110 patents
Utility
Multiple Objectives Metrology System, Lithographic Apparatus, and Methods Thereof
11 Jan 24
A metrology or inspection system, a lithographic apparatus, and a method are provided.
Douglas C. CAPPELLI
Filed: 16 Nov 21
Utility
Radiation Source Arrangement and Metrology Device
4 Jan 24
A radiation source arrangement including: a radiation source operable to generate source radiation including source energy pulses; and at least one non-linear energy-filter operable to filter the source radiation to obtain filtered radiation including filtered energy pulses.
Ali ALSAQQA, Aabid PATEL, Patrick Sebastian UEBEL, Amir ABDOLVAND, Paulus Antonius Andreas TEUNISSEN, Wisham F. KADHIM
Filed: 3 Aug 21
Utility
Polarization Selection Metrology System, Lithographic Apparatus, and Methods Thereof
14 Dec 23
An inspection system, a lithographic apparatus, and a method are provided.
Douglas C. CAPPELLI
Filed: 14 Oct 21
Utility
Vacuum Sheet Bond Fixturing and Flexible Burl Applications for Substrate Tables
30 Nov 23
Systems, apparatuses, and methods are provided for manufacturing a substrate table.
Abdullah ALIKHAN, Tammo UITTERDIJK, Johannes Bernardus Charles ENGELEN, Daniel KAMIENIECKI, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Thomas POIESZ, Leon Martin LEVASIER, Jim Vincent OVERKAMP, Johannes Adrianus Cornelis Maria PIJNENBURG, Koos VAN BERKEL, Gregory James DIGUIDO, Anthony C. SOCCI, JR., Iliya SIGAL, Bram Antonius Gerardus LOMANS, Michel Ben Isel HABETS
Filed: 2 Dec 21
Utility
Metrology Tool with Position Control of Projection System
9 Nov 23
A metrology tool that includes a substrate table to hold a substrate; a projection system configured to project a beam on a target portion of the substrate; an actuator configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.
Hans BUTLER, Arie Jeffrey DEN BOEF, Mark Constant Johannes BAGGEN, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Richard Carl ZIMMERMAN
Filed: 24 Aug 21
Utility
Systems and Methods for Forming Structures on a Surface
9 Nov 23
Systems and methods for forming structures (e.g., a plurality of support peaks) on a surface are described.
Sotrios LYRINTZIS, Keane Michael LEVY
Filed: 16 Mar 21
Utility
Double-scanning Opto-mechanical Configurations to Improve Throughput of Particle Inspection Systems
2 Nov 23
Systems, apparatuses, and methods are provided for increasing the throughput of a particle inspection system.
Michal Emanuel PAWLOWSKI
Filed: 20 Jul 21
Utility
Lithographic Apparatus, Metrology Systems, and Methods Thereof
26 Oct 23
A system includes an illumination system, an optical element, a switching element and a detector.
Simon Reinald HUISMAN, Sergey MALYK, Yuxiang LIN, Daan Maurits SLOTBOOM
Filed: 7 Jun 21
Utility
Lithographic Apparatus, Metrology System, and Intensity Imbalance Measurement for Error Correction
12 Oct 23
A metrology system includes a beam splitter and first and second sensors.
Earl William EBERT, Roxana REZVANI NARAGHI
Filed: 24 Jul 21
Utility
Sub Micron Particle Detection on Burl Tops by Applying a Variable Voltage to an Oxidized Wafer
5 Oct 23
Systems, apparatuses, methods, and computer program products are provided for determining a free form flatness of a substrate table.
Tammo UITTERDIJK
Filed: 4 Jun 21
Utility
Pod Handling Systems and Methods for a Lithographic Device
5 Oct 23
Systems, apparatuses, and methods are provided for transporting a reticle chamber (pod) for processing.
Boris KOGAN, Robert Jeffrey WADE, George Hilary HARROLD, Matthew BOUDREAU
Filed: 19 Aug 21
Utility
Lithographic Apparatus and Methods for Multi-exposure of a Substrate
21 Sep 23
A lithographic system and a method for exposing a substrate are provided.
Timothy Allan BRUNNER, Marcus Adrianus VAN DE KERKHOF
Filed: 19 Jul 21
Utility
Mode Control of Photonic Crystal Fiber Based Broadband Radiation Sources
7 Sep 23
A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF).
Sebastian Thomas BAUERSCHMIDT, Peter Maximilian GÖTZ, Patrick Sebastian UEBEL, Ronald Franciscus Herman HUGERS, Jan Adrianus BOER, Edwin Johannes Cornelis BOS, Andreas Johannes Antonius BROUNS, Vitaliy PROSYENTSOV, Paul William SCHOLTES - VAN EIJK, Paulus Antonius Andreas TEUNISSEN, Mahesh Upendra AJGAONKAR
Filed: 11 May 23
Utility
Spectrometric Metrology Systems Based on Multimode Interference and Lithographic Apparatus
31 Aug 23
A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor.
Mohamed SWILLAM, Justin Lloyd KREUZER, Stephen ROUX
Filed: 29 Jun 21
Utility
Lithographic Pre-alignment Imaging Sensor with Build-in Coaxial Illumination
27 Jul 23
A patterning device pre-alignment sensor system is disclosed.
Yuli VLADIMIRSKY, Lev RYZHIKOV
Filed: 20 May 21
Utility
Object Holder, Electrostatic Sheet and Method for Making an Electrostatic Sheet
27 Jul 23
An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.
Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Koos VAN BERKEL, Marcus Adrianus VAN DE KERKHOF, Roger Franciscus Mattheus Maria HAMELINCK, Shahab SHERVIN, Marinus Augustinus Christiaan VERSCHUREN, Johannes Bernardus Charles ENGELEN, Matthias KRUIZINGA, Tammo UITTERDIJK, Oleksiy Sergiyovich GALAKTIONOV, Kjeld Gertrudus Hendrikus JANSSEN, Johannes Adrianus Cornelis Maria PIJNENBURG, Peter VAN DELFT
Filed: 9 Jun 21
Utility
Lithographic Apparatus, Metrology Systems, Illumination Switches and Methods Thereof
6 Jul 23
A system includes an illumination system, an optical element, a switching element and a detector.
Mohamed SWILLAM, Marinus Petrus REIJNDERS
Filed: 4 Jun 21
Utility
Lithographic Apparatus, Multi-wavelength Phase-modulated Scanning Metrology System and Method
6 Jul 23
A metrology system includes a radiation source, first, second, and third optical systems, and a processor.
Sebastianus Adrianus GOORDEN, Filippo ALPEGGIANI, Simon Reinald HUISMAN, Johannes Jacobus Matheus BASELMANS, Haico Victor KOK, Mohamed SWILLAM, Arjan Johannes Anton BEUKMAN
Filed: 14 May 21
Utility
Contaminant Identification Metrology System, Lithographic Apparatus, and Methods Thereof
11 May 23
An inspection system (1600), a lithography apparatus, and an inspection method are provided.
Andrew JUDGE, Ravi Chaitanya KALLURI, Michal Emanuel PAWLOWSKI, James Hamilton WALSH, Justin Lloyd KREUZER
Filed: 8 Apr 21
Utility
Contaminant Analyzing Metrology System, Lithographic Apparatus, and Methods Thereof
4 May 23
An inspection system, a lithography apparatus, and an inspection method are provided.
Michal Emanuel PAWLOWSKI, Aage BENDIKSEN, Christopher Michael DOHAN, Johannes ONVLEE
Filed: 1 Apr 21