262 patents
Page 9 of 14
Utility
Guided scanning electron microscopy metrology based on wafer topography
23 Mar 21
A wafer topography measurement system can be paired with a scanning electron microscope.
Arpit Yati, Shivam Agarwal, Jagdish Saraswatula, Andrew Cross
Filed: 16 Nov 17
Utility
X-ray metrology system with broadband laser produced plasma illuminator
23 Mar 21
Methods and systems for x-ray based semiconductor metrology utilizing a broadband, soft X-ray illumination source are described herein.
Oleg Khodykin, Alexander Bykanov
Filed: 10 Jan 18
Utility
System and method for cleaning optical surfaces of an extreme ultraviolet optical system
23 Mar 21
The present invention provides a local clean microenvironment near optical surfaces of an extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and configured for EUV lithography, metrology, or inspection.
Gildardo Delgado, Francis Chilese, Rudy F. Garcia, Mohammed Tahmassebpur, Salam Harb
Filed: 5 Apr 13
Utility
Optical profilometer with color outputs
16 Mar 21
A system includes a light source configured to selectively output light.
Scott A. Chalmers
Filed: 4 Jul 18
Utility
Super-resolution defect review image generation through generative adversarial networks
16 Mar 21
A system for analyzing a sample includes an inspection sub-system and at least one controller.
Anuj Pandey, Bradley Ries, Himanshu Vajaria, Yong Zhang, Rahul Lakhawat
Filed: 5 Nov 18
Utility
Measurement of overlay error using device inspection system
9 Mar 21
A method and system for measuring overlay in a semiconductor manufacturing process comprise capturing an image of a feature in an article at a predetermined manufacturing stage, deriving a quantity of an image parameter from the image and converting the quantity into an overlay measurement.
Choon Hoong Hoo, Fangren Ji, Amnon Manassen, Liran Yerushalmi, Antonio Mani, Allen Park, Stilian Pandev, Andrei Shchegrov, Jon Madsen
Filed: 24 Jun 18
Utility
Apparatus, method and computer program product for defect detection in work pieces
2 Mar 21
An apparatus, a method and a computer program product for defect detection in work pieces is disclosed.
Tom Marivoet, Carl Truyens, Christophe Wouters
Filed: 17 Jun 19
Utility
Differential methods and apparatus for metrology of semiconductor targets
2 Mar 21
Disclosed are apparatus and methods for determining process or structure parameters for semiconductor structures.
Stilian Ivanov Pandev, Andrei V. Shchegrov
Filed: 6 Aug 14
Utility
Method of measuring misregistration of semiconductor devices
23 Feb 21
A method of measuring misregistration in the manufacture of semiconductor devices including providing a multilayered semiconductor device, using a scatterometry metrology tool to perform misregistration measurements at multiple sites on the multilayered semiconductor device, receiving raw misregistration data for each of the misregistration measurements, thereafter providing filtered misregistration data by removing outlying raw misregistration data points from the raw misregistration data for each of the misregistration measurements, using the filtered misregistration data to model misregistration for the multilayered semiconductor device, calculating correctables from the modeled misregistration for the multilayered semiconductor device, providing the correctables to the scatterometry metrology tool, thereafter recalibrating the scatterometry metrology tool based on the correctables and measuring misregistration using the scatterometry metrology tool following the recalibration.
Roie Volkovich, Ido Dolev
Filed: 12 Apr 19
Utility
Die screening using inline defect information
23 Feb 21
Embodiments herein include methods, systems, and apparatuses for die screening using inline defect information.
Alex Teng Song Lim, Ganesh Meenakshisundaram
Filed: 12 Jun 19
Utility
Three-dimensional calibration structures and methods for measuring buried defects on a three-dimensional semiconductor wafer
23 Feb 21
A three-dimensional calibration structure for measuring buried defects on a semiconductor device is disclosed.
Philip Measor, Robert M. Danen
Filed: 4 Dec 17
Utility
Correlating SEM and optical images for wafer noise nuisance identification
16 Feb 21
Disclosed are apparatus and methods for inspecting a sample.
Qiang Zhang, Grace H. Chen
Filed: 28 May 20
Utility
System, method and apparatus for polarization control
16 Feb 21
A polarization control device includes a first wave plate having a first surface profile and a second wave plate having a second surface profile complementary to the first surface profile.
Ivan Maleev, Donald Pettibone
Filed: 11 Jun 18
Utility
Multi-pass imaging using image sensors with variably biased channel-stop contacts for identifying defects in a semiconductor die
16 Feb 21
First and second images of a semiconductor die or portion thereof are generated.
Tzi-Cheng Lai, Jehn-Huar Chem, Stephen Biellak
Filed: 15 Mar 19
Utility
Laser marking focus feedback system having an intensity indication of reflected radiation passed through an objective lens, a beam splitter and a pinhole
9 Feb 21
A method of focusing includes irradiating an object by directing radiation output by a radiating source through an objective lens, measuring a first intensity of reflected radiation that is reflected from the object, adjusting a distance between the objective lens and the object, measuring a second intensity of reflected radiation, and analyzing the first intensity of reflected radiation and the second intensity of reflected radiation to determine a focal distance between the objective lens and the object.
Timothy Russin, Shiyu Zhang, Charles Amsden, Daniel Kapp
Filed: 9 Aug 18
Utility
Microneedles
26 Jan 21
A method is for manufacturing a plurality of silicon microneedles which have a bevelled tip.
Kerry Roberts, Huma Ashraf, Pey Fen Eng
Filed: 15 Jun 18
Utility
Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
26 Jan 21
An apparatus for vapor deposition of thin film coatings, including: a process controller; a plurality of precursor containers into which a plurality of coating precursors, each in the form of a liquid or a solid, are respectively placed; a plurality of precursor vapor reservoirs, each in communication with a respective one of said precursor containers; a plurality of in-line devices which control a vapor flow of a coating precursor vapor from one of said precursor containers into one of said precursor vapor reservoirs with which said precursor container is in communication upon receipt of a signal from said process controller; a plurality of precursor control valves which control vapor flow from said precursor vapor reservoir upon receipt of a signal from said process controller; and a process chamber for vapor deposition of said coating on a substrate when present in said process chamber.
Boris Kobrin, Romuald Nowak, Richard C. Yi, Jeffrey D. Chinn
Filed: 8 Aug 17
Utility
Method and apparatus for depositing a material
26 Jan 21
A method is for depositing a dielectric material on to a substrate in a chamber by pulsed DC magnetron sputtering with a pulsed DC magnetron device which produces one or more primary magnetic fields.
Stephen R Burgess, Rhonda Hyndman, Amit Rastogi, Eduardo Paulo Lima, Clive L Widdicks, Paul Rich, Scott Haymore, Daniel Cook
Filed: 30 Mar 16
Utility
Determining the impacts of stochastic behavior on overlay metrology data
26 Jan 21
Methods are provided for designing metrology targets and estimating the uncertainty error of metrology metric values with respect to stochastic noise such as line properties (e.g., line edge roughness, LER).
Evgeni Gurevich, Michael E. Adel, Roel Gronheid, Yoel Feler, Vladimir Levinski, Dana Klein, Sharon Aharon
Filed: 27 Feb 18
Utility
In-situ temperature sensing substrate, system, and method
26 Jan 21
A sensor for detecting a temperature distribution imparted on a substrate in an environment is disclosed.
Earl Jensen
Filed: 17 Jul 18