7578 patents
Page 49 of 379
Utility
Film Structure for Electric Field Guided Photoresist Patterning Process
20 Jul 23
Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided.
Huixiong DAI, Mangesh Ashok BANGAR, Srinivas D. NEMANI, Ellie Y. YIEH, Steven Hiloong WELCH, Christopher S. NGAI
Filed: 23 Mar 23
Utility
Low Oxygen Scanning Uv Source with Localized Purge
20 Jul 23
A method and apparatus for curing a substrate are described.
Michael David-Scott KEMP, Daihua ZHANG, Ludovic GODET, Mahendran CHIDAMBARAM, Sumedh Dattatraya ACHARYA
Filed: 21 Dec 22
Utility
wvmd8zro52npsv8g0lpggmb07u1sda6bdlq57f8tn3t42
20 Jul 23
A method of depositing nitride films is disclosed.
Hanhong Chen, Philip A. Kraus, Joseph AuBuchon
Filed: 23 Mar 23
Utility
8eal72930naf645enwvuo9fii357jvdooo8zhlens0sz agjb39z
20 Jul 23
There is provided a system and a method comprising obtaining data Dcontour informative of a contour of an element of a semiconductor specimen acquired by an examination tool, using the data Dcontour to generate a signal informative of a curvature of the contour of the element, determining at least one of data Dperiodicity informative of a periodicity of the signal, or data Ddiscontinuities informative of a number of discontinuities in the signal, wherein each discontinuity is informative of a transition between a convex portion of the contour and a concave portion of the contour, and using at least one of the data Dperiodicity or the data Ddiscontinuities to determine data informative of correct manufacturing of the element.
Einat FRISHMAN, Ilan BEN-HARUSH, Rafael BISTRITZER
Filed: 20 Jan 22
Utility
wpxlz6cqyld8n8a596ejdri9b1gozf8 i3h6ycr3n5
20 Jul 23
A system and method of performing deep cell body segmentation on a biological sample is provided.
Sumit Kumar Jha, Dan Xie, Arina Nikitina, Debjit Ray, Yun-Ching Chang, Suraj Rengarajan
Filed: 13 Jan 23
Utility
36b1w1vy4pm0s8h3hi sdsgxa525t65c8f9uk
20 Jul 23
There is provided a method and a system configured obtain an image of a semiconductor specimen including one or more arrays, each including repetitive structural elements, and one or more regions, each region at least partially surrounding a corresponding array and including features different from the repetitive structural elements, wherein the PMC is configured to, during run-time scanning of the semiconductor specimen, perform a correlation analysis between pixel intensity of the image and pixel intensity of a reference image informative of at least one of the repetitive structural elements, to obtain a correlation matrix, use the correlation matrix to distinguish between one or more first areas of the image corresponding to the one or more arrays and one or more second areas of the image corresponding the one or more regions, and output data informative of the one or more first areas of the image.
Yehuda COHEN, Rafael BISTRITZER
Filed: 23 Mar 23
Utility
orf8dwwwh8bj4g24gy0b771p214zqn6new95hfkaethcvn968rv
20 Jul 23
Methods and apparatus for processing a substrate are provided herein.
Yida LIN, Rui LI, Martin Lee RIKER, Haitao WANG, Noufal Kappachali, Xiangjin XIE
Filed: 5 Jan 22
Utility
knfan1sk92168rdyhrgqzy1anb5tdt66ax9r9ebcqzyvnnoj
20 Jul 23
Methods for adjusting a work function of a structure in a substrate leverage near surface doping.
Taichou Papo CHEN
Filed: 4 May 22
Utility
l5ryuouqumcy5c4hpqrr36sarmp8oeg3fhth6chuuonlhwdyjso48a0e9
20 Jul 23
Methods for forming a trench structure with passivated surfaces.
Taichou Papo CHEN
Filed: 4 May 22
Utility
kvhw1q4xn16rqe4nqogp 655dbdrytpso2
20 Jul 23
A batch processing chamber and a process kit for use therein are provided.
Adel George TANNOUS, Schubert S. CHU, Shu-Kwan LAU, Kartik Bhupendra SHAH, Zuoming ZHU, Ala MORADIAN, Surajit KUMAR, Srinivasa RANGAPPA, Chia Cheng CHIN, Vishwas Kumar PANDEY
Filed: 12 Jul 21
Utility
71zo1i2jbj7n66pmrpcd2cs7 71k31b0eb4wg95jhft1wkjw
20 Jul 23
Methods for forming a deep trench isolation (DTI) structure with only two interfaces.
Taichou Papo CHEN
Filed: 4 May 22
Utility
yoj08sxir 6lfr9xvzlqu09l0qyizk3e8
20 Jul 23
An imaging system and a method of creating composite images are provided.
Jinxin FU, Yongan XU, Ludovic GODET, Naamah ARGAMAN, Robert Jan VISSER
Filed: 17 Mar 23
Design
3cfiz5j8fp1k284xh ok4
18 Jul 23
Michael R. Rice, Michael C. Kuchar, Travis Morey, Adam J. Wyatt, Ofer Amir
Filed: 8 Nov 22
Utility
065t00k0w 9qb22xotn7k
18 Jul 23
A chemical mechanical polishing apparatus includes a platen to support a polishing pad, the platen having a recess, a flexible membrane in the recess, and an in-situ vibration monitoring system to generate a signal.
Boguslaw A. Swedek, Dominic J. Benvegnu, Chih Chung Chou, Nicholas Wiswell, Thomas H. Osterheld, Jeonghoon Oh
Filed: 13 Mar 19
Utility
3bjvfe5bdotofekits0khvw08u4ek3606twagp247kqqtbnbzy
18 Jul 23
A method for forming a film of an oxide of In, Ga, and Zn, having a spinel crystalline phase comprises providing a substrate in a chamber; providing a sputtering target in said chamber, the target comprising an oxide of In, Ga, and Zn, wherein: In, Ga, and Zn represent together at least 95 at % of the elements other than oxygen, In represents from 0.6 to 44 at % of In, Ga, and Zn, Ga represents from 22 to 66 at % of In, Ga, and Zn, and Zn represents from 20 to 46 at % of In, Ga, and Zn; and forming a film on the substrate, the substrate being at a temperature of from 125° C. to 250° C., by sputtering the target with a sputtering gas comprising O2, the sputtering being performed at a sputtering power of at least 200 W.
Hendrik F. W. Dekkers, Jose Ignacio del Agua Borniquel
Filed: 25 Nov 20
Utility
5vzppovkjypnhrkxfpowrq it2t3w57jll24u
18 Jul 23
Methods of selectively depositing blocking layers on conductive surfaces over dielectric surfaces are described.
Lakmal C. Kalutarage, Bhaskar Jyoti Bhuyan, Aaron Dangerfield, Feng Q. Liu, Mark Saly, Michael Haverty, Muthukumar Kaliappan
Filed: 7 May 21
Utility
dczlfetus064k0glqmb5uvirxyuyl5qr6z8jtu360nfns38
18 Jul 23
Methods of semiconductor processing may include performing a first plasma treatment within a processing chamber to remove a first carbon-containing material.
Yi Zhou, Xinyue Chen, Mukul Khosla, Yangchung Lee
Filed: 17 May 21
Utility
28qqs13gxi7uvg554vsqu6355tcfbk10
18 Jul 23
Methods for forming a nucleation layer on a substrate.
Kelvin Chan, Yihong Chen
Filed: 15 Nov 21
Utility
pq38uiny66qw1hsq6g3guujphg7i10nfemwc045owr7z opjnh3a8br16ey
18 Jul 23
Methods of forming a metal oxyfluoride films are provided.
Nitin Deepak, Gayatri Natu, Albert Barrett Hicks, III, Prerna Sonthalia Goradia, Jennifer Y. Sun
Filed: 16 Feb 22
Utility
q7y6wz63vwoj0ncyr1kizsl4uw4762zxpa9jywe94
18 Jul 23
A non-conformal, highly selective liner for etch methods in semiconductor devices is described.
Bo Qi, Huiyuan Wang, Yingli Rao, Abhijit Basu Mallick
Filed: 10 Aug 20