262 patents
Page 13 of 14
Utility
Arbitrary wavefront compensator for deep ultraviolet (DUV) optical imaging system
31 Aug 20
Disclosed is a system that includes a light source for generating an illumination beam and an illumination lens system for directing the illumination beam towards a sample.
Qiang Zhang, Abdurrahman Sezginer
Filed: 30 Aug 18
Utility
Methods and systems for inline parts average testing and latent reliability defect detection
31 Aug 20
Methods and systems for inline parts average testing and latent reliability defect recognition or detection are disclosed.
David W. Price, Robert J. Rathert, Robert Cappel, Kara L. Sherman, Douglas G. Sutherland
Filed: 4 Apr 17
Utility
Diffraction-based focus metrology
31 Aug 20
Diffraction-based focus target cells, targets and design and measurement methods are provided, which enable sensitive focus measurements to be carried out by overlay measurement tools.
Vladimir Levinski
Filed: 1 Jun 17
Utility
Expediting spectral measurement in semiconductor device fabrication
31 Aug 20
A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.
Vincent Immer, Tal Marciano, Etay Lavert
Filed: 22 Aug 17
Utility
Dual-column-parallel CCD sensor and inspection systems using a sensor
31 Aug 20
A dual-column-parallel image CCD sensor utilizes a dual-column-parallel readout circuit including two pairs of cross-connected transfer gates to alternately transfer pixel data (charges) from a pair of adjacent pixel columns to a shared output circuit at high speed with low noise.
Yung-Ho Alex Chuang, Jingjing Zhang, Sharon Zamek, John Fielden, Devis Contarato, David L. Brown
Filed: 28 Apr 19
Utility
Reticle optimization algorithms and optimal target design
24 Aug 20
Metrology target designs on the reticle and on the wafer, and target design and processing methods are provided.
Yoel Feler, Vladimir Levinski
Filed: 5 Jun 17
Utility
Method and system for process control with flexible sampling
24 Aug 20
The generation of flexible sparse metrology sample plans includes receiving a full set of metrology signals from one or more wafers from a metrology tool, determining a set of wafer properties based on the full set of metrology signals and calculating a wafer property metric associated with the set of wafer properties, calculating one or more independent characterization metrics based on the full set of metrology signals, and generating a flexible sparse sample plan based on the set of wafer properties, the wafer property metric, and the one or more independent characterization metrics.
Onur Demirer, Roie Volkovich, William Pierson, Mark Wagner, Dana Klein
Filed: 15 Jun 16
Utility
Hot spot and process window monitoring
24 Aug 20
Metrology overlay targets are provided, as well as method of monitoring process shortcomings.
Boris Golovanevsky
Filed: 3 Jun 19
Utility
Reflection-mode electron-beam inspection using ptychographic imaging
24 Aug 20
A particle-beam inspection system may include a reflective particle-beam imaging system providing an image of a selected portion of a sample and a diffraction pattern of the selected portion of the sample and a controller communicatively coupled to the reflective particle-beam imaging system.
Weijie Huang
Filed: 14 May 19
Utility
Photocathode including field emitter array on a silicon substrate with boron layer
17 Aug 20
A photocathode utilizes an field emitter array (FEA) integrally formed on a silicon substrate to enhance photoelectron emissions, and a thin boron layer disposed directly on the output surface of the FEA to prevent oxidation.
Yung-Ho Alex Chuang, John Fielden, Yinying Xiao-Li, Xuefeng Liu
Filed: 19 May 16
Utility
Liquid metal rotating anode X-ray source for semiconductor metrology
17 Aug 20
Methods and systems for realizing a high brightness, liquid based x-ray source suitable for high throughput x-ray metrology are presented herein.
Sergey Zalubovsky
Filed: 15 Oct 18
Utility
Deflection array apparatus for multi-electron beam system
17 Aug 20
An optical characterization system utilizing a micro-lens array (MLA) is provided.
Xinrong Jiang, Christopher Sears
Filed: 20 Dec 18
Utility
Electron beam generation and measurement
17 Aug 20
A flat top laser beam is used to generate an electron beam with a photocathode that can include an alkali halide.
Katerina Ioakeimidi, Gildardo R. Delgado, Frances Hill, Michael E. Romero, Rudy F. Garcia
Filed: 1 Oct 18
Utility
Simultaneous multi-directional laser wafer inspection
10 Aug 20
Disclosed is apparatus for inspecting a sample.
Guoheng Zhao, Sheng Liu, Ben-ming Benjamin Tsai
Filed: 5 Sep 17
Utility
Lens design for spectroscopic ellipsometer or reflectometer
10 Aug 20
A lens system includes a curved primary mirror and an aspheric secondary mirror.
Barry Blasenheim
Filed: 1 Oct 18
Utility
Minimizing filed size to reduce unwanted stray light
10 Aug 20
Stray and air scattered light can be reduced by configuring a size of the collection area of a sensor, which reduces a source of sensitivity-limiting noise in the system.
Donald Pettibone, Daniel Ivanov Kavaldjiev, Chuanyong Huang, Qing Li, Frank Li, Zhiwei Xu
Filed: 30 Nov 17
Utility
Method and apparatus for fabricating wafer by calculating process correction parameters
10 Aug 20
A method of calculating an overlay correction model in a unit for the fabrication of a wafer is disclosed.
Boris Habets
Filed: 15 Apr 19
Utility
Process control method for lithographically processed semiconductor devices
10 Aug 20
Photoresist layers are exposed to an exposure beam by using an exposure tool assembly, wherein the photoresist layers coat semiconductor substrates and wherein for each exposure a current exposure parameter set is used that includes at least a defocus value and an exposure dose.
Stefan Buhl, Boris Habets, Wan-Soo Kim
Filed: 13 Feb 18
Utility
Computer assisted weak pattern detection and quantification system
10 Aug 20
Methods and systems for providing weak pattern (or hotspot) detection and quantification are disclosed.
Naoshin Haque, Allen Park, Ajay Gupta
Filed: 25 Sep 16
Utility
Photocathode emitter system that generates multiple electron beams
10 Aug 20
The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets.
Gildardo R. Delgado, Katerina Ioakeimidi, Rudy Garcia, Zefram Marks, Gary V. Lopez Lopez, Frances A. Hill, Michael E. Romero
Filed: 20 Aug 18