110 patents
Page 3 of 6
Utility
Lithographic Apparatus, Metrology System, and Illumination Systems with Structured Illumination
24 Nov 22
A system (500) includes an illumination system (502), a lens element (506), and a detector (504).
Yuxiang LIN, Joshua ADAMS, Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Krishanu SHOME
Filed: 14 Sep 20
Utility
Substrate Holder for Use In a Lithographic Apparatus
10 Nov 22
A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit.
Thomas POIESZ, Coen Hubertus Matheus BALTIS, Abraham Alexander SOETHOUDT, Mehmet Ali AKBAS, Dennis VAN DEN BERG, Wouter VANESCH, Marcel Maria Cornelius Franciscus TEUNISSEN
Filed: 21 Jul 22
Utility
a Method for Filtering an Image and Associated Metrology Apparatus
3 Nov 22
Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure.
Armand Eugene Albert, Justin Lloyd KREUZER, Nikhil MEHTA, Patrick WARNAAR, Vasco Tomas TENNER, Patricius Aloysius Jacobus TINNEMANS, Hugo Augustinus Joseph CRAMER
Filed: 3 Sep 20
Utility
Metrology Mark Structure and Method of Determining Metrology Mark Structure
3 Nov 22
A structure of a semiconductor device with a sub-segmented grating structure as a metrology mark and a method for configuring the metrology mark.
Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Robert John SOCHA, Stephen ROUX, Simon Reinald HUISMAN
Filed: 25 Sep 20
Utility
Metrology Systems, Coherence Scrambler Illumination Sources and Methods Thereof
27 Oct 22
A system includes a radiation source and a phased array.
Irwan Dani SETIJA, Arie Jeffrey DEN BOEF, Mohamed SWILLAM, Arjan Johannes Anton BEUKMAN
Filed: 27 Sep 20
Utility
Alignment Sensor Based on Wavelength-scanning
22 Sep 22
An alignment method includes directing an illumination beam with a varying wavelength or frequency towards an alignment target, collecting diffraction beams from the alignment target and directing towards an interferometer.
Muhsin ERALP
Filed: 22 Jul 20
Utility
Lithographic Patterning Device Multichannel Position and Level Gauge
22 Sep 22
A patterning device alignment system including a multipath sensory array including a first collimating light path and one or more other light paths, a first detector positioned at a first end of the first collimating light path, and a second detector positioned at a first end of the one or more other light paths, the first detector configured to receive a reflected illumination beam from an illuminated patterning device and calculate a tilt parameter of the patterning device, and the second detector configured to receive a second reflected illumination beam from a beam splitter and calculate an X-Y planar location position and a rotation position of the patterning device.
Yuli VLADIMIRSKY, Lev RYZHIKOV
Filed: 26 May 20
Utility
Apparatus for and Method of Sensing Alignment Marks
15 Sep 22
An apparatus for and method of sensing alignment marks in which a self-referencing interferometer based sensor outputs standing images of the alignment marks and camera device is used to capture the images as output by the sensor and a detector is used to obtain phase information about the alignment marks from the images as output by the sensor.
Krishanu SHOME, Igor Petronella AARTS, Junwon LEE
Filed: 28 Sep 20
Utility
Metrology System and Method
8 Sep 22
A method of determining an overlay measurement associated with a substrate and a system to obtain an overlay measurement associated with a patterning process.
Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Simon Reinald HUISMAN, Justin Lloyd KREUZER, Sebastianus Adrianus GOORDEN
Filed: 25 Aug 20
Utility
on Chip Sensor for Wafer Overlay Measurement
8 Sep 22
A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system.
Mohamed SWILLAM, Stephen ROUX, Tamer Mohamed Tawfik Ah ELAZHARY, Arie Jeffrey DEN BOEF
Filed: 5 Aug 20
Utility
on Chip Wafer Alignment Sensor
25 Aug 22
A sensor apparatus includes an illumination system, a detector system, and a processor.
Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Mohamed SWILLAM
Filed: 30 Jun 20
Utility
Mode Control of Photonic Crystal Fiber Based Broadband Radiation Sources
25 Aug 22
A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF).
Sebastian Thomas Bauerschmidt, Peter Maximilian Götz, Patrick Sebastian Uebel, Ronald Franciscus Herman Hugers, Jan Adrianus Boer, Edwin Johannes Cornelis Bos, Andreas Johannes Antonius Brouns, Vitaliy Prosyentsov, Paul William Scholtes - Van Eijk, Paulus Antonius Andreas Teunissen, Mahesh Upendra Ajgaonkar
Filed: 11 May 22
Utility
Improvements In Metrology Targets
18 Aug 22
A patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device.
Nikhil MEHTA, Maurits VAN DER SCHAAR, Markus Gerardus Martinus Maria VAN KRAAIJ, Hugo Augustinus Joseph CRAMER, Olger Victor ZWIER, Jeroen COTTAAR, Patrick WARNAAR
Filed: 6 Jul 20
Utility
Pellicle and Pellicle Assembly
11 Aug 22
A pellicle suitable for use with a patterning device for a lithographic apparatus.
David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willlem-Pieter VOORTHUIJZEN, James Norman WILEY
Filed: 25 Apr 22
Utility
Split Double Sided Wafer and Reticle Clamps
28 Jul 22
An electrostatic clamp and a method for fabricating the same.
Matthew LIPSON, Eric Justin MONKMAN, Victor Antonio PEREZ-FALCON
Filed: 11 May 20
Utility
Self-referencing Interferometer and Dual Self-referencing Interferometer Devices
14 Jul 22
A self-referencing interferometer (SRI) system for an alignment sensor apparatus includes a first prism and a second prism.
Douglas C. CAPPELLI
Filed: 19 May 20
Utility
Transport System Having a Magnetically Levitated Transportation Stage
16 Jun 22
A reticle transport system having a magnetically levitated transportation stage is disclosed.
Lei ZHOU, David L. TRUMPER, Ruvinda GUNAWARDANA
Filed: 7 Mar 22
Utility
Lithographic Apparatus, Metrology Apparatus, Optical System and Method
9 Jun 22
A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element and directing the beam, via an optical system, to a first reflective element at a first angle of incidence.
Stanislav SMIRNOV
Filed: 28 Feb 20
Utility
Sensor Apparatus and Method for Lithographic Measurements
9 Jun 22
Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.
Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Justin Lloyd KREUZER, Yuxiang LIN, Kirill Urievich SOBOLEV
Filed: 25 Mar 20
Utility
Electrostatic Clamp for a Lithographic Apparatus
12 May 22
An electrostatic clamp for supporting a substrate includes a substrate region, an electrode region at an edge of the substrate region, a support layer, an electrically conductive layer, a contact layer, and an electrode.
Hari KRISHNAN, Joseph Harry LYONS, Eric Justin MONKMAN, Victor Antonio PEREZ-FALCON
Filed: 6 Mar 20