110 patents
Page 5 of 6
Utility
Substrate Holder for Use In a Lithographic Apparatus
3 Jun 21
A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit.
Thomas POIESZ, Coen Hubertus Matheus BALTIS, Abraham Alexander SOETHOUDT, Mehmet Ali AKBAS, Dennis VAN DEN BERG, Wouter VANESCH, Marcel Maria Cornelius Franciscus TEUNISSEN
Filed: 22 Nov 18
Utility
Metrology Sensor, Lithographic Apparatus and Method for Manufacturing Devices
27 May 21
Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation.
Sebastianus Adrianus GOORDEN, Johannes Antonius Gerardus AKKERMANS, Simon Reinald HUISMAN, Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
Filed: 13 Apr 18
Utility
Alignment Sensor Apparatus for Process Sensivity Compensation
6 May 21
An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor.
Simon Reinald HUISMAN, Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Yuxiang LIN, Vu Quang TRAN, Sebastianus Adrianus GOORDEN, Justin Lloyd KREUZER, Christopher John MASON, Igor Matheus Petronella AARTS, Krishanu SHOME, Irit TZEMAH
Filed: 3 Apr 19
Utility
Lithographic Apparatus, Metrology Systems, Phased Array Illumination Sources and Methods thereof
1 Apr 21
A system includes a radiation source, first and second phased arrays, and a detector.
Mohamed SWILLAM, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
Filed: 23 Sep 20
Utility
High Stability Collimator Assembly, Lithographic Apparatus, and Method
11 Mar 21
A lithography system comprises an illumination system configured to produce abeam of radiation, a support configured to support a patterning device configured to impart a pattern on the beam, a projection system configured to project the patterned beam onto a substrate, and an alignment system comprising an illuminator.
David TAUB, Joseph Ashwin FRANKLIN, Jeffrey John KOWALSKI
Filed: 2 May 19
Utility
System, Device and Method for Reconditioning a Substrate Support
25 Feb 21
A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool.
Bert Dirk SCHOLTEN, Satish ACHANTA, Aydar AKCHURIN, Pavlo ANTONOV, Coen Hubertus Matheus BALTIS, Jeroen BOUWKNEGT, Ann-Sophie m. FARLE, Christopher John MASON, Ralph Nicholas PALERMO, Thomas POIESZ, Yuri Johannes Gabriel VAN DE VIJVER, Jimmy Matheus Wilhelmus VAN DE WINKEL
Filed: 24 Jan 19
Utility
Apparatus For and Method of In-Situ Particle Removal in a Lithography Apparatus
11 Feb 21
Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate.
Richard Joseph BRULS, Ronald Peter ALBRIGHT, Peter Conrad KOCHERSPERGER, Victor Antonio PEREZ-FALCON
Filed: 4 Feb 19
Utility
Broad Spectrum Radiation by Supercontinuum Generation Using a Tapered Optical Fiber
4 Feb 21
A measurement apparatus, including: a tapered optical fiber, the tapered optical fiber having an input to receive radiation and having an output to provide spectrally broadened output radiation toward a measurement target, the tapered optical fiber configured to spectrally broaden the radiation received at the input; and a detector system configured to receive a redirected portion of the output radiation from the measurement target.
King Pui LEUNG, Tao CHEN, Ronan James HAVELIN, Igor Matheus Petronella AARTS, Adel JOOBEUR, Joseph CARBONE
Filed: 9 Oct 20
Utility
Scan Signal Characterization Diagnostics
23 Dec 20
A system for and method of processing a wafer in which a scan signal is analyzed locally to extract information about alignment, overlay, mark quality, wafer quality, and the like.
Cornelis Melchior BROUWER, Krishanu SHOME
Filed: 18 Dec 18
Utility
Multi-image Particle Detection System and Method
9 Dec 20
A method including: obtaining a first image location for an image feature of a first image of at least part of an object surface, obtaining a second image location for an image feature in a second image of at least part of the object surface, and/or obtaining a value of the displacement between the first and second image locations, the first and second images obtained at different relative positions between an image surface of a detector and the object surface in a direction substantially parallel to the image surface and/or the object surface; and determining, by a computer system, that a physical feature is at an inspection surface or not at the inspection surface, based on an analysis of the second image location and/or the displacement value and on an anticipated image feature location of the image feature in the second image relative to the first image location.
Aage BENDIKSEN, Guobin OU, Michael Christopher KOCHANSKI, Michael Leo NELSON
Filed: 18 Dec 17
Utility
Truncated Flat Wire Coil
2 Dec 20
A flat wire coil lacking electrically insulating material on its upper and/or lower surfaces.
Michael Emerson BROWN
Filed: 4 Oct 18
Utility
Apparatus for and Method Cleaning a Support Inside a Lithography Apparatus
4 Nov 20
Methods and systems are described for cleaning a support such as a clamp of a chuck that holds a patterning device or a wafer in a lithographic apparatus.
Victor Antonio PEREZ-FALCON, Michael Andrew CHIEDA
Filed: 30 Jul 18
Utility
Apparatus and Method for Determining a Condition Associated with a Pellicle
28 Oct 20
An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.
Derk Servatius Gertruda BROUNS, Joshua ADAMS, Aage BENDIKSEN, Richard JACOBS, Andrew JUDGE, Veera Venkata Narasimha Narendra Phani KOTTAPALLI, Joseph Harry LYONS, Theodorus Marinus MODDERMAN, Manish RANJAN, Marcus Adrianus VAN DE KERKHOF, Xugang XIONG
Filed: 26 Nov 18
Utility
Beam Splitting Prism Systems
14 Oct 20
According to one embodiment, a prism system is provided.
Douglas C. CAPPELLI, Stanislav SMIRNOV, Richard Carl ZIMMERMAN, Joshua ADAMS, Alexander Kenneth RAUB, Yevgeniy Konstantinovich SHMAREV
Filed: 25 Jun 20
Utility
Lithographic Cluster, Lithographic Apparatus, and Device Manufacturing Method
14 Oct 20
A lithographic cluster includes a track unit and a lithographic apparatus.
Irit TZEMAH, Eric Brian CATEY, John David CONNELLY
Filed: 25 Oct 18
Utility
Beam Pointing Monitor and Compensation Systems
2 Sep 20
An optical system for beam pointing monitoring and compensation is provided.
Matthew E. HANSEN, Ronald A. WILKLOW
Filed: 3 Sep 18
Utility
Optical Arrangement for an Inspection Apparatus
26 Aug 20
An inspection apparatus, including: an optical system configured to provide a beam of radiation to a surface to be measured and to receive redirected radiation from the surface; and a detection system configured to measure the redirected radiation, wherein the optical system includes an optical element to process the radiation, the optical element including a Mac Neille-type multilayer polarizing coating configured to produce a reduced chromatic offset of the radiation.
Parag Vinayak KELKAR, Justin Lloyd KREUZER
Filed: 13 Sep 18
Utility
Particle Traps and Barriers for Particle Suppression
15 Jul 20
Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment.
Han-Kwang NIENHUYS, Ronald Peter ALBRIGHT, Jacob BRINKERT, Yang-Shan HUANG, Hendrikus Gijsbertus SCHIMMEL, Antonie Hendrik VERWEIJ
Filed: 17 Jul 18
Utility
Control of Reticle Placement for Defectivity Optimization
27 May 20
A system designed to couple a patterning device to a support structure having a plurality of burls includes a camera module, an actuator, and a controller.
Andrew JUDGE, Aage BENDIKSEN, Pedro Julian RIZO DIAGO
Filed: 27 Jun 18
Utility
Particle Suppression Systems and Methods
6 May 20
An object stage that includes a first structure and a second structure movable relative to the first structure.
Yang-Shan HUANG, Daniel Nathan BURBANK, Marco Koert STAVENGA
Filed: 17 Jul 18