191 patents
Page 3 of 10
Utility
Wafer Clamp Hard Burl Production and Refurbishment
2 Feb 23
Systems, apparatuses, and methods are provided for manufacturing a wafer clamp having hard burls.
Matthew LIPSON, Mehmet Ali AKBAS, Tammo UITTERDIJK, Fei ZHAO
Filed: 8 Dec 20
Utility
Lithographic Apparatus and Method for Drift Compensation
2 Feb 23
A system, method, a lithographic apparatus and a software product configured to determine a drift in an attribute of an illumination and a corresponding drift correction.
Ronny DER KINDEREN, Tian GANG, Todd R. DOWNEY
Filed: 4 Jan 21
Utility
Systems and Methods for Manufacturing a Double-sided Electrostatic Clamp
26 Jan 23
Systems, apparatuses, and methods are provided for manufacturing an electrostatic clamp.
Matthew LIPSON, Mehmet Ali AKBAS
Filed: 4 Dec 20
Utility
Metrology Method and Associated Metrology and Lithographic Apparatuses
19 Jan 23
A metrology method relating to measurement of a structure on a substrate, the structure being subject to one or more asymmetric deviation.
Patricius Aloysius Jacobus TINNEMANS, Igor Matheus Petronalla AARTS, Kaustuve BHATTACHARYYA, Ralph BRINKHOF, Leendert Jan KARSSEMEIJER, Stefan Carolus Jacobus A KEIJ, Haico Victor KOK, Simon Gijsbert Josephus MATHIJSSEN, Henricus Johannes Lambertu MEGENS, Samee Ur REHMAN
Filed: 3 Dec 20
Utility
Overlay Measurement System Using Lock-in Amplifier Technique
12 Jan 23
A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230).
Mohamed SWILLAM, Simon Reinald HUISMAN, Justin Lloyd KREUZER
Filed: 18 Nov 20
Utility
Lithographic Apparatus and Electrostatic Clamp Designs
12 Jan 23
Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp.
Victor Antonio PEREZ-FALCON, Marcus Adrianus VAN DE KERKHOF, Daniel Leslie HALL, Christopher John MASON, Arthur Winfried Eduardus MINNAERT, Johannes Hubertus Josephina MOORS, Samir A. NAYFEH
Filed: 5 Oct 20
Utility
Apparatus for and method of in-situ particle removal in a lithography apparatus
10 Jan 23
Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system.
Jeffrey John Lombardo, Ronald Peter Albright, Daniel Leslie Hall, Victor Antonio Perez-Falcon, Andrew Judge
Filed: 12 Dec 19
Utility
Lithographic apparatus, metrology apparatus, optical system and method
27 Dec 22
A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element and directing the beam, via an optical system, to a first reflective element at a first angle of incidence.
Stanislav Smirnov
Filed: 28 Feb 20
Utility
Optical Component and Clamp Used In Lithographic Apparatus
22 Dec 22
An optical element and a lithographic apparatus including the optical element.
Victor Antonio PEREZ-FALCON
Filed: 21 Oct 20
Utility
Compact alignment sensor arrangements
20 Dec 22
An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of the alignment mark which may be manipulated (e.g., mirrored, polarized) and combined to obtain information on the position of the mark and distortions within the mark.
Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Justin Lloyd Kreuzer, Franciscus Godefridus Casper Bijnen, Krishanu Shome
Filed: 22 Aug 19
Utility
Phase Modulators In Alignment to Decrease Mark Size
15 Dec 22
An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target.
Franciscus Godefridus Casper BIJNEN, Muhsin ERALP, Simon Reinald HUISMAN, Arie Jeffrey DEN BOEF
Filed: 5 Aug 20
Utility
Sensor apparatus and method for lithographic measurements
13 Dec 22
Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.
Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Justin Lloyd Kreuzer, Yuxiang Lin, Kirill Urievich Sobolev
Filed: 25 Mar 20
Utility
Optimization Using a Non-uniform Illumination Intensity Profile
8 Dec 22
A method for source mask optimization or mask only optimization used to image a pattern onto a substrate.
Janardan NATH, Christopher John MASON, Duan-Fu Stephen HSU, Todd R. DOWNEY, Tian GANG
Filed: 18 Nov 20
Utility
Systems for Cleaning a Portion of a Lithography Apparatus
8 Dec 22
A cleaning tool configured to be inserted into a lithography apparatus in a first configuration, configured to be engaged by a handler of the lithography apparatus, and used for cleaning a portion of the lithography apparatus.
Daniel Paul RODAK
Filed: 20 Oct 20
Utility
Variable Diffraction Grating
8 Dec 22
A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating.
Ali ALSAQQA, Fadi EL-GHUSSEIN, Lambertus Gerardus Maria KESSELS, Roxana REZVANI NARAGHI, Krishanu SHOME, Timothy Allan BRUNNER, Sergei SOKOLOV
Filed: 12 Oct 20
Utility
Lithography supports with defined burltop topography
6 Dec 22
Methods and systems are described for reducing adhesion and controlling friction between a wafer and a wafer table during semiconductor photolithography wherein the tops of burls on the wafer table have a layer with a nanoscale topography.
Matthew Lipson, David Allen Heald, Iliya Sigal
Filed: 29 Nov 18
Utility
Adaptive alignment
29 Nov 22
A method of applying a measurement correction includes determining an orthogonal subspace used to characterize a first principal component of the measurement and a second principal component of the measurement, and rotating the orthogonal subspace by a first angle such that the first principle component rotates to become a first factor vector and the second principle component rotates to become a second factor vector.
Greger Göte Andersson, Krishanu Shome, Zahrasadat Dastouri, Igor Matheus Petronella Aarts
Filed: 26 Nov 19
Utility
Lithographic Apparatus, Metrology System, and Illumination Systems with Structured Illumination
24 Nov 22
A system (500) includes an illumination system (502), a lens element (506), and a detector (504).
Yuxiang LIN, Joshua ADAMS, Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Krishanu SHOME
Filed: 14 Sep 20
Utility
Reticle sub-field thermal control
15 Nov 22
An apparatus for reticle sub-field thermal control in a lithography system is disclosed.
Eric Justin Monkman, Michael Andrew Chieda, Stephen Roux, Victor Antonio Perez-Falcon
Filed: 12 Dec 19
Utility
Substrate Holder for Use In a Lithographic Apparatus
10 Nov 22
A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit.
Thomas POIESZ, Coen Hubertus Matheus BALTIS, Abraham Alexander SOETHOUDT, Mehmet Ali AKBAS, Dennis VAN DEN BERG, Wouter VANESCH, Marcel Maria Cornelius Franciscus TEUNISSEN
Filed: 21 Jul 22