191 patents
Page 6 of 10
Utility
Lithographic apparatus and device manufacturing method
1 Feb 22
An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.
Bearrach Moest, Lowell Lane Baker, James Robert Downes, Wijnand Hoitinga, Hermen Folken Pen
Filed: 26 Jan 17
Utility
Lithography Support Cleaning with Cleaning Substrate Having Controlled Geometry and Composition
27 Jan 22
Apparatus for and method of removing a contaminant from a working surface of a lithography support such as a reticle or wafer stage in an EUV or a DUV photolithography system in which a cleaning substrate provided with a coating made a selected material and configuration is pressed against the working surface so that the contaminant is transferred from the working surface to the coating.
Keane Michael LEVY, Akshay HARLALKA
Filed: 31 Oct 19
Utility
Apparatus for and Method Cleaning a Support Inside a Lithography Apparatus
6 Jan 22
An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface.
James Hamilton WALSH, Richard John JOHNSON, Christopher Rossi VANN
Filed: 22 Oct 19
Utility
a Method to Manufacture Nano Ridges In Hard Ceramic Coatings
30 Dec 21
A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface.
Mehmet Ali AKBAS, Tammo UITTERDIJK, Christopher John MASON, Matthew LIPSON, David Hart PETERSON, Michael PERRY, Peter HELMUS, Jerry Jianguo DENG, Damoon SOHRABIBABAHEIDARY
Filed: 22 Oct 19
Utility
Adaptive Alignment
23 Dec 21
A method of applying a measurement correction includes determining an orthogonal subspace used to characterize a first principal component of the measurement and a second principal component of the measurement, and rotating the orthogonal subspace by a first angle such that the first principle component rotates to become a first factor vector and the second principle component rotates to become a second factor vector.
Greger Göte Andersson, Krishanu Shome, Zahrasadat Dastouri, Igor Matheus Petronella Aarts
Filed: 26 Nov 19
Utility
Particle suppression systems and methods
21 Dec 21
An object stage that includes a first structure and a second structure movable relative to the first structure.
Yang-Shan Huang, Daniel Nathan Burbank, Marco Koert Stavenga
Filed: 18 Jul 18
Utility
High stability collimator assembly, lithographic apparatus, and method
21 Dec 21
A lithography system comprises an illumination system configured to produce abeam of radiation, a support configured to support a patterning device configured to impart a pattern on the beam, a projection system configured to project the patterned beam onto a substrate, and an alignment system comprising an illuminator.
David Taub, Joseph Ashwin Franklin, Jeffrey John Kowalski
Filed: 2 May 19
Utility
Metrology sensor, lithographic apparatus and method for manufacturing devices
23 Nov 21
Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation.
Sebastianus Adrianus Goorden, Johannes Antonius Gerardus Akkermans, Simon Reinald Huisman, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary
Filed: 13 Apr 18
Utility
Alignment sensor apparatus for process sensitivity compensation
16 Nov 21
An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor.
Simon Reinald Huisman, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Yuxiang Lin, Vu Quang Tran, Sebastianus Adrianus Goorden, Justin Lloyd Kreuzer, Christopher John Mason, Igor Matheus Petronella Aarts, Krishanu Shome, Irit Tzemah
Filed: 3 Apr 19
Utility
Particle traps and barriers for particle suppression
16 Nov 21
Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment.
Han-Kwang Nienhuys, Ronald Peter Albright, Jacob Brinkert, Yang-Shan Huang, Hendrikus Gijsbertus Schimmel, Antonie Hendrik Verweij
Filed: 18 Jul 18
Utility
Adjustable Retardance Compensator for Self-referencing Interferometer Devices
28 Oct 21
A compensator for manipulating a radiation beam traveling along an optical path.
Ryan Richard Westover, Ryan Walter Roder, Peter Ferenz, David Taub
Filed: 15 Apr 21
Utility
Alignment mark for two-dimensional alignment in an alignment system
26 Oct 21
An alignment mark for determining a two-dimensional alignment position of a substrate is discussed.
Gerrit Johannes Nijmeijer, Junqiang Zhou, Piotr Jan Meyer, Jeffrey John Lombardo, Igor Matheus Petronella Aarts
Filed: 2 May 18
Utility
Compact Alignment Sensor Arrangements
14 Oct 21
An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of the alignment mark which may be manipulated (e.g., mirrored, polarized) and combined to obtain information on the position of the mark and distortions within the mark.
Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Justin Lloyd KREUZER, Franciscus Godefridus Casper BIJNEN, Krishanu SHOME
Filed: 22 Aug 19
Utility
Particle suppression systems and methods
5 Oct 21
A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber.
Yang-Shan Huang, Marcel Joseph Louis Boonen, Han-Kwang Nienhuys, Jacob Brinkert, Richard Joseph Bruls, Peter Conrad Kochersperger
Filed: 18 Jul 18
Utility
Beam splitting prism systems
21 Sep 21
According to one embodiment, a prism system is provided.
Douglas C. Cappelli, Stanislav Smirnov, Richard Carl Zimmerman, Joshua Adams, Alexander Kenneth Raub, Yevgeniy Konstantinovich Shmarev
Filed: 26 Jun 20
Utility
Pellicle and Pellicle Assembly
8 Jul 21
A pellicle suitable for use with a patterning device for a lithographic apparatus.
David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY
Filed: 19 Mar 21
Utility
Apparatus with a sensor and a method of performing target measurement
6 Jul 21
A method and apparatus to measure a target (e.g., an alignment mark (e.g., on a substrate)) is disclosed.
Hong Ye, Gerrit Johannes Nijmeijer
Filed: 30 Sep 16
Utility
Burls with Altered Surface Topography for Holding an Object In Lithography Applications
1 Jul 21
Various burl designs for holding an object in a lithographic apparatus are described.
Mehmet Ali AKBAS, David Hart PETERSON, Tammo UITTERDIJK, Michael PERRY, Richard Bryan LEWIS, Iliya SIGAL
Filed: 4 Oct 18
Utility
Apparatus for and method cleaning a support inside a lithography apparatus
29 Jun 21
Methods and systems are described for cleaning a support such as a clamp of a chuck that holds a patterning device or a wafer in a lithographic apparatus.
Victor Antonio Perez-Falcon, Michael Andrew Chieda
Filed: 31 Jul 18
Utility
Assembly for Use in Semiconductor Photolithography and Method of Manufacturing Same
17 Jun 21
An optical assembly and a method of making an optical assembly in which additive manufacturing techniques are used to form a support structure either directly on an optical element or on a carrier that is subsequently bonded to an optical element.
Stephen ROUX, Christopher William REED
Filed: 5 Oct 18