191 patents
Page 9 of 10
Utility
Particle Traps and Barriers for Particle Suppression
15 Jul 20
Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment.
Han-Kwang NIENHUYS, Ronald Peter ALBRIGHT, Jacob BRINKERT, Yang-Shan HUANG, Hendrikus Gijsbertus SCHIMMEL, Antonie Hendrik VERWEIJ
Filed: 17 Jul 18
Utility
Lithographic apparatus and device manufacturing method
6 Jul 20
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows.
Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
Filed: 25 Feb 18
Utility
Flexible illuminator
29 Jun 20
A method is disclosed that includes splitting a beam of radiation into a first part of the beam having a first polarization and a second part of the beam having a second polarization, forming a first beam with a first polarization distribution between the first polarization and the second polarization and/or a first intensity distribution by modulating the first part of the beam, forming a second beam with a second polarization distribution between the first polarization and the second polarization and/or a second intensity distribution by modulating the second part of the beam, and combining at least a portion of the first beam having the second polarization and at least a portion of the second beam having the first polarization.
Parag Vinayak Kelkar
Filed: 5 Dec 16
Utility
Method and apparatus for spectrally broadening radiation
1 Jun 20
A spectrally broadened radiation apparatus, including a laser configured to emit, through an output of the laser, radiation substantially only in the visible region of the electromagnetic spectrum, the radiation having a nominal wavelength, and an optical fiber optically coupled to the output of the laser, the optical fiber having an input to receive the radiation from the laser and having an output to provide spectrally broadened output radiation, the optical fiber configured to spectrally broaden the radiation from the laser to a spectral width of at least 0.5 nm around the nominal wavelength.
King Pui Leung, Tao Chen, Kevin J. Violette
Filed: 10 Aug 15
Utility
Control of Reticle Placement for Defectivity Optimization
27 May 20
A system designed to couple a patterning device to a support structure having a plurality of burls includes a camera module, an actuator, and a controller.
Andrew JUDGE, Aage BENDIKSEN, Pedro Julian RIZO DIAGO
Filed: 27 Jun 18
Utility
Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method
18 May 20
A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
Martinus Hendrikus Antonius Leenders, Niek Elout De Kruijf, Mircea Dusa, Martijn Houben, Johannes Gerardus Maria Mulder, Thomas Poiesz, Marco Adrianus Peter Van Den Heuvel, Paul Van Dongen, Justin Johannes Hermanus Gerritzen, Antonie Hendrik Verweij, Abraham Alexander Soethoudt
Filed: 22 Apr 15
Utility
Lithographic apparatus, a dryer and a method of removing liquid from a surface
11 May 20
A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography.
Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Harry Sewell, Louis John Markoya, Marcus Martinus Petrus Adrianus Vermeulen, Diane Elaine Markoya
Filed: 19 Dec 18
Utility
Particle Suppression Systems and Methods
6 May 20
An object stage that includes a first structure and a second structure movable relative to the first structure.
Yang-Shan HUANG, Daniel Nathan BURBANK, Marco Koert STAVENGA
Filed: 17 Jul 18
Utility
Patterning device cooling apparatus
4 May 20
A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
Güneş Nakíbo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
Filed: 21 Jul 19
Utility
Alignment Mark For Two-Dimensional Alignment In An Alignment System
22 Apr 20
An alignment mark for determining a two-dimensional alignment position of a substrate is discussed.
Gerrit Johannes NIJMEIJER, Junqiang ZHOU, Piotr Jan MEYER, Jeffrey John LOMBARDO, Igor Matheus Petronella AARTS
Filed: 1 May 18
Utility
Anti-Reflection Coating
1 Apr 20
A method of forming an anti-reflection layer, the method including applying a first mixture to an object, the first mixture made from a combination of aluminum tri-sec-butoxide (ATSB), a first chelating agent, water and an alcohol; removing a majority of the alcohol from the applied first mixture; after the removing, applying a second mixture to the object, the second mixture made from a combination of aluminum tri-sec-butoxide, a second chelating agent different than the first chelating agent, water and an alcohol; and removing a majority of the alcohol from the applied second mixture, wherein the applied first and second mixtures are used to form the anti-reflection layer.
Parag Vinayak KELKAR, David Hart PETERSON
Filed: 12 Mar 18
Utility
Lithographic apparatus and device manufacturing method
23 Mar 20
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows.
Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
Filed: 11 Jun 19
Utility
Membrane assembly and particle trap
9 Mar 20
Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment.
Ronald Peter Albright, Lowell Lane Baker, Daniel Nathan Burbank
Filed: 16 Jul 17
Utility
Method, Substrate and Apparatus to Measure Performance of Optical Metrology
4 Mar 20
A method including illuminating a product test substrate with radiation from a component, wherein the product test substrate does not have a device pattern etched therein and yields a non-zero sensitivity when illuminated, the non-zero sensitivity representing a change in an optical response characteristic of the product test substrate with respect to a change in a characteristic of the radiation; measuring at least a part of the radiation redirected by the product test substrate to determine a parameter value; and taking an action with respect to the component based on the parameter value.
Leonardo Gabriel MONTILLA, Krishanu SHOME
Filed: 16 Apr 18
Utility
Substrates and Methods of Using Those Substrates
4 Mar 20
A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
Matthew LIPSON, Christopher John MASON, Damoon SOHRABIBABAHEIDARY, Jimmy Matheus Wilhelmus VAN DE WINKEL, Bert Dirk SCHOLTEN
Filed: 30 Apr 18
Utility
Pellicle and Pellicle Assembly
26 Feb 20
A pellicle suitable for use with a patterning device for a lithographic apparatus.
David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnould Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN-ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY
Filed: 29 Oct 19
Utility
Metrology Tool and Method of Using the Same
26 Feb 20
A method including: subsequent to a first device lithographic step of a device patterning process, measuring a degraded metrology mark on an object and/or a device pattern feature associated with the degraded metrology mark, the degraded metrology mark arising at least in part from the first device lithographic step on the object; and prior to a second device lithographic step of the device patterning process on the object, creating a replacement metrology mark, for use in the patterning process in place of the degraded metrology mark, on the object.
Justin Lloyd KREUZER
Filed: 12 Dec 17
Utility
Mask Assembly
19 Feb 20
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François SylvainVirgile VAN LOO, Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
Filed: 29 Sep 19
Utility
Polarization independent metrology system
10 Feb 20
A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector.
Krishanu Shome, Justin Lloyd Kreuzer
Filed: 18 Apr 19
Utility
Mask assembly
10 Feb 20
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
Filed: 15 Nov 15