7578 patents
Page 53 of 379
Utility
Multi-toothed, magnetically controlled retaining ring
4 Jul 23
A system and method for polishing a substrate, and a retaining ring assembly therefor, are described herein.
Boguslaw A. Swedek
Filed: 28 Jun 21
Utility
Pore formation in a substrate
4 Jul 23
Methods are provided for manufacturing well-controlled, solid-state nanopores and arrays thereof.
Philip Allan Kraus, Joseph R. Johnson
Filed: 5 Apr 22
Utility
l9p0col4fltgdcbz7wnkd3m0dyso9z2njst5v6gkc8r65wq69cmdur2ne
4 Jul 23
One or more embodiments described herein generally relate to methods and systems for forming films on substrates in semiconductor processes.
Alexander N. Lerner, Roey Shaviv, Satish Radhakrishnan
Filed: 8 Jul 20
Utility
tzbex5ddiuaiexxuxhaa4v0vyq1uzh53pgi5ih0tcmu6gan
4 Jul 23
A method of coating particles includes dispensing particles into a vacuum chamber to form a particle bed in at least a lower portion of the chamber that forms a half-cylinder, evacuating the chamber through a vacuum port in an upper portion of the chamber, rotating a paddle assembly such that a plurality of paddles orbit a drive shaft to stir the particles in the particle bed, injecting a reactant or precursor gas through a plurality of channels into the lower portion of the chamber as the paddle assembly rotates to coat the particles, and injecting the reactant or precursor gas or a purge gas through the plurality of channels at a sufficiently high velocity such that the reactant or precursor a purge gas de-agglomerates particles in the particle bed.
Jonathan Frankel, Quoc Truong, Sekar Krishnasamy, Govindraj Desai, Sandip S. Desai
Filed: 17 Mar 22
Utility
29cbxkq1kawtkzjo9ymu45dvxgql6as0rngyn 94paoit5pzw
4 Jul 23
A non-transitory computer-readable storage medium stores instructions, which when executed by a processing device of a diagnostic server, cause the processing device to perform certain operations.
Tao Zhang, Upendra V. Ummethala, Ajit Balakrishna
Filed: 22 Aug 22
Utility
tl5 c04gntsfdb01780w
4 Jul 23
In a substrate processing system, such as a chemical mechanical system, updated controller configuration data is obtained for a plurality of liquid flow controllers of the substrate processing system.
Ricardo Martinez, Hung Xuan Hoang, Dmitry Sklyar, Farooq Aleem, Jagan Rangarajan, William Wadsworth, Brett Hoogensen
Filed: 23 Jun 21
Utility
doaw efmpg23zci5uqo4tx2c55962eb8hut9d6ignia54skfyq
4 Jul 23
A method of milling a sample that includes a first layer formed over a second layer, where the first and second layers are different materials, the method comprising: milling the region of the sample by scanning a focused ion beam over the region a plurality of iterations in which, for each iteration, the focused ion beam removes material from the sample generating byproducts from the milled region; detecting, during the milling, the partial pressures of one or more byproducts with a residual gas analyzer positioned to have a direct line of sight to the milled region; generating, in real-time, an output detection signal from the residual gas analyzer indicative of an amount of the one or more byproducts detected; and stopping the milling based on the output signal.
Yehuda Zur
Filed: 19 Nov 21
Utility
ay9qgvvxj19n3kgks8fvefa10ynfqp8
4 Jul 23
Disclosed herein are methods for forming MOSFETs.
Qintao Zhang, Samphy Hong, Wei Zou, Lei Zhong, David J. Lee, Felix Levitov
Filed: 18 Dec 20
Utility
ec9hkim9s72pdqwmefazwe
4 Jul 23
Memory devices and methods of manufacturing memory devices are provided.
Nitin K. Ingle, Fredrick Fishburn
Filed: 4 May 21
Utility
xy0g 4td27ua7hin72wu0n0qlkmpjpjx70h84mllx6ud25kjxvimoklk4c
4 Jul 23
Apparatus and methods for controlling plasma profiles during PVD deposition processes are disclosed.
Alexander Jansen, Keith A. Miller, Prashanth Kothnur, Martin Riker, David Gunther, Emily Schooley
Filed: 16 Jul 20
Utility
9mcfvath22cfy5jzo6bvc6y75zcvi4
4 Jul 23
Methods for modifying a susceptor having a silicon carbide (SiC) surface comprising exposing the silicon carbide surface (SiC) to an atmospheric plasma are described.
Francis Kanyiri Mungai, Vijayabhaskara Venkatagiriyappa, Yung-Cheng Hsu, Keiichi Tanaka, Mario D. Silvetti, Mihaela A. Balseanu
Filed: 31 Dec 20
Utility
dq7j14atcetjo3v7grvmo14 mggch4lgt9fhagfl9kt5ca5bhm
4 Jul 23
Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided.
Soo Young Choi, John M. White, Robert I. Greene
Filed: 24 Apr 14
Utility
vdf5l6qja5j2hubzxs85 yla9pw3v891j93iv7sxzpqhjzw5d8pr8hntgcf
4 Jul 23
An imaging system includes a microscope to generate magnified images of regions of interest of a tissue sample, a camera to capture and store the magnified images, and a controller.
Parijat P. Prabhudesai, Ganesh Kumar Mohanur Raghunathan, Aditya Sista, Sumit Kumar Jha, Narasimha Murthy Chandan
Filed: 7 Jan 22
Utility
4hduhg128sofk9 ktwktzxoae892g74ldu
4 Jul 23
A method, a non-transitory computer readable medium and a device.
Adam Faust, Yosef Basson, Guy Eytan, Yonathan David
Filed: 8 Dec 20
Utility
2yqigry ig9zc8qtf3xe9e0
4 Jul 23
Embodiments of the present disclosure generally relate to a system used in a semiconductor device manufacturing process.
James Rogers, Katsumasa Kawasaki
Filed: 9 Aug 22
Utility
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4 Jul 23
A component, a method of manufacturing a component, and a method of cleaning a component is provided.
Ian Widlow, Govinda Raj, Gary U. Keppers, Aravind Dugganna Naik, Francisco Rodarte, Sudhir R. Gondhalekar, Ravikumara Kodinaganhalli
Filed: 25 Oct 19
Utility
le60rex45ga8zdy84lfktqtnp3s52d76knfg4crwjqiz5dcwpki1on
4 Jul 23
Disclosed herein are methods for backside wafer dopant activation using a high-temperature ion implant.
Qintao Zhang, Wei Zou
Filed: 16 Jun 21
Utility
jags7aoacv6vnf2wvmel00ea1uxo2v1xx 73m
4 Jul 23
Aspects generally relate to methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers.
Krishna Nittala, Sarah Michelle Bobek, Kwangduk Douglas Lee, Ratsamee Limdulpaiboon, Dimitri Kioussis, Karthik Janakiraman
Filed: 18 Feb 21
Utility
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4 Jul 23
Exemplary semiconductor processing chambers may include a gasbox including a first plate having a first surface and a second surface opposite to the first surface.
Rahul Rajeev, Yunzhe Yang, Abhijit A. Kangude, Kedar Joshi
Filed: 22 Oct 20
Utility
5707deenopdiugmg5ks6licndca an63r
4 Jul 23
Embodiments of the disclosure relate to an apparatus and method for annealing one or more semiconductor substrates.
Jean Delmas, Steven Verhaverbeke, Kurtis Leschkies
Filed: 25 May 21