, Francis Scott HOOVER, Nicholas James KELLER, Kevin Eduard Heidrich
Filed: 29 Mar 22
Utility
Opto-acoustic Measurement of a Transparent Film Stack
6 Oct 22
A non-destructive opto-acoustic metrology device detects the presence and location of non-uniformities in a film stack that includes a large number, e.g., 50 or more, transparent layers.
George Andrew Antonelli, Manjusha S. Mehendale, Robin Mair, Nicholas James Keller
Filed: 30 Mar 21
Utility
Non-destructive Inspection and Manufacturing Metrology Systems and Methods
21 Jul 22
Measuring or inspecting samples through non-destructive systems and methods.
Manjusha MEHENDALE, Marco ALVES, Robin MAIR
Filed: 22 May 20
Utility
Vortex Polarimeter
2 Jun 22
An optical metrology device uses a multi-wavelength beam of light that has azimuthally varying polarization states and/or phase states, referred to as a vortex beam.
Kenneth E. James, John F. Lesoine, Pedro Vagos
Filed: 2 Dec 20
Utility
Focus System for Oblique Optical Metrology Device
2 Jun 22
The light from an optical metrology device is focused into a measurement spot on a sample using a focusing system.
Amit SHACHAF, Daniel Thompson, John F. Lesoine
Filed: 2 Dec 20
Utility
System and Method for Optimizing a Lithography Exposure Process
10 Mar 22
A method for correcting misalignments is provided.
Elvino da Silveira, Keith F. Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
Filed: 20 Aug 21
Utility
Target for Optical Measurement of Trenches
21 Oct 21
A metrology target is designed for measuring a feature at the bottom of a trench in a device under test, such as a tungsten recess vertical profile in a wordline in a three-dimensional (3D) NAND.
Nicholas JAMES KELLER, George Andrew ANTONELLI
Filed: 15 Apr 21
Utility
Characterization of Patterned Structures Using Acoustic Metrology
14 Oct 21
Systems and methods for inspecting or characterizing samples, such as by characterizing patterned features or structures of the sample.
Manjusha Mehendale, Michael Kotelyanskii, Priya Mukundhan, Robin Mair
Filed: 30 Mar 21
Utility
Enhanced Heat Transfer In Liquefied Gas Cooled Detector
7 Oct 21
A horizontal Dewar flask is used with an optical metrology device, which may advantageously reduce the vertical height of the device.
James GIVENS
Filed: 3 Apr 20
Utility
System and Method for Correcting Overlay Errors In a Lithographic Process
26 Aug 21
As feature sizes of semiconductor chips shrink there is a need for tighter overlay between layers in a lithography process.
Zhiyang LI, Tong YANG
Filed: 19 Feb 21
Utility
Fast Generalized Multi-wavelength Ellipsometer
26 Aug 21
An ellipsometer uses a broadband light source and a Fresnel cone to produce a simultaneous broadband polarization state generator with no moving parts.
Alexander George Boosalis
Filed: 20 Feb 20
Utility
Beamsplitter Based Ellipsometer Focusing System
1 Apr 21
An ellipsometer includes a focusing system that uses an image of the measurement spot to determine a best focal position for the ellipsometer.
John F. Lesoine
Filed: 1 Oct 19
Utility
Sample Surface Polarization Modification In Interferometric Defect Inspection
25 Mar 21
Defects are detected using data acquired from an interference channel and a polarization modification channel in an interferometer.
Nigel P. SMITH
Filed: 13 Jul 20
Utility
Conformal Stage
23 Dec 20
An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels.
J. Casey DONAHER, Edward J. FICARRA, Christopher J. MCLAUGHLIN
Filed: 20 Dec 18
Utility
Active Damper for Semiconductor Metrology and Inspection Systems
25 Nov 20
A damper for a semiconductor metrology or inspection system includes a pair of parallel plates with a fluid with a variable viscosity retained between plates.
Paul A. DOYLE, Mark James Franceschi, Morgan A. Crouch, Kenneth E. James
Filed: 23 May 19
Utility
Optical Metrology Device Using Numerical Aperture Reduction
18 Nov 20
A metrology device that can determine at least one characteristics of a sample is disclosed.
George Andrew Antonelli, Troy Daniel Ribaudo, Michael J. Hammond
Filed: 12 May 20
Utility
Laser Triangulation Sensor System and Method for Wafer Inspection
11 Nov 20
Systems and methods for measuring a dimension of a 3D structure of a semiconductor device, such as height of a pad or bump supported by a film layer.
John Schaefer
Filed: 5 Nov 18
Utility
Separated Axis Lithographic Tool
21 Oct 20
A stepper (100) for lithographic processing of semiconductor substrates includes abase (102), a chuck (104) that moves only along an X axis of a coordinate system, a bridge (114) mounted over the base and the chuck, and at least one projection camera (112) mounted on the bridge.
J. Casey DONAHER
Filed: 25 Dec 18
Utility
High Resolution Stage Positioner
9 Sep 20
A mechanism for localizing a substrate relative to a projection camera or other apparatus over large travel distances is described.
J. Casey DONAHER
Filed: 12 Sep 18
Utility
System and Method for Optimizing a Lithography Exposure Process
22 Jul 20
A method for correcting misalignments is provided.
Elvino DA SILVEIRA, Keith Frank BEST, Wayne FITZGERALD, Jian LU, Xin SONG, J. Casey DONAHER, Christopher J. MCLAUGHLIN
Filed: 27 Sep 18