110 patents
Page 6 of 6
Utility
Alignment Mark For Two-Dimensional Alignment In An Alignment System
22 Apr 20
An alignment mark for determining a two-dimensional alignment position of a substrate is discussed.
Gerrit Johannes NIJMEIJER, Junqiang ZHOU, Piotr Jan MEYER, Jeffrey John LOMBARDO, Igor Matheus Petronella AARTS
Filed: 1 May 18
Utility
Anti-Reflection Coating
1 Apr 20
A method of forming an anti-reflection layer, the method including applying a first mixture to an object, the first mixture made from a combination of aluminum tri-sec-butoxide (ATSB), a first chelating agent, water and an alcohol; removing a majority of the alcohol from the applied first mixture; after the removing, applying a second mixture to the object, the second mixture made from a combination of aluminum tri-sec-butoxide, a second chelating agent different than the first chelating agent, water and an alcohol; and removing a majority of the alcohol from the applied second mixture, wherein the applied first and second mixtures are used to form the anti-reflection layer.
Parag Vinayak KELKAR, David Hart PETERSON
Filed: 12 Mar 18
Utility
Method, Substrate and Apparatus to Measure Performance of Optical Metrology
4 Mar 20
A method including illuminating a product test substrate with radiation from a component, wherein the product test substrate does not have a device pattern etched therein and yields a non-zero sensitivity when illuminated, the non-zero sensitivity representing a change in an optical response characteristic of the product test substrate with respect to a change in a characteristic of the radiation; measuring at least a part of the radiation redirected by the product test substrate to determine a parameter value; and taking an action with respect to the component based on the parameter value.
Leonardo Gabriel MONTILLA, Krishanu SHOME
Filed: 16 Apr 18
Utility
Substrates and Methods of Using Those Substrates
4 Mar 20
A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
Matthew LIPSON, Christopher John MASON, Damoon SOHRABIBABAHEIDARY, Jimmy Matheus Wilhelmus VAN DE WINKEL, Bert Dirk SCHOLTEN
Filed: 30 Apr 18
Utility
Metrology Tool and Method of Using the Same
26 Feb 20
A method including: subsequent to a first device lithographic step of a device patterning process, measuring a degraded metrology mark on an object and/or a device pattern feature associated with the degraded metrology mark, the degraded metrology mark arising at least in part from the first device lithographic step on the object; and prior to a second device lithographic step of the device patterning process on the object, creating a replacement metrology mark, for use in the patterning process in place of the degraded metrology mark, on the object.
Justin Lloyd KREUZER
Filed: 12 Dec 17
Utility
Pellicle and Pellicle Assembly
26 Feb 20
A pellicle suitable for use with a patterning device for a lithographic apparatus.
David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnould Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN-ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY
Filed: 29 Oct 19
Utility
Mask Assembly
19 Feb 20
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François SylvainVirgile VAN LOO, Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
Filed: 29 Sep 19
Utility
Reticle Clamping Device
25 Dec 19
Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions.
Enrico ZORDAN, Brandon Adam EVANS, Daniei Nathan BURBANK, Ankur Ramesh BAHET!, Samir A. NAYFEH
Filed: 16 Jan 18
Utility
a Substrate Holder and a Method of Manufacturing a Substrate Holder
30 Oct 19
There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus.
Thomas POIESZ, Satish ACHANTA, Mehmet Ali AKBAS, Pavlo ANTONOV, Jeroen BOUWKNEGT, Joost Wilhelmus Maria FRENKEN, Evelyn Wallis PACITTI, Nicolaas TEN KATE, Bruce TIRRI, Jan VERHOEVEN
Filed: 5 Jul 17
Utility
Inspection Apparatus Having Non-Linear Optics
9 Oct 19
An inspection apparatus or lithographic apparatus includes an optical system and a detector.
Marinus Johannes Maria VAN DAM, Richard Carl Zimmerman
Filed: 24 Mar 19