855 patents
Page 5 of 43
Utility
Chemically amplified resist composition and patterning process
8 Aug 23
A chemically amplified resist composition comprising a quencher containing an ammonium salt of an iodized or brominated phenol and an acid generator exerts a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having satisfactory resolution, LWR and CDU.
Jun Hatakeyama
Filed: 16 Jul 20
Utility
Resist composition and pattern forming process
8 Aug 23
Jun Hatakeyama, Tomomi Watanabe
Filed: 25 Jan 21
Utility
Resist composition and patterning process
8 Aug 23
A resist composition comprising a base polymer and a salt is provided.
Jun Hatakeyama
Filed: 4 Aug 20
Utility
Positive resist composition and patterning process
8 Aug 23
A positive resist composition comprising a base polymer comprising recurring units (a) containing an imide group having an iodized aromatic group bonded thereto and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and size variation.
Jun Hatakeyama, Masahiro Fukushima
Filed: 2 Oct 20
Utility
Material for forming organic film, method for forming organic film, patterning process, and compound
8 Aug 23
Daisuke Kori, Takayoshi Nakahara, Yusuke Biyajima
Filed: 4 Nov 20
Utility
Alkoxysilyl group-containing organic silazane compound, method for producing same, composition containing same and cured product
25 Jul 23
Masato Kawakami
Filed: 16 Apr 20
Utility
Addition-curing silicone resin for producing heat-shielding film, method for forming heat-shielding film on inner surface of combustion chamber of engine by means of addition-curing silicone resin, heat-shielding film, and heat shielding method for reducing or preventing heat dissipation from combustion chamber of engine to outside by means of heat-shielding film
25 Jul 23
In a heat-shielding film formed of addition-curing silicone resin containing organopolysiloxane, organopolysiloxane includes the combination of a plurality of units including at least a R1SiO3/2 unit (a T unit), a R2R3SiO2/2 unit (a D unit), and a R4R5R6SiO1/2 unit (a M unit) (in each unit, R1 to R6 is aliphatic hydrocarbon or hydrogen), and the molar ratio of the T unit, the D unit, and the M unit among all structural units is T:33.3 mol % to 71.4 mol %, D:11.1 mol % to 42.9 mol %, and M:7.0 mol % to 42.9 mol %.
Kazuaki Yamamoto, Shinji Kadoshima, Hiroyuki Koga, Kazuyuki Negishi, Masahiko Minemura, Koichi Higuchi
Filed: 16 Dec 21
Utility
Resist composition and pattern forming process
25 Jul 23
Jun Hatakeyama, Takayuki Fujiwara
Filed: 23 Dec 20
Utility
Positive resist composition and pattern forming process
25 Jul 23
A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.
Jun Hatakeyama, Masahiro Fukushima
Filed: 30 Dec 20
Utility
Composition for forming organic film, patterning process, and polymer
25 Jul 23
Daisuke Kori, Takashi Sawamura, Kenta Ishiwata, Takayoshi Nakahara
Filed: 18 May 20
Utility
Apparatus and method for cutoff machining sintered magnet
18 Jul 23
A sintered magnet sawing apparatus is provided comprising a cylindrical work carrier mounted on a horizontal rotating spindle and having a regular polygonal shape in a perpendicular cross section, and a plurality of endless elastic belts adapted to force a work of sintered magnet against the carrier surface to secure the work thereto and adapted to travel synchronously with and counter to the rotation of the carrier in a circulatory manner.
Hitoshi Inami, Takafumi Ueno, Kazuhito Akada, Masaki Kasashima
Filed: 26 Oct 21
Utility
Adhesive silicone composition and an adhesive film or tape
18 Jul 23
An adhesive silicone composition having (A) a linear or branched organopolysiloxane having at least two alkenyl groups in a molecule (B) an organopolysiloxane comprising R23SiO1/2 units and SiO4/2 units, wherein R2 is, independently of each other, a substituted or unsubstituted, monovalent hydrocarbon group having 1 to 10 carbon atoms, (C) an organohydrogenpolysiloxane having at least three hydrogen atoms each bonded to a silicon atom in a molecule and having no aryl group, and (E) an organohydrogenpolysiloxane having at least three hydrogen atoms each bonded to a silicon atom in a molecule and having an aryl group-containing organic group.
Ken Nakayama, Yasuyoshi Kuroda
Filed: 15 Jan 19
Utility
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process
18 Jul 23
Jun Hatakeyama, Masahiro Fukushima
Filed: 6 Apr 21
Utility
Aqueous solution composition containing organosilicon compounds
4 Jul 23
Munenao Hirokami, Tetsuro Yamada, Kazuhiro Tsuchida
Filed: 24 Jun 22
Utility
Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
4 Jul 23
Daisuke Kori, Keisuke Niida, Takashi Sawamura, Takeru Watanabe, Seiichiro Tachibana, Tsutomu Ogihara
Filed: 16 Apr 20
Utility
Optical isolator and Faraday rotator
4 Jul 23
A Faraday rotator and an optical isolator having a high transmittance and a high Verdet constant are provided.
Toshiaki Watanabe
Filed: 15 Nov 19
Utility
Resist composition and patterning process
4 Jul 23
Teppei Adachi, Shinya Yamashita, Masaki Ohashi, Tomohiro Kobayashi, Kenichi Oikawa, Takayuki Fujiwara
Filed: 11 Mar 21
Utility
Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device
4 Jul 23
A photosensitive resin composition comprising (A) a vinyl ether compound, (B) an epoxy-containing silicone resin, and (C) a photoacid generator is provided.
Hitoshi Maruyama, Kazunori Kondo
Filed: 9 May 19
Utility
Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and black matrix
4 Jul 23
A black photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) carbon black, and (C) a photoacid generator is coated onto a substrate to form a photosensitive resin coating which has improved reliability with respect to adhesion and crack resistance, resolution and flexibility while maintaining satisfactory light shielding properties.
Hitoshi Maruyama, Tamotsu Oowada
Filed: 3 Jul 19
Utility
Process for preparing a 3,7-dimethylalkane compound
27 Jun 23
Yuki Miyake, Takeru Watanabe, Takeshi Kinsho
Filed: 23 Nov 22