2001 patents
Page 22 of 101
Utility
Positive resist composition and patterning process
14 Feb 23
A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent.
Yoshinori Matsui, Masayoshi Sagehashi, Tatsushi Kaneko, Akihiro Seki, Satoshi Watanabe
Filed: 25 Feb 20
Utility
Mask Blanks Substrate and Method for Manufacturing the Same
9 Feb 23
A mask blanks substrate having a flatness of a calculation surface of 100 nm or less when a calculation region passing through central portions of first and second main surfaces and extending in a horizontal direction is set, a first region surface is cut out, a second region surface is cut out by setting a reference plane and a rotation axis and rotating the substrate by 180°, least square planes are calculated, the first and second region surfaces are converted into height maps to positions on the least square planes, the height map of the to second region surface is set as a reverse height map by symmetrically moving the height map, and a map of a calculated height obtained by adding heights of the height map of the first region surface and the reverse height map of the second region surface is set as the calculation surface.
Tomoaki SUGIYAMA, Daijitsu HARADA, Harunobu MATSUI, Naoki YARITA, Masaki TAKEUCHI
Filed: 1 Jul 22
Utility
busem1vflpckn35i1ah7x0ptb581js781o0fb154y5ianjtd6zrpym
9 Feb 23
An addition condensation product, i.e., an addition condensation product of an aromatic compound with a carbonyl compound, is obtained as a condensation reaction product in the state of uniform solution or the like, in which clumping caused by agglomeration of the condensation product of the aromatic compound with the carbonyl compound can be prevented by the presence of a surfactant at the time of the condensation reaction.
Kentaro YAMANAKA, Yoshikatsu TSUCHIYA, Masahiro USUKI
Filed: 8 Jul 22
Utility
ukofdoxciltw07dwc9rahonsfruvftjqlx8yrfa314b01k48cyju1xqaa960
9 Feb 23
In SiC single crystal production by the solution process, an alloy of silicon (Si) and a metallic element M that increases the solubility of carbon (C) is pre-impregnated into a SiC sintered body having a relative density of 50 to 90%, following which Si and M are placed in a SiC crucible made of the SiC sintered body and the Si and M within the SiC crucible are melted, forming a Si—C solution.
Naofumi Shinya, Norio Yamagata, Yu Hamaguchi, Takehisa Minowa
Filed: 2 Aug 22
Utility
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9 Feb 23
Yoshihiro TSUTSUMI, Hiroyuki IGUCHI, Yuki KUDO, Atsushi TSUURA, Tadaharu IKEDA
Filed: 7 Jun 22
Utility
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7 Feb 23
Dmitry Zubarev, Hiroyuki Urano, Katsuya Takemura, Masashi Iio, Kazuya Honda, Yoshio Kawai
Filed: 14 Apr 20
Utility
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2 Feb 23
Mamoru HAGIWARA, Kazuyuki TAKEWAKI
Filed: 23 Oct 20
Utility
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2 Feb 23
A positive resist composition is provided comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by a nitrobenzene ring-containing tertiary hydrocarbyl group.
Jun Hatakeyama, Masahiro Fukushima
Filed: 4 May 22
Utility
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2 Feb 23
A hydrophilic silicone particle containing a surfactant fixed by a chemical bond formed by radical polymerization to a surface of a silicone particle having a volume average particle size of 0.1 to 100 μm and a method for producing the hydrophilic silicone particle, the method including fixing a hydrophilic group derived from a component (B) to a surface of a silicone particle by subjecting an emulsion to radical polymerization, the emulsion containing: (A) 100 parts by mass of an organopolysiloxane having a radical polymerization reactive group; (B) 0.5 to 50 parts by mass of a surfactant having a radical polymerization reactive group; (C) 0.1 to 5 parts by mass of a radical generator; and (D) 10 to 1000 parts by mass of water.
Kazuyuki TAKEWAKI, Mamoru HAGIWARA
Filed: 23 Oct 20
Utility
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2 Feb 23
A photosensitive resin composition containing (A) an acid-crosslinkable group-containing silicone resin, (B) a photo-acid generator, and (C) quantum dot particles.
Hitoshi MARUYAMA, Tamotsu OOWADA
Filed: 12 Nov 20
Utility
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31 Jan 23
In the silicon core wire according to a first aspect of the present invention, a male thread part formed at one end of a first thin silicon rod and a female thread part formed at one end of a second thin silicon rod may be screwed together and fastened.
Naruhiro Hoshino, Tetsuro Okada, Masahiko Ishida
Filed: 8 Apr 20
Utility
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31 Jan 23
A thermosetting silicone resin composition contains the following components (A-1) to (D): (A-1) an alkenyl group-containing linear organopolysiloxane; (A-2) a branched organopolysiloxane shown by (R13SiO1/2)a(R23SiO1/2)b(SiO4/2)c (1); (B-1) a branched organohydrogenpolysiloxane shown by (HR22SiO1/2)d(R23SiO1/2)e(SiO4/2)f (2); (B-2) a linear organohydrogenpolysiloxane shown by (R23SiO1/2)2(HR2SiO2/2)x(R22SiO2/2)y (3); (C) an adhesion aid which is an epoxy group-containing branched organopolysiloxane; and (D) a catalyst containing a combination of a zero-valent platinum complex with a divalent platinum complex and/or a tetravalent platinum complex.
Tatsuya Yamazaki
Filed: 24 Aug 20
Utility
wwa9ki1hmmn9unp6dgpoa4d6rbltppe63qm6xxh5yaajjy6h39fwlmt
31 Jan 23
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of an iodized or brominated phenol, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
Jun Hatakeyama
Filed: 1 Jul 20
Utility
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26 Jan 23
A method for recycling a rare earth magnet is described.
Ko WATANABE, Kazuhito AKADA, Yuta KURIBARA, Yoshiyuki HAYASHI
Filed: 7 Jul 22
Utility
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26 Jan 23
Munenao HIROKAMI, Tetsuro YAMADA, Kazuhiro TSUCHIDA
Filed: 24 Jun 22
Utility
2x09g54mgk3swyxahkettq2t6idi6kmb3iqnna44ixzbw19t8zr
26 Jan 23
A resist composition is provided comprising a base polymer and a quencher comprising a salt compound consisting of a cyclic ammonium cation and a 1,1,1,3,3,3-hexafluoro-2-propoxide anion having a trifluoromethyl, hydrocarbylcarbonyl or hydrocarbyloxycarbonyl group bonded thereto.
Jun Hatakeyama
Filed: 25 Mar 21
Utility
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26 Jan 23
The present invention is a resist material containing a quencher, where the quencher contains a sulfonium salt of a carboxylic acid bonded to a maleimide group.
Jun HATAKEYAMA
Filed: 7 Jun 22
Utility
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26 Jan 23
Munenao HIROKAMI
Filed: 24 Jun 22
Utility
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26 Jan 23
Provided is a method for manufacturing an optical fiber glass preform in which a refractive index distribution is stable in a longitudinal direction of the glass preform.
Hiroki KOJIMA, Dai INOUE
Filed: 1 Jul 22
Utility
aamm7w50n2bdtmp92n3u9t3yuha5a48p2lcz87fqgoorpn1xl7jou7arxm
26 Jan 23
A positive resist composition is provided comprising (A) a specific sulfonium salt as quencher, (B) a sulfonium salt consisting of a fluorinated sulfonate anion and a sulfonium cation as acid generator, and (C) a base polymer comprising repeat units having an acid labile group.
Jun Hatakeyama, Takayuki Fujiwara
Filed: 10 Jun 22