191 patents
Page 2 of 10
Utility
Spectrometric Metrology Systems Based on Multimode Interference and Lithographic Apparatus
31 Aug 23
A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor.
Mohamed SWILLAM, Justin Lloyd KREUZER, Stephen ROUX
Filed: 29 Jun 21
Utility
Lithographic Pre-alignment Imaging Sensor with Build-in Coaxial Illumination
27 Jul 23
A patterning device pre-alignment sensor system is disclosed.
Yuli VLADIMIRSKY, Lev RYZHIKOV
Filed: 20 May 21
Utility
Object Holder, Electrostatic Sheet and Method for Making an Electrostatic Sheet
27 Jul 23
An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.
Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Koos VAN BERKEL, Marcus Adrianus VAN DE KERKHOF, Roger Franciscus Mattheus Maria HAMELINCK, Shahab SHERVIN, Marinus Augustinus Christiaan VERSCHUREN, Johannes Bernardus Charles ENGELEN, Matthias KRUIZINGA, Tammo UITTERDIJK, Oleksiy Sergiyovich GALAKTIONOV, Kjeld Gertrudus Hendrikus JANSSEN, Johannes Adrianus Cornelis Maria PIJNENBURG, Peter VAN DELFT
Filed: 9 Jun 21
Utility
Variable diffraction grating
18 Jul 23
A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating.
Ali Alsaqqa, Fadi El-Ghussein, Lambertus Gerardus Maria Kessels, Roxana Rezvani Naraghi, Krishanu Shome, Timothy Allan Brunner, Sergei Sokolov
Filed: 12 Oct 20
Utility
Lithographic Apparatus, Metrology Systems, Illumination Switches and Methods Thereof
6 Jul 23
A system includes an illumination system, an optical element, a switching element and a detector.
Mohamed SWILLAM, Marinus Petrus REIJNDERS
Filed: 4 Jun 21
Utility
Lithographic Apparatus, Multi-wavelength Phase-modulated Scanning Metrology System and Method
6 Jul 23
A metrology system includes a radiation source, first, second, and third optical systems, and a processor.
Sebastianus Adrianus GOORDEN, Filippo ALPEGGIANI, Simon Reinald HUISMAN, Johannes Jacobus Matheus BASELMANS, Haico Victor KOK, Mohamed SWILLAM, Arjan Johannes Anton BEUKMAN
Filed: 14 May 21
Utility
Mode control of photonic crystal fiber based broadband radiation sources
27 Jun 23
A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF).
Sebastian Thomas Bauerschmidt, Peter Maximilian Götz, Patrick Sebastian Uebel, Ronald Franciscus Herman Hugers, Jan Adrianus Boer, Edwin Johannes Cornelis Bos, Andreas Johannes Antonius Brouns, Vitaliy Prosyentsov, Paul William Scholtes-Van Eijk, Paulus Antonius Andreas Teunissen, Mahesh Upendra Ajgaonkar
Filed: 11 May 22
Utility
Optical arrangement for an inspection apparatus
30 May 23
An inspection apparatus, including: an optical system configured to provide a beam of radiation to a surface to be measured and to receive redirected radiation from the surface; and a detection system configured to measure the redirected radiation, wherein the optical system includes an optical element to process the radiation, the optical element including a Mac Neille-type multilayer polarizing coating configured to produce a reduced chromatic offset of the radiation.
Parag Vinayak Kelkar, Justin Lloyd Kreuzer
Filed: 14 Sep 18
Utility
Lithographic apparatus and illumination uniformity correction system
23 May 23
An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile.
Janardan Nath, Kalyan Kumar Mankala, Todd R. Downey, Joseph Harry Lyons, Ozer Unluhisarcikli, Alexander Harris Ledbetter, Nicholas Stephen Apone, Tian Gang
Filed: 14 Apr 20
Utility
Contaminant Identification Metrology System, Lithographic Apparatus, and Methods Thereof
11 May 23
An inspection system (1600), a lithography apparatus, and an inspection method are provided.
Andrew JUDGE, Ravi Chaitanya KALLURI, Michal Emanuel PAWLOWSKI, James Hamilton WALSH, Justin Lloyd KREUZER
Filed: 8 Apr 21
Utility
Contaminant Analyzing Metrology System, Lithographic Apparatus, and Methods Thereof
4 May 23
An inspection system, a lithography apparatus, and an inspection method are provided.
Michal Emanuel PAWLOWSKI, Aage BENDIKSEN, Christopher Michael DOHAN, Johannes ONVLEE
Filed: 1 Apr 21
Utility
Apparatus for and Method of Sensing Alignment Marks
13 Apr 23
An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.
Krishanu SHOME, Justin Lloyd KREUZER
Filed: 21 Jan 21
Utility
Contaminant Detection Metrology System, Lithographic Apparatus, and Methods Thereof
6 Apr 23
A system (400) includes an illumination system (402), a detector (404), and a comparator (406).
Michal Emanuel PAWLOWSKI, Aage BENDIKSEN, Ryan Alan MUNDEN, Han-Kwang NIENHUYS
Filed: 8 Dec 20
Utility
Improved Alignment of Scatterometer Based Particle Inspection System
23 Mar 23
A pattering device inspection apparatus, system and method are described.
Christopher Michael DOHAN, James Hamilton WALSH, Roberto B. WIENER
Filed: 21 Jan 21
Utility
End-of-life Monitoring of Dynamic Gas Lock Membranes and Pupil Facet Mirrors Anddetection of Membrane Rupture In Lithographic Apparatuses
16 Mar 23
Joseph Harry LYONS, Jimi HENDRIKS, Ping ZHOU, Zhuangxiong HUANG, Reinier Theodorus Martinus JILISEN
Filed: 1 Mar 21
Utility
Reticle Gripper Damper and Isolation System for Lithographic Apparatuses
9 Mar 23
Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems.
Roberto B. WIENER, Peter Conrad KOCHERSPERGER, Boris KOGAN, Martinus Agnes Willem CUIJPERS, Robert Jeffrey WADE, Shaun EVANS
Filed: 26 Jan 21
Utility
Lithographic System Provided with a Deflection Apparatus for Changing a Trajectory of Particulate Debris
2 Mar 23
An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
Ronald Peter ALBRIGHT, Kursat BAL, Vadim Yevgenyevich BANINE, Richard Joseph BRULS, Sjoerd Frans DE VRIES, Olav Waldemar Vladimir FRIJNS, Yang-Shan HUANG, Zhuangxiong HUANG, Johannes Henricus Wilhelmus JACOBS, Johannes Hubertus Josephina MOORS, Georgi Nanchev NENCHEV, Andrey NIKIPELOV, Thomas Maarten RAASVELD, Manish RANJAN, Edwin TE SLIGTE, Karl Robert UMSTADTER, Eray UZGÖREN, Marcus Adrianus VAN DE KERKHOF, Parham YAGHOOBI
Filed: 24 Dec 20
Utility
Method for Region of Interest Processing for Reticle Particle Detection
23 Feb 23
An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object.
Peter Conrad KOCHERSPERGER, Christopher Michael DOHAN, Justin Lloyd KREUZER, Michal Emanuel PAWLOWSKI, Aage BENDIKSEN, Kirill Urievich SOBOLEV, James Hamilton WALSH, Roberto B. WIENER, Arun Mahadevan VENKATARAMAN
Filed: 21 Jan 21
Utility
Optical Designs of Miniaturized Overlay Measurement System
23 Feb 23
A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system.
Mohamed SWILLAM, Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Stephen ROUX, Yevgeniy Konstantinovich SHMAREV
Filed: 21 Jan 21
Utility
Lithographic Apparatus, Metrology Systems, Illumination Sources and Methods Thereof
23 Feb 23
A system includes an illumination system, an optical element, and a detector.
Marinus Petrus REIJNDERS, Mohamed SWILLAM
Filed: 8 Dec 20