855 patents
Page 7 of 43
Utility
Resist composition and patterning process
25 Apr 23
A resist composition comprising a base polymer and an acid generator containing a sulfonium or iodonium salt of iodized benzamide group-containing fluorinated sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
Jun Hatakeyama, Takayuki Fujiwara, Tomomi Watanabe
Filed: 27 Oct 20
Utility
Positive resist composition and patterning process
25 Apr 23
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of fluorosulfonic acid having an iodized or brominated aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
Filed: 30 Jun 20
Utility
Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer
25 Apr 23
Daisuke Kori, Takashi Sawamura, Keisuke Niida, Seiichiro Tachibana, Takeru Watanabe, Tsutomu Ogihara
Filed: 6 Jul 20
Utility
Process for preparing 2-methyl-N-(2′-methylbutyl)butanamide
18 Apr 23
Takeshi Kinsho, Yusuke Nagae, Shogo Tsukaguchi, Yasuhiko Kutsuwada, Tatsuya Hojo, Takeru Watanabe
Filed: 24 May 22
Utility
Polymeric polymerization initiator and method for producing polymeric polymerization initiator
18 Apr 23
Ryunosuke Hata
Filed: 2 Aug 19
Utility
Solar cell with high photoelectric conversion efficiency and method for manufacturing solar cell with high photoelectric conversion efficiency
18 Apr 23
A back surface electrode type solar cell in which a p-type region having a p-conductive type, and an n-type region which has an n-conductive type and in which maximum concentration of additive impurities for providing the n-conductive type in a substrate width direction is equal to or higher than 5×1018 atoms/cm3 are disposed on a first main surface of a crystal silicon substrate, a first passivation film is disposed so as to cover the p-type region and the n-type region, and a second passivation film is disposed on a second main surface which is a surface opposite to the first main surface so as to cover the second main surface, the first passivation film and the second passivation film being formed with a compound containing oxide aluminum.
Hiroshi Hashigami, Takenori Watabe, Hiroyuki Ohtsuka, Ryo Mitta
Filed: 7 Nov 16
Utility
Substrate defect inspection method and substrate defect inspection apparatus
11 Apr 23
A substrate defect inspection method includes: irradiating a target substrate with an EUV beam from an EUV illumination source by using a first focusing optical system; guiding a scattered reflected beam, but no specularly-reflected beam, among beams reflected from the target substrate to a light receiving surface of a sensor by using a second focusing optical system; and determining that a defect is present at an irradiation spot of the target substrate with the EUV beam when an intensity of the received scattered reflected beam exceeds a predetermined threshold; the method further including, before the irradiation of the target substrate with the EUV beam: a reflectance acquisition step of acquiring a reflectance of the target substrate to the EUV beam; and a threshold computation step of setting the predetermined threshold based on the reflectance acquired in the reflectance acquisition step.
Tsuneo Terasawa, Yukio Inazuki, Hideo Kaneko
Filed: 19 Aug 21
Utility
Antireflective member and method of manufacture therefor
11 Apr 23
Provided is an antireflective member that has a water- and oil-repellent layer on a multi-layered antireflective layer and is capable of exhibiting excellent surface lubricity, water- and oil-repellent properties, and durability.
Yuji Yamane, Lisa Katayama, Ryusuke Sakoh, Takashi Matsuda
Filed: 8 Mar 18
Utility
Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode
28 Mar 23
Jun Hatakeyama, Motoaki Iwabuchi, Koji Hasegawa, Yasuyoshi Kuroda
Filed: 31 May 19
Utility
Polyvinyl chloride-based resin molded product and method for manufacturing the same
28 Mar 23
The present invention provides a polyvinyl chloride-based resin molded product obtained by molding a resin mixture containing 1 to 50 parts by weight of calcium carbonate having an average primary particle size of 0.01 to 0.3 μm and 5 to 18 parts by weight of an impact modifier per 100 parts by weight of a polyvinyl chloride-based resin, wherein a Charpy impact strength at 0° C. is 20 kJ/m2 or more, and a Vicat softening temperature is 85° C. or higher, and a method for manufacturing the polyvinyl chloride-based resin molded product.
Toshiki Kawabata
Filed: 27 Sep 18
Utility
Resist composition and patterning process
28 Mar 23
Hironori Satoh, Tsukasa Watanabe, Seiichiro Tachibana, Satoshi Watanabe, Tsutomu Ogihara
Filed: 13 Feb 19
Utility
Resist composition and patterning process
28 Mar 23
Ryosuke Taniguchi, Satoshi Watanabe, Takayuki Fujiwara, Naoya Inoue
Filed: 24 Feb 20
Utility
Method for controlling flatness, method for forming coating film, apparatus for controlling flatness, and apparatus for forming coating film
28 Mar 23
The present invention is a method for controlling flatness of a wafer including the steps of: providing a holding member having a holding surface including a plurality of segments, where each of the plurality of segments includes a dry adhesive fiber structure; making the holding surface of the holding member adhere to a wafer to make the holding member hold the wafer; obtaining information on flatness of the wafer by measuring flatness of the wafer to; and releasing adhesion of the dry adhesive fiber structures to the wafer in a part of the plurality of segments of the holding surface of the holding member based on the information on flatness.
Tsutomu Ogihara
Filed: 11 Mar 21
Utility
Firing furnace for firing electrode of solar cell element, method for manufacturing solar cell element, and solar cell element
28 Mar 23
Disclosed is a firing furnace for firing an electrode of a solar cell element, which is provided with: a transfer member, which transfers a substrate having a conductive paste applied thereto; a heating section, which heats the substrate and fires the conductive paste; and a cooling section, which cools the heated substrate.
Ryo Mitta, Takenori Watabe, Hiroyuki Otsuka
Filed: 22 Nov 17
Utility
Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode
21 Mar 23
Jun Hatakeyama, Motoaki Iwabuchi, Koji Hasegawa, Yasuyoshi Kuroda
Filed: 14 Jun 19
Utility
Thermally conductive sheet
21 Mar 23
A thermally conductive sheet in which a cured layer of a thermally conductive silicone composition is laminated on one or both sides of a synthetic resin film layer of aromatic polyimide, etc. having excellent heat resistance, electrical insulation, and mechanical strength, wherein good thermal conductivity, good insulation, and strong interlayer adhesion are provided because the thermally conductive silicone composition includes 250 to 600 wt. % of an aspherical thermally conductive filler material, which contains no more than 80 ml/100 g of a DOP oil absorption amount and an organic silicon compound component including an adhesion imparting agent, relative to 100 wt. % of the organic silicon compound component, and moreover the thermally conductive sheet with no brittleness during use can be made using continuous molding.
Akihiro Endo, Yasuhisa Ishihara, Hisaharu Yamaguchi, Masahiro Moteki
Filed: 16 Jan 18
Utility
Low-dielectric heat dissipation film composition and low-dielectric heat dissipation film
21 Mar 23
A low-dielectric heat dissipation film composition contains: (A) a maleimide resin composition containing (A1) a maleimide resin containing at least two or more maleimide groups per molecule and (A2) a polymerization initiator; and (B) boron nitride particles.
Hiroyuki Iguchi, Yoshinori Takamatsu, Yuki Kudo, Atsushi Tsuura, Yoshihiro Tsutsumi
Filed: 24 Mar 20
Utility
Resist composition and patterning process
21 Mar 23
Takeshi Sasami, Kenji Yamada, Jun Hatakeyama, Satoshi Watanabe
Filed: 30 Dec 19
Utility
Method for manufacturing granulated silica
14 Mar 23
A method for manufacturing granulated silica.
Masanobu Nishimine, Tomoya Ogata, Daichi Todoroki, Tsutomu Nakamura, Susumu Ueno
Filed: 19 Jun 20
Utility
Resist composition and patterning process
14 Mar 23
A resist composition comprising a base polymer and a sulfonium salt of a carboxylic acid having an iodine or bromine-substituted hydrocarbyl group offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.
Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
Filed: 11 May 20