2001 patents
Page 18 of 101
Utility
Thermal Conductive Silicone Composition
20 Apr 23
A thermal conductive silicone composition includes: (A) an organopolysiloxane having kinematic viscosity at 25° C. of 10 to 100,000 mm2/s; (B) a hydrolysable organopolysiloxane containing an alkoxysilyl group; (C) a heat conductive filler with average particle size of 4 to 30 μm containing a coarse particle with particle size of 45 μm or more in an amount of 0.5 mass % or less in the entire component (C), and an irregular-shaped zinc oxide particle in an amount of 40 to 90 mass % in the entire composition; and (D) an irregular-shaped zinc oxide particle having average particle size of 0.01 to 2 μm in an amount of 1 to 50 mass % in the entire composition, wherein the thermal conductivity of the silicone composition is 2.0 W/m·K or more and less than 7.0 W/m·K, and the viscosity at 25° C. is 5 to 800 Pa·s.
Wataru TOYA, Mitsuhiro IWATA, Takahiro YAMAGUCHI, Keita KITAZAWA
Filed: 3 Oct 22
Utility
Positive Resist Composition and Pattern Forming Process
20 Apr 23
A positive resist composition is provided comprising a base polymer comprising repeat units (a) having two triple bonds and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid.
Jun Hatakeyama, Masahiro Fukushima
Filed: 4 Oct 22
Utility
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20 Apr 23
A resist composition comprising a base polymer and a quencher is provided.
Jun Hatakeyama
Filed: 13 Oct 22
Utility
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18 Apr 23
Takeshi Kinsho, Yusuke Nagae, Shogo Tsukaguchi, Yasuhiko Kutsuwada, Tatsuya Hojo, Takeru Watanabe
Filed: 24 May 22
Utility
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18 Apr 23
Ryunosuke Hata
Filed: 2 Aug 19
Utility
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18 Apr 23
A back surface electrode type solar cell in which a p-type region having a p-conductive type, and an n-type region which has an n-conductive type and in which maximum concentration of additive impurities for providing the n-conductive type in a substrate width direction is equal to or higher than 5×1018 atoms/cm3 are disposed on a first main surface of a crystal silicon substrate, a first passivation film is disposed so as to cover the p-type region and the n-type region, and a second passivation film is disposed on a second main surface which is a surface opposite to the first main surface so as to cover the second main surface, the first passivation film and the second passivation film being formed with a compound containing oxide aluminum.
Hiroshi Hashigami, Takenori Watabe, Hiroyuki Ohtsuka, Ryo Mitta
Filed: 7 Nov 16
Utility
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13 Apr 23
A negative resist composition is provided comprising a base polymer, a quencher in the form of a sulfonium salt of a weaker acid than a sulfonic acid which is fluorinated at α- and/or β-position of the sulfo group, the sulfonium salt having at least two polymerizable double bonds in the molecule, and an acid generator capable of generating a sulfonic acid which is fluorinated at α- and/or β-position of the sulfo group.
Jun Hatakeyama, Hiroki Nonaka, Tomomi Watanabe
Filed: 12 Jul 22
Utility
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13 Apr 23
A chemically amplified resist composition comprising (A) a polymer adapted to increase its solubility in alkaline aqueous solution under the action of acid, (B) a photoacid generator capable of generating an acid upon exposure to KrF excimer laser, ArF excimer laser, EB or EUV, and (C) a quencher in the form of an amine compound of specific structure is provided.
Masaki Ohashi, Masahiro Fukushima, Kazuhiro Katayama
Filed: 14 Sep 22
Utility
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13 Apr 23
A negative resist composition is provided comprising a base polymer and an acid generator in the form of a sulfonium salt consisting of a sulfonate anion having a maleimide group and a cation having a polymerizable double bond.
Jun Hatakeyama
Filed: 14 Jul 22
Utility
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13 Apr 23
A curable fluoropolyether adhesive composition which comprises, each in a specific amount, (A) a straight-chain polyfluoro compound having two or more alkenyl groups per molecule and having a perfluoropolyether structure in the main chain, (B) a fluorine-containing organohydrogen siloxane having, per molecule, a perfluoroalkyl group, a perfluorooxyalkyl group, a perfluoroalkylene group or a perfluorooxyalkylene group and two or more SiH groups, and not having an epoxy group or an alkoxy group directly bonded to a silicon atom, (C) a platinum-group metal catalyst, and (D) a cyclic organopolysiloxane having, per molecule, an SiH group and an epoxy group and/or a trialkoxysilyl group bonded to a silicon atom via a divalent hydrocarbon group optionally containing an oxygen atom, and not having fluorine in molecule, and a cured product of which having a thickness of 2 mm shows a transmittance to light with a wavelength of 500 nm of 80% or higher.
Hidenori KOSHIKAWA
Filed: 15 Feb 21
Utility
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11 Apr 23
A substrate defect inspection method includes: irradiating a target substrate with an EUV beam from an EUV illumination source by using a first focusing optical system; guiding a scattered reflected beam, but no specularly-reflected beam, among beams reflected from the target substrate to a light receiving surface of a sensor by using a second focusing optical system; and determining that a defect is present at an irradiation spot of the target substrate with the EUV beam when an intensity of the received scattered reflected beam exceeds a predetermined threshold; the method further including, before the irradiation of the target substrate with the EUV beam: a reflectance acquisition step of acquiring a reflectance of the target substrate to the EUV beam; and a threshold computation step of setting the predetermined threshold based on the reflectance acquired in the reflectance acquisition step.
Tsuneo Terasawa, Yukio Inazuki, Hideo Kaneko
Filed: 19 Aug 21
Utility
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11 Apr 23
Provided is an antireflective member that has a water- and oil-repellent layer on a multi-layered antireflective layer and is capable of exhibiting excellent surface lubricity, water- and oil-repellent properties, and durability.
Yuji Yamane, Lisa Katayama, Ryusuke Sakoh, Takashi Matsuda
Filed: 8 Mar 18
Utility
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6 Apr 23
Shigeki YASUDA, Munenao HIROKAMI
Filed: 2 Feb 21
Utility
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6 Apr 23
A substrate with a film for a reflective mask blank including a substrate, a multilayer reflection film and a back surface conductive film having a composition at the side in contact with the substrate and a different composition at the side remotest from the substrate is provided.
Takuro KOSAKA, Taiga OGOSE
Filed: 12 Sep 22
Utility
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6 Apr 23
Masato KAWAKAMI
Filed: 20 Sep 22
Utility
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6 Apr 23
Masato KAWAKAMI
Filed: 20 Sep 22
Utility
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6 Apr 23
A negative resist composition is provided comprising a base polymer and an acid generator in the form of a sulfonium salt consisting of a sulfonate anion having an iodized or brominated hydrocarbyl group and a cation having a polymerizable double bond.
Jun Hatakeyama
Filed: 15 Jul 22
Utility
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6 Apr 23
Jun HATAKEYAMA, Naoki ISHIBASHI, Masayoshi SAGEHASHI
Filed: 7 Jul 22
Utility
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6 Apr 23
One of the objects of the present invention is to provide a cosmetic composition that comprises water-soluble silicone-modified polysaccharides and water, is capable of being blended in an aqueous phase of an emulsion, and improves the feeling during use, such as oiliness and stickiness.
Hiroyuki Moriya
Filed: 11 Mar 21
Utility
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30 Mar 23
A method for producing a cyclic polysiloxane that includes a step for reacting a raw material cyclic siloxane and a dihalosilane in association with ring-opening of the cyclic siloxane in the presence of at least one catalyst selected from Lewis base compounds having a carbonamide bond represented by —C(═O)N<, phosphorus compounds having a P═O bond, quaternary ammonium salts, and quaternary phosphonium salts to obtain a linear polysiloxane with both ends of the molecular chain blocked by halogen atoms and a step for obtaining a cyclic polysiloxane by reacting the linear polysiloxane with both ends of the molecular chain blocked by halogen atoms with water makes it possible to provide a method for producing a cyclic polysiloxane that obtains a cyclic polysiloxane at high yield and high purity by simple steps and under moderate conditions.
Ken NAKAYAMA, Shunji AOKI
Filed: 16 Feb 21