262 patents
Page 11 of 14
Utility
Inspection system with grounded capacitive sample proximity sensor
16 Nov 20
A capacitive proximity measurement system may include a sensor electrode configured to be positioned proximate to a conductive measurement area on a test surface of a sample, a plate connector configured to provide an electrical connection between a system ground and a conductive plate parallel to the test surface, and a controller.
Yang Xie, Feilong Lin, Rushford A. Ogden
Filed: 1 May 19
Utility
Single cell scatterometry overlay targets
16 Nov 20
Scatterometry overlay (SCOL) single cell targets are provided, along with target design methods and measurement methods which employ the single cell SCOL targets for in-die metrology measurements, utilizing the small size of the target along with maintained optical performance due to the design of the target.
Eitan Hajaj
Filed: 23 Sep 18
Utility
Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology
9 Nov 20
Methods are provided for deriving a partially continuous dependency of metrology metric(s) on recipe parameter(s), analyzing the derived dependency, determining a metrology recipe according to the analysis, and conducting metrology measurement(s) according to the determined recipe.
Tal Marciano, Barak Bringoltz, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld, Zeng Zhao, Yoel Feler, Daniel Kandel, Nadav Carmel, Amnon Manassen, Nuriel Amir, Oded Kaminsky, Tal Yaziv, Ofer Zaharan, Moshe Cooper, Roee Sulimarski, Tom Leviant, Noga Sella, Boris Efraty, Lilach Saltoun, Amir Handelman, Eltsafon Ashwal, Ohad Bachar
Filed: 29 Jun 16
Utility
And noise based care areas
9 Nov 20
Methods and systems for setting up inspection of a specimen with design and noise based care areas are provided.
Brian Duffy, Martin Plihal, Santosh Bhattacharyya, Gordon Rouse, Chris Maher, Erfan Soltanmohammadi
Filed: 24 Mar 19
Utility
Estimation of asymmetric aberrations
2 Nov 20
Metrology targets, target design methods and menology measurement methods are provided, which estimate the effects of asymmetric aberrations, independently or in conjunction with metrology overlay estimations.
Yoel Feler, Vladimir Levinski
Filed: 29 Oct 18
Utility
Plasma source with lamp house correction
2 Nov 20
A plasma light source with lamp house correction is disclosed.
Shiyu Zhang, Ilya Bezel
Filed: 18 Oct 18
Utility
Diffraction based overlay scatterometry
2 Nov 20
A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack.
Yuval Lubashevsky, Yuri Paskover, Vladimir Levinski, Amnon Manassen
Filed: 4 Sep 18
Utility
Image-based overlay metrology and monitoring using through-focus imaging
26 Oct 20
A metrology system includes a controller coupled to a detector to image a sample based on the light captured by an objective lens, where an object plane of the detector with respect to the sample is adjustable.
David Gready, Nimrod Shuall, Claire Staniunas
Filed: 11 Jul 18
Utility
Using stochastic failure metrics in semiconductor manufacturing
26 Oct 20
A stochastic calculation engine receives inputs from a semiconductor inspection tool or semiconductor review tool.
Wing-Shan Ribi Leung, Kaushik Sah, Allen Park, Andrew Cross
Filed: 6 Jan 19
Utility
Multilayer targets for calibration and alignment of X-ray based measurement systems
26 Oct 20
Multilayer targets enabling fast and accurate, absolute calibration and alignment of X-ray based measurement systems are described herein.
Nikolay Artemiev, Antonio Gellineau, Alexander Bykanov, Alexander Kuznetsov
Filed: 24 Mar 19
Utility
Apparatus and method for measuring topography and gradient of the surfaces, shape, and thickness of patterned and unpatterned wafers
19 Oct 20
An interferometer system may include a stage assembly configured to receive and secure a sample, an illumination source configured to generate an illumination beam, a half-wave plate, one or more shearing prisms to shear the illumination beam into two beamlets along a shearing direction, a reference flat disposed proximate to the sample, a detector assembly, and a controller.
Chunsheng Huang
Filed: 18 Jul 19
Utility
Multi-mirror laser sustained plasma light source
19 Oct 20
A multi-mirror laser sustained plasma broadband light source is disclosed.
Qibiao Chen, Mark Shi Wang
Filed: 18 Jul 19
Utility
SAW device and method of manufacture
19 Oct 20
A method of reducing non-uniformity in the resonance frequencies of a surface acoustic wave (SAW) device, the SAW device comprising a silicon oxide layer comprising an oxide of silicon deposited over interdigital transducers on a piezoelectric substrate by reactive sputtering.
Rhonda Hyndman, Steve Burgess
Filed: 11 Sep 18
Utility
High power broadband illumination source
12 Oct 20
A system for generating broadband radiation is disclosed.
Oleg Khodykin, Ilya Bezel
Filed: 15 Jul 18
Utility
Semiconductor metrology based on hyperspectral imaging
12 Oct 20
Methods and systems for performing semiconductor measurements based on hyperspectral imaging are presented herein.
David Y. Wang, Alexander Buettner, Stilian Ivanov Pandev, Emanuel Saerchen, Andrei V. Shchegrov, Barry Blasenheim
Filed: 10 Jan 19
Utility
Algorithm selector based on image frames
12 Oct 20
Based on job dumps for defects of interest and nuisance events for multiple optical modes, detection algorithms, and attributes, the best combination of the aforementioned is identified.
Bjorn Brauer
Filed: 18 Apr 19
Utility
Metrology tool with combined X-ray and optical scatterometers
12 Oct 20
Methods and systems for performing simultaneous optical scattering and small angle x-ray scattering (SAXS) measurements over a desired inspection area of a specimen are presented.
Michael S. Bakeman, Andrei V. Shchegrov
Filed: 4 May 13
Utility
Photocathode designs and methods of generating an electron beam using a photocathode
12 Oct 20
A photocathode can include a body fabricated of a wide bandgap semiconductor material, a metal layer, and an alkali halide photocathode emitter.
Katerina Ioakeimidi, Gildardo R. Delgado, Michael E. Romero, Frances Hill, Rudy F. Garcia
Filed: 4 Dec 19
Utility
Methods and systems for co-located metrology
12 Oct 20
Methods and systems for performing co-located measurements of semiconductor structures with two or more measurement subsystems are presented herein.
David Y. Wang, Esen Salcin, Michael Friedmann, Derrick Shaughnessy, Andrei V. Shchegrov, Jonathan M. Madsen, Alexander Kuznetsov
Filed: 23 Jan 19
Utility
System and method for fabricating semiconductor wafer features having controlled dimensions
5 Oct 20
A system and method are provided for fabricating semiconductor wafer features with controlled dimensions.
Farhat A. Quli
Filed: 7 Nov 18