7578 patents
Page 12 of 379
Utility
Adjustable attenuation optical unit
5 Dec 23
An adjustable attenuation optical unit that may include a lightguide that includes a core, wherein the core comprises an output, an input and an exterior surface; and an adjustable attenuator that is configured to define an interfacing parameter related to an area of the exterior surface thereby receiving at least some of the light that impinges on the area.
Eitam Yitzchak Vinegrad, Itay Asulin
Filed: 17 Aug 21
Utility
Pressure regulated flow controller
5 Dec 23
A manufacturing system includes a processing chamber, an gas supply, and a mass flow control apparatus coupled to the gas supply and the processing chamber.
Ming Xu, Kenneth Le, Ashley M. Okada
Filed: 12 Feb 21
Utility
Reducing substrate surface scratching using machine learning
5 Dec 23
Process recipe data associated a process to be performed for a substrate at a process chamber is provided as input to a trained machine learning model.
Kartik B Shah, Satish Radhakrishnan, Karthik Ramanathan, Karthikeyan Balaraman, Adolph Miller Allen, Xinyuan Chong, Mitrabhanu Sahu, Wenjing Xu, Michael Sterling Jackson, Weize Hu, Feng Chen
Filed: 19 Dec 22
Utility
Segmented showerhead for uniform delivery of multiple precursors
5 Dec 23
Apparatus for supplying vaporized reactants to a reaction chamber are described herein.
Alexander Lerner, Prashanth Kothnur, Roey Shaviv, Satish Radhakrishnan
Filed: 13 Sep 19
Utility
Symmetric flow valve for flow conductance control
5 Dec 23
Embodiments of symmetric flow valves for use in a substrate processing chamber are provided herein.
Andrew Nguyen, Yogananda Sarode Vishwanath, Xue Chang, Anilkumar Rayaroth, Chetan Naik, Balachandra Jatak Narayan
Filed: 1 Dec 21
Utility
Film thickness estimation from machine learning based processing of substrate images
5 Dec 23
A neural network is trained for use in a substrate thickness measurement system by obtaining ground truth thickness measurements of a top layer of a calibration substrate at a plurality of locations, each location at a defined position for a die being fabricated on the substrate.
Sivakumar Dhandapani, Arash Alahgholipouromrani, Dominic J. Benvegnu, Jun Qian, Kiran Lall Shrestha
Filed: 25 Jun 21
Utility
Oled Anode Structures Including Amorphous Transparent Conducting Oxides and Oled Processing Method Comprising the Same
30 Nov 23
Exemplary methods of OLED device processing are described.
Chung-Chia Chen, Yu-Hsin Lin, Jungmin Lee, Takuji Kato, Dieter Haas, Si Kyoung Kim, Ji Young Choung
Filed: 11 Nov 22
Utility
Spin-orbit Torque Mram Structure and Manufacture Thereof
30 Nov 23
Embodiments of the present disclosure generally include spin-orbit torque magnetoresistive random-access memory (SOT-MRAM) devices and methods of manufacture thereof.
Minrui YU, Wenhui WANG, Jaesoo AHN, Jong Mun KIM, Sahil PATEL, Lin XUE, Chando PARK, Mahendra PAKALA, Chentsau Chris YING, Huixiong DAI, Christopher S. NGAI
Filed: 8 Aug 23
Utility
Systems and Methods for Optimizing Full Horizontal Scanned Beam Distance
30 Nov 23
Provided herein are approaches for optimizing a full horizontal scanned beam distance of an accelerator beam.
Tyler Wills, George M. Gammel, Eric Donald Wilson, Jay T. Scheuer, Xiangdong He, Shardul Patel, Robert C. Lindberg
Filed: 27 May 22
Utility
Low Temperature Silicon Oxide Gap Fill
30 Nov 23
Embodiments of the disclosure relate to methods for forming silicon based gapfill within substrate features.
Soham Asrani, Bhargav S. Citla, Srinivas D. Nemani, Ellie Y. Yieh
Filed: 27 May 22
Utility
Process Kits and Related Methods for Processing Chambers to Facilitate Deposition Process Adjustability
30 Nov 23
The present disclosure relates to flow guides, process kits, and related methods for processing chambers to facilitate deposition process adjustability.
Zhepeng CONG, Ala MORADIAN, Tao SHENG, Nimrod SMITH, Ashur J. ATANOS, Vinh N. TRAN
Filed: 22 Jul 22
Utility
Ga Implant Process Control for Enhanced Particle Performance
30 Nov 23
A method of reducing gallium particle formation in an ion implanter.
Frank Sinclair, Bon-Woong Koo, Tseh-Jen Hsieh, Gregory E. Stratoti
Filed: 19 Apr 23
Utility
RepublicationDeposition of Semiconductor Integration Films
30 Nov 23
Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes.
Lakmal Charidu Kalutarage, Mark Joseph Saly, Bhaskar Jyoti Bhuyan, Thomas Joseph Knisley, Kelvin Chan, Regina Germanie Freed, David Michael Thompson, Susmit Singha Roy, Madhur Sachan
Filed: 16 Dec 22
Utility
Highly Conformal Metal Etch In High Aspect Ratio Semiconductor Features
30 Nov 23
Exemplary semiconductor processing methods may include providing an oxygen-containing precursor to a semiconductor processing chamber, where a substrate may be positioned.
Xiaolin C. Chen, Baiwei Wang, Rohan Puligoru Reddy, Wanxing Xu, Zhenjiang Cui, Anchuan Wang
Filed: 27 May 22
Utility
Process Kits and Related Methods for Processing Chambers to Facilitate Deposition Process Adjustability
30 Nov 23
The present disclosure relates to flow guides, process kits, and related methods for processing chambers to facilitate deposition process adjustability.
Zhepeng CONG, Ala MORADIAN, Tao SHENG, Nimrod SMITH, Ashur J. ATANOS, Vinh N. TRAN
Filed: 22 Jul 22
Utility
Selective Metal Removal with Flowable Polymer
30 Nov 23
Embodiments of the disclosure relate to methods for selectively removing metal material from the top surface and sidewalls of a feature.
Liqi Wu, Feng Q. Liu, Bhaskar Jyoti Bhuyan, James Hugh Connolly, Zhimin Qi, Jie Zhang, Wei Dou, Aixi Zhang, Mark Saly, Jiang Lu, Rongjun Wang, David Thompson, Xianmin Tang
Filed: 25 May 22
Utility
Situ Clean for Bevel and Edge Ring
30 Nov 23
Embodiments disclosed herein include a method for cleaning a bevel area of a substrate support disposed within a plasma processing chamber.
Kaushik ALAYAVALLI, Andrew NGUYEN, Edward HAYWOOD, Lu LIU, Malav KAPADIA
Filed: 31 May 22
Utility
MOLYBDENUM(0) Precursors for Deposition of Molybdenum Films
30 Nov 23
Molybdenum(0) and coordination complexes are described.
Chandan Kr Barik, John Sudijono, Chandan Das, Doreen Wei Ying Yong, Mark Saly, Bhaskar Jyoti Bhuyan, Feng Q. Liu
Filed: 10 Aug 23
Utility
Methods and Apparatus for Minimizing Substrate Backside Damage
30 Nov 23
Embodiments of the present disclosure generally relate to apparatus and methods for reducing substrate backside damage during semiconductor device processing.
Liangfa HU, Abdul Aziz KHAJA, Sarah Michelle BOBEK, Prashant Kumar KULSHRESHTHA, Yoichi SUZUKI
Filed: 14 Aug 23
Utility
Operation of Clamping Retainer for Chemical Mechanical Polishing
30 Nov 23
A method of polishing includes bringing a substrate into contact with a polishing pad and generating relative motion between the substrate and the polishing pad, retaining the substrate on the polishing pad with a retainer, and during polishing of the substrate alternating between reducing a diameter of an inner surface of the retainer to clamp the substrate and increasing the diameter of the inner surface of the retainer to release the substrate from clamping while continuing to retain the substrate.
Steven M. Zuniga, Jeonghoon Oh, Andrew J. Nagengast
Filed: 18 Oct 22