191 patents
Page 5 of 10
Utility
Transport System Having a Magnetically Levitated Transportation Stage
16 Jun 22
A reticle transport system having a magnetically levitated transportation stage is disclosed.
Lei ZHOU, David L. TRUMPER, Ruvinda GUNAWARDANA
Filed: 7 Mar 22
Utility
Mode control of photonic crystal fiber based broadband radiation sources
14 Jun 22
A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF).
Sebastian Thomas Bauerschmidt, Peter Maximilian Götz, Patrick Sebastian Uebel, Ronald Franciscus Herman Hugers, Jan Adrianus Boer, Edwin Johannes Cornelis Bos, Andreas Johannes Antonius Brouns, Vitaliy Prosyentsov, Paul William Scholtes-Van Eijk, Paulus Antonius Andreas Teunissen, Mahesh Upendra Ajgaonkar
Filed: 27 Aug 20
Utility
Sensor Apparatus and Method for Lithographic Measurements
9 Jun 22
Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.
Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Justin Lloyd KREUZER, Yuxiang LIN, Kirill Urievich SOBOLEV
Filed: 25 Mar 20
Utility
Lithographic Apparatus, Metrology Apparatus, Optical System and Method
9 Jun 22
A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element and directing the beam, via an optical system, to a first reflective element at a first angle of incidence.
Stanislav SMIRNOV
Filed: 28 Feb 20
Utility
Pellicle and pellicle assembly
31 May 22
A pellicle suitable for use with a patterning device for a lithographic apparatus.
David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
Filed: 19 Mar 21
Utility
Scan signal characterization diagnostics
31 May 22
A system for and method of processing a wafer in which a scan signal is analyzed locally to extract information about alignment, overlay, mark quality, wafer quality, and the like.
Cornelis Melchior Brouwer, Krishanu Shome
Filed: 19 Dec 18
Utility
Apparatus for and method of in-situ particle removal in a lithography apparatus
17 May 22
Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate.
Richard Joseph Bruls, Ronald Peter Albright, Peter Conrad Kochersperger, Victor Antonio Perez-Falcon
Filed: 4 Feb 19
Utility
Electrostatic Clamp for a Lithographic Apparatus
12 May 22
An electrostatic clamp for supporting a substrate includes a substrate region, an electrode region at an edge of the substrate region, a support layer, an electrically conductive layer, a contact layer, and an electrode.
Hari KRISHNAN, Joseph Harry LYONS, Eric Justin MONKMAN, Victor Antonio PEREZ-FALCON
Filed: 6 Mar 20
Reissue
Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus
10 May 22
A lithographic apparatus includes a clamp (406) configured to receive an object (402).
Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Michael Leo Nelson, Jacobus Cornelis Gerardus Van Der Sanden, Geoffrey O'Connor, Michael Andrew Chieda, Tammo Uitterdijk
Filed: 28 Feb 20
Utility
Laser Roughening: Engineering the Roughness of the Burl Top
5 May 22
Methods, computer program products, and apparatuses for reducing sticking during a lithography process are disclosed.
Damoon SOHRABIBABAHEIDARY, Christopher John MASON, Peter HELMUS, Mehmet Ali AKBAS, Bensely ALBERT, Benjamin David DAWSON
Filed: 3 Feb 20
Utility
Wafer Alignment Using Form Birefringence of Targets or Product
5 May 22
An alignment method includes directing an illumination beam with a first polarization state to form a diffracted beam with a second polarization state from an alignment target, and passing the diffracted beam through a polarization analyzer.
Joshua ADAMS, Yuxiang LIN, Krishanu SHOME, Gerrit Johannes NIJMEIJER, Igor Matheus Petronella AARTS
Filed: 6 Feb 20
Utility
Intermediate Layer for Mechanical Interface
14 Apr 22
An apparatus includes a first substrate, a second substrate, and an intermediate layer disposed between the first and second substrates.
Kushal Sandeep DOSHI, Eric Justin MONKMAN, John Robert BURROUGHS, Sudhanshu NAHATA, Stefan Luka COLTON
Filed: 27 Jan 20
Utility
Apparatus for and Method of Simultaneously Acquiring Parallel Alignment Marks
31 Mar 22
An apparatus for and method of determining the alignment of a substrate in which a multiple alignment marks are simultaneously illuminated with spatially coherent radiation and the light from the illuminated marks is collected in parallel to obtain information on the positions of the marks and distortions within the marks.
Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Franciscus BIJNEN, Alessandro POLO, Kirill Urievich SOBOLEV, Simon Reinald HUISMAN, Justin Lloyd KREUZER
Filed: 12 Dec 19
Utility
Lithographic Apparatus, Substrate Table, and Method
17 Mar 22
A substrate table for supporting a substrate includes a surface and coarse burls.
Matthew LIPSON, Satish ACHANTA, Benjamin David DAWSON, Matthew Anthony SORNA, IIiya SIGAL, Tammo UITTERDIJK
Filed: 5 May 20
Utility
Apparatus for and Method of In-situ Particle Removal In a Lithography Apparatus
10 Mar 22
Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system.
Jeffrey John LOMBARDO, Ronald Peter ALBRIGHT, Daniel Leslie HALL, Victor Antonio PEREZ-FALCON, Andrew JUDGE
Filed: 12 Dec 19
Utility
Burls with altered surface topography for holding an object in lithography applications
8 Mar 22
Various burl designs for holding an object in a lithographic apparatus are described.
Mehmet Ali Akbas, David Hart Peterson, Tammo Uitterdijk, Michael Perry, Richard Bryan Lewis, Iliya Sigal
Filed: 4 Oct 18
Utility
Apparatus and Method for Cleaning a Support Structure In a Lighographic System
3 Mar 22
Apparatus for and method of removing a contaminant from a working surface of a lithography support such as a reticle or wafer stage in an EUV or a DUV photolithography system in which abase supporting the substrate is provided with a surface profile so as to be thicker towards a middle portion of the base so that when a substrate supported by the base is pressed between the working surface and the base the contaminant is transferred from the working surface to the substrate.
Keane Michael LEVY
Filed: 18 Dec 19
Utility
Noise Correction for Alignment Signal
3 Mar 22
A method of applying a measurement correction includes determining an orthogonal subspace used to characterize the measurement as a plot of data.
Zahrasadat DASTOURI, Greger Göte ANDERSSON, Krishanu SHOME, Igor Matheus Petronella AARTS
Filed: 12 Dec 19
Utility
Reticle Sub-field Thermal Control
24 Feb 22
An apparatus for reticle sub-field thermal control in a lithography system is disclosed.
Eric Justin MONKMAN, Michael Andrew CHIEDA, Stephen ROUX, Victor Antonio PEREZ-FALCON
Filed: 12 Dec 19
Utility
Adjustable retardance compensator for self-referencing interferometer devices
15 Feb 22
A compensator for manipulating a radiation beam traveling along an optical path.
Ryan Richard Westover, Ryan Walter Roder, Peter Ferenz, David Taub
Filed: 15 Apr 21