7578 patents
Page 8 of 379
Utility
Stackable Plasma Source for Plasma Processing
21 Dec 23
A system, method, and apparatus for processing substrates.
Vladimir Nagorny, Rene George
Filed: 16 Jun 22
Utility
Reaction Cell for Species Sensing
21 Dec 23
Embodiments disclosed herein include semiconductor processing tools.
Abdullah Zafar, Kelvin Chan, Philip Allan Kraus
Filed: 15 Jun 22
Utility
Dopant Diffusion with Short High Temperature Anneal Pulses
21 Dec 23
A method and apparatus for diffusing a dopant within a semiconductor device is described.
Wolfgang R. ADERHOLD
Filed: 16 Jun 22
Utility
Electronic Device Manufacturing System
21 Dec 23
An electronic device manufacturing system includes a mainframe including a transfer chamber and facets defining side walls of the transfer chamber.
Michael Robert Rice, Jeffrey C. Hudgens
Filed: 6 Feb 23
Utility
Diagnostic Disc with a High Vacuum and Temperature Tolerant Power Source
21 Dec 23
A method includes causing, by a computing system comprising at least one processing device, a diagnostic disc placed within a processing chamber to generate sensor data of at least one component of the processing chamber using a set of non-contact sensors of the diagnostic disc, receiving, by the computing system, the sensor data from the diagnostic disc via a wireless connection established between the computing system and the diagnostic disc, determining, by the computing system based on the sensor data, whether at least one of alignment concentricity is skewed with respect to the at least one component, and in response to determining that at least one of alignment or concentricity is skewed with respect to the at least one component, initiating, by the computing system, correction of at least one of alignment or concentricity of the at least one component.
Phillip A. Criminale, Zhiqiang Guo, Andrew Myles, Martin Perez-Guzman, Nelson Joseph Gaspard, Timothy Joseph Franklin, Michael A. Stearns
Filed: 6 Sep 23
Utility
One-body shadow frame support with flow controller
19 Dec 23
Embodiments of the present disclosure relate to a shadow frame support with one or more flow controllers and a method of controlling the flow of gases through the shadow frame support.
Jong Yun Kim, William Nehrer, Jungwon Park
Filed: 1 Oct 21
Utility
Lid stack for high frequency processing
19 Dec 23
Exemplary semiconductor processing chambers may include a substrate support positioned within a processing region of the semiconductor processing chamber.
Shuran Sheng, Lin Zhang, Joseph C. Werner
Filed: 2 Nov 22
Utility
Methods and apparatus for extended chamber for through silicon via deposition
19 Dec 23
An apparatus leverages a physical vapor deposition (PVD) process chamber with a wafer-to-target distance of approximately 400 millimeters to deposit tantalum film on through silicon via (TSV) structures.
David Gunther, Jiao Song, Kirankumar Neelasandra Savandaiah, Irena H. Wysok, Anthony Chih-Tung Chan
Filed: 31 Jul 20
Utility
Thin-film electro-optical waveguide modulator device
19 Dec 23
An electro-optical waveguide modulator device includes a seed layer on a substrate, the seed layer having a first crystallographic plane aligned with a surface of the seed layer, an electro-optical channel extending in a first direction on the seed layer and having a second crystallographic plane aligned with the surface of the seed layer, an insulator layer on both sides of the electro-optical channel on the substrate in a second direction perpendicular to the first direction, an electrode barrier layer on the electro-optical channel and the insulator layer, and one or more of electrodes extending in the second direction.
Russell Chin Yee Teo, Ludovic Godet, Nir Yahav, Robert Jan Visser
Filed: 3 May 21
Utility
Reflective display devices and components
19 Dec 23
Exemplary reflective display components are described.
Robert Anthony Nordsell, Arvinder M. Chadha
Filed: 23 May 22
Utility
Controlling positive feedback in filamentary
19 Dec 23
A resistive random-access memory (ReRAM) device may include a thermally engineered layer that is positioned adjacent to an active layer and configured to act as a heat sink during filament formation in response to applied voltages.
Milan Pesic, Luca Larcher, Bastien Beltrando
Filed: 2 May 22
Utility
Semiconductor chamber component cleaning systems
19 Dec 23
Exemplary semiconductor chamber component cleaning systems may include a receptacle.
Katty Guyomard, Chidambara A. Ramalingam, Shawyon Jafari, Palash Joshi, Moin Ahmed Khan, Kirubanandan Naina Shanmugam, Subhaschandra Shreepad Salkod, Avishek Ghosh, David W. Groechel, Li Wu, Dorothea Buechel-Rimmel
Filed: 22 Oct 20
Utility
RFID part authentication and tracking of processing components
19 Dec 23
Embodiments provided herein provide for methods and apparatus for detecting, authenticating, and tracking processing components, including consumable components or non-consumable components used on substrate processing systems for electronic device manufacturing, such as semiconductor chip manufacturing.
Earl Hunter, Russell Duke, Amitabh Puri, Steven M. Reedy
Filed: 19 Feb 21
Utility
Optical absorption sensor for semiconductor processing
19 Dec 23
Semiconductor processing systems and methods are disclosed.
Fang Ruan, Diwakar Kedlaya
Filed: 30 Oct 20
Utility
Horizontal gate-all-around device nanowire air gap spacer formation
19 Dec 23
Embodiments provide methods for forming nanowire structures, such as, for example, horizontal gate-all-around (hGAA) structures.
Shiyu Sun, Nam Sung Kim, Bingxi Sun Wood, Naomi Yoshida, Sheng-Chin Kung, Miao Jin
Filed: 16 Feb 22
Utility
Plasma processing using pulsed-voltage and radio-frequency power
19 Dec 23
Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber.
Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo, Kartik Ramaswamy, Valentin N. Todorow, Olivier Luere
Filed: 7 May 21
Utility
Growth monitor system and methods for film deposition
19 Dec 23
The present disclosure generally relates to process chambers for semiconductor processing.
Zhepeng Cong, Mostafa Baghbanzadeh, Tao Sheng, Enle Choo
Filed: 30 Nov 21
Utility
Thermal processing susceptor
19 Dec 23
In one embodiment, a susceptor for thermal processing is provided.
Anhthu Ngo, Zuoming Zhu, Balasubramanian Ramachandran, Paul Brillhart, Edric Tong, Anzhong Chang, Kin Pong Lo, Kartik Shah, Schubert S. Chu, Zhepeng Cong, James Francis Mack, Nyi O. Myo, Kevin Joseph Bautista, Xuebin Li, Yi-Chiau Huang, Zhiyuan Ye
Filed: 23 Feb 21
Utility
System using film thickness estimation from machine learning based processing of substrate images
19 Dec 23
A neural network is trained for use in a substrate thickness measurement system by obtaining ground truth thickness measurements of a top layer of a calibration substrate at a plurality of locations, each location at a defined position for a die being fabricated on the substrate.
Sivakumar Dhandapani, Arash Alahgholipouromrani, Dominic J. Benvegnu, Jun Qian, Kiran Lall Shrestha
Filed: 25 Jun 21
Utility
Selective blocking of metal surfaces using bifunctional self-assembled monolayers
19 Dec 23
Methods for selectively depositing on metallic surfaces are disclosed.
Michael L. McSwiney, Bhaskar Jyoti Bhuyan, Mark Saly, Drew Phillips, Aaron Dangerfield, David Thompson, Kevin Kashefi, Xiangjin Xie
Filed: 21 Oct 22