7578 patents
Page 52 of 379
Utility
Forming mesas on an electrostatic chuck
11 Jul 23
A body of an electrostatic chuck comprises mesas disposed on a polished surface of the body.
Wendell Glenn Boyd, Jr., Stanley Wu, Matthew Boyd
Filed: 23 Feb 21
Utility
Systems and methods for analyzing defects in CVD films
11 Jul 23
Embodiments of the present technology may include semiconductor processing methods that include depositing a film of semiconductor material on a substrate in a substrate processing chamber.
Mandar B. Pandit, Man-Ping Cai, Wenhui Li, Michael Wenyoung Tsiang, Praket Prakash Jha, Jingmin Leng
Filed: 14 Oct 20
Utility
v1gra67r4ds81yte5omlstgdnpm5hjyo0
11 Jul 23
Embodiments of the present disclosure generally relate to nitrogen-rich silicon nitride and methods for depositing the same, and transistors and other devices containing the same.
Rodney S. Lim, Jung Bae Kim, Jiarui Wang, Yi Cui, Dong Kil Yim, Soo Young Choi
Filed: 3 Jun 21
Utility
scwh8vpdtvx dsc7rkqj8jw35w2nmiwhzyzbsipo
11 Jul 23
Methods and apparatus for a cooling plate for solid state power amplifiers are provided herein.
Ribhu Gautam, Ananthkrishna Jupudi, Vinodh Ramachandran
Filed: 2 Jul 19
Utility
gz8iseotjn5xt0nfs79u0ieud3zgw6t tkonj2q7gk65ftgyujx
11 Jul 23
Processing methods may be performed to form a fan-out interconnect structure.
Richard W. Plavidal, Albert Lan
Filed: 22 Oct 18
Utility
8wiy1xz4jzas mkx5i1o4cvyvuq0q4s8rpj45m
11 Jul 23
Examples of the present technology include processing methods to incorporate stress in a channel region of a semiconductor transistor.
Ashish Pal, Mehdi Saremi, El Mehdi Bazizi, Benjamin Colombeau
Filed: 24 Aug 20
Utility
3wctx9dmyge9i5hi5swtokfolmiw2qn7unjzenbp72r
11 Jul 23
Disclosed are DRAM devices and methods of forming DRAM devices.
Sony Varghese
Filed: 17 Sep 21
Utility
1504wfrmy05vhe1rf59xb7gb4yohmtdp52lpuiz53glqn897osbx
6 Jul 23
A system, method, and apparatus for processing substrates.
Vladimir Nagorny, Rene George, Wei Liu
Filed: 30 Dec 21
Utility
iwun24ans5nt72utbnue2 tvz525yarijcfx6f0x06yf6imy
6 Jul 23
Methods, systems, and apparatus for cleaning and drying a tape-frame substrate are provided.
Ying WANG, Guan Huei SEE, Gregory J. WILSON
Filed: 6 Jan 22
Utility
kss5y5ptgccmw3r09scikwhee wrrkkb5zlvp6absqxchelslet
6 Jul 23
A method of forming features over a semiconductor substrate is provided.
Lei LIAO, Yung-chen LIN, Chi-I LANG, Ho-yung David HWANG
Filed: 14 Nov 22
Utility
6hj1hdkw7lp9qazx5q0ek5x 1rtr
6 Jul 23
Embodiments disclosed herein include methods of developing a metal oxo photoresist.
Lakmal Charidu Kalutarage, Mark Joseph Saly, Bhaskar Jyoti Bhuyan, Madhur Sachan, Regina Freed
Filed: 2 Mar 23
Utility
qb6fu9ubd zjib9akmdkdzhv
6 Jul 23
Methods and systems for the production and delivery of lithium metal of high purity are provided herein.
Jean DELMAS, Bernard FREY
Filed: 10 Mar 23
Utility
hl72it3ekpv9n hrg4c1l
6 Jul 23
Embodiments disclosed herein generally relate to a system and, more specifically, a substrate processing system.
Nagabhushana NANJUNDAPPA, Kirankumar Neelasandra SAVANDAIAH, Srinivasa Rao YEDLA, Thomas BREZOCZKY, Bhaskar PRASAD
Filed: 14 Apr 21
Utility
9tz7gi7uuxhzcwfmdavbl
6 Jul 23
Embodiments of the present disclosure generally relate to processing an optical workpiece containing grating structures on a substrate by deposition processes, such as atomic layer deposition (ALD).
Jinrui GUO, Ludovic GODET, Rutger MEYER TIMMERMAN THIJSSEN
Filed: 9 Mar 23
Utility
z4p10qjv8w8tymoozou67htisgi7gnne3h
6 Jul 23
Embodiments herein provide for a method of processing a semiconductor substrate.
Ala MORADIAN, Vishwas Kumar PANDEY, Lori D. WASHINGTON, Miao-Chun CHEN
Filed: 4 Jan 22
Utility
tm241bc2z7hg4quv3h9y8st8ou4dzgl
6 Jul 23
Methods and apparatus for self-assembled monolayer (SAM) deposition are provided herein.
Kevin KASHEFI, Joel Minster HUSTON, Michael Lee MCSWINEY, Carmen LEAL CERVANTES, Yongjin KIM, Drew William PHILLIPS, Mark Joseph SALY
Filed: 11 Nov 22
Utility
razlyyo4r2iwxy5unagkz
6 Jul 23
Disclosed herein is a temperature actuated valve, including a stationary member and a movable member, wherein the stationary member is configured to receive the movable member.
Shivaram Chandrashekar, Pallab Karmakar, Amit Sahu, Kumaresan Nagarajan, Giridhar Kamesh
Filed: 30 Dec 21
Utility
cj1596urrw9wpnv7mudm
6 Jul 23
An apparatus for chemical mechanical polishing includes a support for a polishing pad having a polishing surface, and an electromagnetic induction monitoring system to generate a magnetic field to monitor a substrate being polished by the polishing pad.
Hassan G. Iravani, Kun Xu, Denis Ivanov, Shih-Haur Shen, Boguslaw A. Swedek
Filed: 13 Mar 23
Utility
dcragq9cfqtrq3g1q3stym1lfz l77eh7jzd97m0jaje95qkc
6 Jul 23
Described are systems and techniques directed to optical inspection of moving products (wafers, substrates, films, patterns) that are being transported to or from processing chambers in device manufacturing systems.
Todd J. Egan, Avishek Ghosh, Edward W. Budiarto, Guoheng Zhao
Filed: 15 Mar 23
Utility
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6 Jul 23
A method of forming patterned features on a substrate is provided.
Yongan XU, Rutger MEYER TIMMERMAN THIJSSEN, Jinrui GUO, Ludovic GODET
Filed: 13 Mar 23